JPH09293679A5 - - Google Patents

Info

Publication number
JPH09293679A5
JPH09293679A5 JP1996130910A JP13091096A JPH09293679A5 JP H09293679 A5 JPH09293679 A5 JP H09293679A5 JP 1996130910 A JP1996130910 A JP 1996130910A JP 13091096 A JP13091096 A JP 13091096A JP H09293679 A5 JPH09293679 A5 JP H09293679A5
Authority
JP
Japan
Prior art keywords
silicon film
crystalline silicon
semiconductor device
manufacturing
drain regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996130910A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09293679A (ja
JP3939383B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP13091096A priority Critical patent/JP3939383B2/ja
Priority claimed from JP13091096A external-priority patent/JP3939383B2/ja
Publication of JPH09293679A publication Critical patent/JPH09293679A/ja
Publication of JPH09293679A5 publication Critical patent/JPH09293679A5/ja
Application granted granted Critical
Publication of JP3939383B2 publication Critical patent/JP3939383B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP13091096A 1996-04-27 1996-04-27 半導体装置の作製方法 Expired - Fee Related JP3939383B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13091096A JP3939383B2 (ja) 1996-04-27 1996-04-27 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13091096A JP3939383B2 (ja) 1996-04-27 1996-04-27 半導体装置の作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007054193A Division JP4216315B2 (ja) 2007-03-05 2007-03-05 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JPH09293679A JPH09293679A (ja) 1997-11-11
JPH09293679A5 true JPH09293679A5 (cg-RX-API-DMAC7.html) 2005-07-07
JP3939383B2 JP3939383B2 (ja) 2007-07-04

Family

ID=15045601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13091096A Expired - Fee Related JP3939383B2 (ja) 1996-04-27 1996-04-27 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP3939383B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006066908A (ja) * 2004-07-30 2006-03-09 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP2005326866A (ja) * 2005-06-08 2005-11-24 Seiko Epson Corp 表示装置、回路基板、回路基板の製造方法

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