JPH086255A - 平版印刷材料 - Google Patents

平版印刷材料

Info

Publication number
JPH086255A
JPH086255A JP13991494A JP13991494A JPH086255A JP H086255 A JPH086255 A JP H086255A JP 13991494 A JP13991494 A JP 13991494A JP 13991494 A JP13991494 A JP 13991494A JP H086255 A JPH086255 A JP H086255A
Authority
JP
Japan
Prior art keywords
layer
polymer
silver halide
hydrophilic
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13991494A
Other languages
English (en)
Japanese (ja)
Inventor
Yoshihiro Takagi
良博 高木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP13991494A priority Critical patent/JPH086255A/ja
Priority to DE1995122643 priority patent/DE19522643A1/de
Publication of JPH086255A publication Critical patent/JPH086255A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285Silver salts, e.g. a latent silver salt image

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP13991494A 1994-06-22 1994-06-22 平版印刷材料 Pending JPH086255A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP13991494A JPH086255A (ja) 1994-06-22 1994-06-22 平版印刷材料
DE1995122643 DE19522643A1 (de) 1994-06-22 1995-06-22 Lichtempfindliches Material umfassend eine Aushärteschicht und eine lichtempfindliche Schicht auf einem Kunststoffträger

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13991494A JPH086255A (ja) 1994-06-22 1994-06-22 平版印刷材料

Publications (1)

Publication Number Publication Date
JPH086255A true JPH086255A (ja) 1996-01-12

Family

ID=15256592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13991494A Pending JPH086255A (ja) 1994-06-22 1994-06-22 平版印刷材料

Country Status (2)

Country Link
JP (1) JPH086255A (de)
DE (1) DE19522643A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006343400A (ja) * 2005-06-07 2006-12-21 Hitachi Chem Co Ltd 感光性樹脂フィルム及びそれを用いたフォトレジストパターンの製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69910903T2 (de) * 1998-06-16 2004-07-22 Fuji Photo Film Co., Ltd., Minami-Ashigara Lichtempfindliches Silberhalogenidmaterial mit Träger, Härtungsschicht und lichtempfindlicher Schicht
US7618704B2 (en) 2003-09-29 2009-11-17 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
US8143326B2 (en) 2004-09-28 2012-03-27 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006343400A (ja) * 2005-06-07 2006-12-21 Hitachi Chem Co Ltd 感光性樹脂フィルム及びそれを用いたフォトレジストパターンの製造方法
JP4656403B2 (ja) * 2005-06-07 2011-03-23 日立化成工業株式会社 感光性樹脂フィルム及びそれを用いたフォトレジストパターンの製造方法

Also Published As

Publication number Publication date
DE19522643A1 (de) 1996-01-04

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