JPH10209031A - 結像特性補正方法及び投影露光装置 - Google Patents

結像特性補正方法及び投影露光装置

Info

Publication number
JPH10209031A
JPH10209031A JP9021026A JP2102697A JPH10209031A JP H10209031 A JPH10209031 A JP H10209031A JP 9021026 A JP9021026 A JP 9021026A JP 2102697 A JP2102697 A JP 2102697A JP H10209031 A JPH10209031 A JP H10209031A
Authority
JP
Japan
Prior art keywords
optical system
image
projection
illumination
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9021026A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10209031A5 (enExample
Inventor
Kosuke Suzuki
広介 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9021026A priority Critical patent/JPH10209031A/ja
Priority to KR10-1998-0001610A priority patent/KR100525067B1/ko
Publication of JPH10209031A publication Critical patent/JPH10209031A/ja
Priority to US09/456,010 priority patent/US6456377B1/en
Priority to US10/212,764 priority patent/US6825932B2/en
Publication of JPH10209031A5 publication Critical patent/JPH10209031A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9021026A 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置 Withdrawn JPH10209031A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9021026A JPH10209031A (ja) 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置
KR10-1998-0001610A KR100525067B1 (ko) 1997-01-20 1998-01-20 노광 장치의 광학 특성 측정 방법, 노광 장치의 동작 방법 및 투영 노광 장치
US09/456,010 US6456377B1 (en) 1997-01-20 1999-12-07 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature
US10/212,764 US6825932B2 (en) 1997-01-20 2002-08-07 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9021026A JPH10209031A (ja) 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置

Publications (2)

Publication Number Publication Date
JPH10209031A true JPH10209031A (ja) 1998-08-07
JPH10209031A5 JPH10209031A5 (enExample) 2004-12-24

Family

ID=12043509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9021026A Withdrawn JPH10209031A (ja) 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置

Country Status (1)

Country Link
JP (1) JPH10209031A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6542222B1 (en) 1999-08-02 2003-04-01 Nikon Corporation Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system
JP2006135325A (ja) * 2004-11-03 2006-05-25 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2007150297A (ja) * 2005-11-23 2007-06-14 Asml Netherlands Bv 投影システムの倍率を計測する方法、デバイス製造方法およびコンピュータプログラム製品

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6542222B1 (en) 1999-08-02 2003-04-01 Nikon Corporation Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system
JP2006135325A (ja) * 2004-11-03 2006-05-25 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2007150297A (ja) * 2005-11-23 2007-06-14 Asml Netherlands Bv 投影システムの倍率を計測する方法、デバイス製造方法およびコンピュータプログラム製品

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