JPH10209031A5 - - Google Patents
Info
- Publication number
- JPH10209031A5 JPH10209031A5 JP1997021026A JP2102697A JPH10209031A5 JP H10209031 A5 JPH10209031 A5 JP H10209031A5 JP 1997021026 A JP1997021026 A JP 1997021026A JP 2102697 A JP2102697 A JP 2102697A JP H10209031 A5 JPH10209031 A5 JP H10209031A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- optical system
- mark pattern
- illumination
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9021026A JPH10209031A (ja) | 1997-01-20 | 1997-01-20 | 結像特性補正方法及び投影露光装置 |
| KR10-1998-0001610A KR100525067B1 (ko) | 1997-01-20 | 1998-01-20 | 노광 장치의 광학 특성 측정 방법, 노광 장치의 동작 방법 및 투영 노광 장치 |
| US09/456,010 US6456377B1 (en) | 1997-01-20 | 1999-12-07 | Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature |
| US10/212,764 US6825932B2 (en) | 1997-01-20 | 2002-08-07 | Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9021026A JPH10209031A (ja) | 1997-01-20 | 1997-01-20 | 結像特性補正方法及び投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10209031A JPH10209031A (ja) | 1998-08-07 |
| JPH10209031A5 true JPH10209031A5 (enExample) | 2004-12-24 |
Family
ID=12043509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9021026A Withdrawn JPH10209031A (ja) | 1997-01-20 | 1997-01-20 | 結像特性補正方法及び投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10209031A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001044113A (ja) | 1999-08-02 | 2001-02-16 | Nikon Corp | ビーム出力制御方法、ビーム出力装置、及び露光システム、並びに当該露光システムを用いるデバイス製造方法 |
| US7177010B2 (en) * | 2004-11-03 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20070115452A1 (en) * | 2005-11-23 | 2007-05-24 | Asml Netherlands B.V. | Method of measuring the magnification of a projection system, device manufacturing method and computer program product |
-
1997
- 1997-01-20 JP JP9021026A patent/JPH10209031A/ja not_active Withdrawn
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