JPH1145842A5 - - Google Patents

Info

Publication number
JPH1145842A5
JPH1145842A5 JP1997198154A JP19815497A JPH1145842A5 JP H1145842 A5 JPH1145842 A5 JP H1145842A5 JP 1997198154 A JP1997198154 A JP 1997198154A JP 19815497 A JP19815497 A JP 19815497A JP H1145842 A5 JPH1145842 A5 JP H1145842A5
Authority
JP
Japan
Prior art keywords
image
projection
optical system
projection optical
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997198154A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1145842A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9198154A priority Critical patent/JPH1145842A/ja
Priority claimed from JP9198154A external-priority patent/JPH1145842A/ja
Priority to AU83573/98A priority patent/AU8357398A/en
Priority to PCT/JP1998/003305 priority patent/WO1999005709A1/ja
Priority to EP98933919A priority patent/EP1024522A4/en
Publication of JPH1145842A publication Critical patent/JPH1145842A/ja
Priority to US09/502,042 priority patent/US6522386B1/en
Priority to US10/321,597 priority patent/US20030128344A1/en
Publication of JPH1145842A5 publication Critical patent/JPH1145842A5/ja
Withdrawn legal-status Critical Current

Links

JP9198154A 1997-07-24 1997-07-24 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法 Withdrawn JPH1145842A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP9198154A JPH1145842A (ja) 1997-07-24 1997-07-24 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法
AU83573/98A AU8357398A (en) 1997-07-24 1998-07-24 Exposure method and aligner
PCT/JP1998/003305 WO1999005709A1 (en) 1997-07-24 1998-07-24 Exposure method and aligner
EP98933919A EP1024522A4 (en) 1997-07-24 1998-07-24 ALIGNMENT DEVICE AND EXPOSURE METHOD
US09/502,042 US6522386B1 (en) 1997-07-24 2000-02-11 Exposure apparatus having projection optical system with aberration correction element
US10/321,597 US20030128344A1 (en) 1997-07-24 2002-12-18 Exposure method, exposure apparatus, method for adjusting the exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9198154A JPH1145842A (ja) 1997-07-24 1997-07-24 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法

Publications (2)

Publication Number Publication Date
JPH1145842A JPH1145842A (ja) 1999-02-16
JPH1145842A5 true JPH1145842A5 (enExample) 2005-05-19

Family

ID=16386369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9198154A Withdrawn JPH1145842A (ja) 1997-07-24 1997-07-24 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法

Country Status (4)

Country Link
EP (1) EP1024522A4 (enExample)
JP (1) JPH1145842A (enExample)
AU (1) AU8357398A (enExample)
WO (1) WO1999005709A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6373552B1 (en) 1999-01-20 2002-04-16 Asm Lithography B.V. Optical correction plate, and its application in a lithographic projection apparatus
US6710930B2 (en) 1999-12-01 2004-03-23 Nikon Corporation Illumination optical system and method of making exposure apparatus
JP4888819B2 (ja) * 2000-04-12 2012-02-29 株式会社ニコン 露光装置、露光方法、露光装置の製造方法及びマイクロデバイスの製造方法
JP2002184667A (ja) 2000-12-14 2002-06-28 Nikon Corp 補正部材の製造方法、投影光学系の製造方法および露光装置の調整方法
JP3626448B2 (ja) 2001-11-28 2005-03-09 株式会社東芝 露光方法
JP3799275B2 (ja) 2002-01-08 2006-07-19 キヤノン株式会社 走査露光装置及びその製造方法並びにデバイス製造方法
JP3762323B2 (ja) 2002-04-02 2006-04-05 キヤノン株式会社 露光装置
JP3652329B2 (ja) * 2002-06-28 2005-05-25 キヤノン株式会社 走査露光装置、走査露光方法、デバイス製造方法およびデバイス
JP4054666B2 (ja) 2002-12-05 2008-02-27 キヤノン株式会社 露光装置
KR101117429B1 (ko) 2003-10-31 2012-04-16 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP5629050B2 (ja) 2004-06-10 2014-11-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のための投影対物レンズ
EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
JP5174810B2 (ja) * 2006-06-16 2013-04-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物器械
EP2188673A1 (en) * 2007-08-03 2010-05-26 Carl Zeiss SMT AG Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
JP2014035307A (ja) 2012-08-10 2014-02-24 Hitachi High-Technologies Corp 欠陥検査装置、及び欠陥検査方法
JP6137950B2 (ja) * 2013-06-10 2017-05-31 キヤノン株式会社 液体吐出ヘッドの製造方法
EP3540743A1 (en) * 2018-03-16 2019-09-18 Deutsches Elektronen-Synchrotron DESY Method for manufacturing of a pre-aligned x-ray optical correction plate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3374991B2 (ja) * 1993-06-14 2003-02-10 株式会社ニコン 投影光学系の調整方法、露光方法、及び露光装置
JPH088157A (ja) * 1994-06-16 1996-01-12 Nikon Corp 投影露光装置
JPH0766110A (ja) * 1993-08-31 1995-03-10 Toshiba Corp 補正用プリズム機器及びこれを用いた露光装置
JP3555233B2 (ja) * 1995-04-13 2004-08-18 株式会社ニコン 投影露光装置
US6333776B1 (en) * 1994-03-29 2001-12-25 Nikon Corporation Projection exposure apparatus
JPH0992601A (ja) * 1995-09-26 1997-04-04 Nikon Corp 投影露光装置
JPH08124831A (ja) * 1994-10-25 1996-05-17 Toshiba Corp 倍率補正装置及びこれを適用した露光装置
JPH1027743A (ja) * 1996-07-11 1998-01-27 Canon Inc 投影露光装置、デバイス製造方法及び収差補正光学系

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