JPH08264659A - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JPH08264659A
JPH08264659A JP7063267A JP6326795A JPH08264659A JP H08264659 A JPH08264659 A JP H08264659A JP 7063267 A JP7063267 A JP 7063267A JP 6326795 A JP6326795 A JP 6326795A JP H08264659 A JPH08264659 A JP H08264659A
Authority
JP
Japan
Prior art keywords
circuit device
integrated circuit
semiconductor integrated
output terminal
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7063267A
Other languages
Japanese (ja)
Inventor
Makoto Yamato
誠 大和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP7063267A priority Critical patent/JPH08264659A/en
Publication of JPH08264659A publication Critical patent/JPH08264659A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42372Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
    • H01L29/4238Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)

Abstract

PURPOSE: To reduce the dead region by connecting output terminals respectively to the drains of MOS transistors and placing the annular drains and sources to surround the output terminals in this order. CONSTITUTION: Output terminals 2 are respectively connected to the drains 11 of driver transistors 1 composed of MOS transistors and drains 11 and sources 12 are placed to surround the output terminals 2 in this order. Gates 5 are formed through a gate insulation film on the surface of the drains 11 and sources 12 to surround the terminals 2. By disposing the terminals 2 zigzag, the dead region can be greatly eliminated and hence a drive IC chip can be made small in size.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、出力ドライバトランジ
スタとしての複数個がそれぞれの駆動回路と共に集積さ
れている半導体集積回路装置 (以下ICと記す) に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor integrated circuit device (hereinafter referred to as an IC) in which a plurality of output driver transistors are integrated with respective drive circuits.

【0002】[0002]

【従来の技術】現在、ICの低コスト化が求められてお
り、これに対応する手段の一つとしてチップサイズの縮
小がある。しかし、例えば複数の出力ドライバトランジ
スタをシフトレジスタ、ラッチなどを含む駆動回路と共
に一つの駆動用ICチップに集積した場合、隣接出力端
子への配線相互が短絡しないように配線しやすくするた
め、出力端子の中心点相互は、例えば150μm以上だ
け離しておくことが要求される。そこで、図2に示すよ
うに出力ドライバトランジスタ1の一方の側で出力端子
2をジグザグ状に配列し、ドライバトランジスタ1は密
接して配置できるようにする。この場合、出力ドライバ
トランジスタ1は、図にゲートを省略して示すようにそ
れぞれ櫛形のドレイン11とソース12を組み合わせて
配置したMOS型トランジスタで、ドレイン11と出力
端子2が配線3で接続されている。出力端子2として
は、Alワイヤのボンディングされるパッドあるいはリ
ード線のはんだ付けされるはんだパッドなどがある。
2. Description of the Related Art At present, there is a demand for lowering the cost of ICs, and one means for dealing with this is to reduce the chip size. However, for example, when a plurality of output driver transistors are integrated in a single driving IC chip together with a driving circuit including a shift register, a latch, etc., the wiring to the adjacent output terminals is facilitated so as not to short-circuit each other. The center points of are required to be separated from each other by, for example, 150 μm or more. Therefore, as shown in FIG. 2, the output terminals 2 are arranged in a zigzag pattern on one side of the output driver transistor 1 so that the driver transistors 1 can be closely arranged. In this case, the output driver transistor 1 is a MOS transistor in which a comb-shaped drain 11 and a source 12 are arranged in combination as shown by omitting the gate in the figure, and the drain 11 and the output terminal 2 are connected by a wiring 3. There is. The output terminal 2 may be a pad to which an Al wire is bonded or a solder pad to which a lead wire is soldered.

【0003】[0003]

【発明が解決しようとする課題】図2に示したICで
は、点線の斜線を引いて示した領域4が無効領域とな
り、それだけチップサイズが大きくなる。本発明の目的
は出力ドライバトランジスタと出力端子の配置によって
生ずる無効領域を少なくしてチップサイズを縮小したI
Cを提供することにある。
In the IC shown in FIG. 2, the region 4 indicated by the dotted diagonal line is an invalid region, and the chip size is increased accordingly. The object of the present invention is to reduce the chip size by reducing the invalid area caused by the arrangement of the output driver transistor and the output terminal.
To provide C.

【0004】[0004]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明の一つは、出力ドライバトランジスタとし
てのMOS型トランジスタの複数個が集積され、各MO
S型トランジスタのドレインにそれぞれ出力端子が接続
されるICにおいて、出力端子の周囲をとり囲んで環状
のドレインおよびソースが順次配置されたものとする。
半導体素体のドレインおよびソースにはさまれた部分の
表面上にゲート絶縁膜を介して環状のゲートが設けられ
たことが有効である。また別の本発明は、出力ドライバ
トランジスタとしてのバイポーラトランジスタの複数個
が集積され、各バイポーラトランジスタのエミッタにそ
れぞれ出力端子が接続されるICにおいて、出力端子の
周囲をとり囲んで環状のエミッタおよびベースが順次配
置されたものとする。いずれの場合も、出力端子の輪郭
が方形であることが良い。
In order to achieve the above object, one of the present inventions is to integrate a plurality of MOS type transistors as output driver transistors, and
In an IC in which an output terminal is connected to the drain of an S-type transistor, a ring-shaped drain and a source are sequentially arranged so as to surround the output terminal.
It is effective that a ring-shaped gate is provided on the surface of the portion sandwiched between the drain and the source of the semiconductor element body via the gate insulating film. According to another aspect of the present invention, in an IC in which a plurality of bipolar transistors as output driver transistors are integrated, and an output terminal is connected to the emitter of each bipolar transistor, an annular emitter and base surrounding the output terminal are provided. Are sequentially arranged. In either case, the contour of the output terminal is preferably square.

【0005】[0005]

【作用】ドライバトランジスタの活性領域として利用さ
れるため、出力端子間に必要な距離をとっても無効領域
が生じない。ICチップは方形であるため、出力端子を
方形にすることにより、より一層無効領域の発生が少な
くなる。ドライバトランジスタとしてMOS型トランジ
スタ、バイポーラトランジスタのいずれを用いてもよ
い。
Since it is used as the active region of the driver transistor, an ineffective region does not occur even if the required distance is provided between the output terminals. Since the IC chip has a square shape, the use of a square output terminal further reduces the generation of ineffective areas. Either a MOS transistor or a bipolar transistor may be used as the driver transistor.

【0006】[0006]

【実施例】図1は本発明の一実施例の駆動用ICにおけ
るドライバトランジスタおよび出力端子の配置を示し、
図2と共通の部分には同一の符号が付されている。この
ICでは、ドライバトランジスタであるMOS型トラン
ジスタのドレイン11およびソース12が出力端子2の
周囲をとり囲むように配置されている。そして、ドレイ
ン11、ソース12の間の表面上にゲート絶縁膜を介し
て設けられるゲート5もやはり出力端子2の周囲をとり
囲んでいる。出力端子2の中心点間の距離を150μm
にするために出力端子2およびドライバトランジスタ1
はいくらかジグザグ状に配置されるから、この場合でも
無効領域4が存在するが、その面積は、ドレイン11と
ソース12の対向している部分総延長を同一として図2
の場合の1/5以上減少し、チップサイズが縮小した。
なお、この実施例では出力端子2とドレイン11と接続
する配線3は各1本であるが、複数本、例えば4本にし
てもよい。
FIG. 1 shows the layout of driver transistors and output terminals in a driving IC according to an embodiment of the present invention.
The same parts as those in FIG. 2 are designated by the same reference numerals. In this IC, the drain 11 and the source 12 of a MOS transistor, which is a driver transistor, are arranged so as to surround the output terminal 2. The gate 5 provided on the surface between the drain 11 and the source 12 via the gate insulating film also surrounds the periphery of the output terminal 2. The distance between the center points of the output terminals 2 is 150 μm
Output terminal 2 and driver transistor 1
Since they are arranged in a zigzag shape, the ineffective region 4 still exists in this case, but its area is the same as the total extension of the drain 11 and the source 12 facing each other.
1/5 or more of the case, and the chip size was reduced.
In this embodiment, the number of the wirings 3 connected to the output terminal 2 and the drain 11 is one, but a plurality of wirings, for example, four wirings may be used.

【0007】同一の効果は、ドライバトランジスタとし
てバイポーラトランジスタを用い、そのエミッタ領域と
ベース領域とを順次出力端子の周囲をとり囲むように配
置した場合にも得ることができた。
The same effect can be obtained even when a bipolar transistor is used as the driver transistor and the emitter region and the base region are sequentially arranged so as to surround the periphery of the output terminal.

【0008】[0008]

【発明の効果】本発明によれば、出力端子の周囲に出力
ドライバトランジスタを形成することにより、短絡防止
のために出力端子間の距離をとるために出力端子をジグ
ザグ状に配置することにより生ずる無効領域を大幅に排
除でき、駆動用のICチップを小形化することができ
た。その結果、1ウエーハ当たりのチップの取れ数が増
し、ICチップ価格の低減が可能になった。
According to the present invention, by forming the output driver transistor around the output terminal, the output terminals are arranged in a zigzag pattern so as to keep a distance between the output terminals to prevent a short circuit. The ineffective area can be largely eliminated, and the driving IC chip can be miniaturized. As a result, the number of chips taken per wafer is increased, and the IC chip price can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の駆動用ICチップにおける
ドライバトランジスタ部を平面図
FIG. 1 is a plan view of a driver transistor section in a driving IC chip according to an embodiment of the present invention.

【図2】従来の駆動用ICにおけるドライバトランジス
タ部を示す平面図
FIG. 2 is a plan view showing a driver transistor portion in a conventional driving IC.

【符号の説明】[Explanation of symbols]

1 ドライバトランジスタ 11 ドレイン 12 ソース 3 配線 5 ゲート 1 Driver Transistor 11 Drain 12 Source 3 Wiring 5 Gate

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】出力ドライバトランジスタとしてのMOS
型トランジスタの複数個が集積され、各MOS型トラン
ジスタのドレインにそれぞれ出力端子が接続される半導
体集積回路装置において、出力端子の周囲をとり囲んで
環状のドレインおよびソースが順次配置されたことを特
徴とする半導体集積回路装置。
1. A MOS as an output driver transistor
In a semiconductor integrated circuit device in which a plurality of MOS transistors are integrated and an output terminal is connected to the drain of each MOS transistor, an annular drain and a source are sequentially arranged so as to surround the output terminal. Semiconductor integrated circuit device.
【請求項2】半導体素体のドレインおよびソースにはさ
まれた部分の表面上にゲート絶縁膜を介して環状のゲー
トが設けられた請求項1記載の半導体集積回路装置。
2. The semiconductor integrated circuit device according to claim 1, wherein an annular gate is provided on the surface of the portion of the semiconductor body sandwiched by the drain and the source with a gate insulating film interposed therebetween.
【請求項3】出力ドライバトランジスタとしてのバイポ
ーラトランジスタの複数個が集積され、各バイポーラト
ランジスタのエミッタにそれぞれ出力端子が接続される
半導体集積回路装置において、出力端子の周囲をとり囲
んで環状のエミッタおよびベースが順次配置されたこと
を特徴とする半導体集積回路装置。
3. A semiconductor integrated circuit device in which a plurality of bipolar transistors as output driver transistors are integrated and output terminals are connected to the emitters of the bipolar transistors, respectively. A semiconductor integrated circuit device characterized in that bases are sequentially arranged.
【請求項4】出力端子の輪郭が方形である請求項1ない
し3のいずれかに記載の半導体集積回路装置。
4. The semiconductor integrated circuit device according to claim 1, wherein the contour of the output terminal is rectangular.
JP7063267A 1995-03-23 1995-03-23 Semiconductor integrated circuit device Pending JPH08264659A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7063267A JPH08264659A (en) 1995-03-23 1995-03-23 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7063267A JPH08264659A (en) 1995-03-23 1995-03-23 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPH08264659A true JPH08264659A (en) 1996-10-11

Family

ID=13224352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7063267A Pending JPH08264659A (en) 1995-03-23 1995-03-23 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPH08264659A (en)

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