JPH081972B2 - ガスレーザ発振器 - Google Patents

ガスレーザ発振器

Info

Publication number
JPH081972B2
JPH081972B2 JP3187995A JP18799591A JPH081972B2 JP H081972 B2 JPH081972 B2 JP H081972B2 JP 3187995 A JP3187995 A JP 3187995A JP 18799591 A JP18799591 A JP 18799591A JP H081972 B2 JPH081972 B2 JP H081972B2
Authority
JP
Japan
Prior art keywords
laser
magnetic field
electrodes
electrode layer
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3187995A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0537056A (ja
Inventor
隆昭 村田
清寿 寺井
徹 玉川
博勝 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP3187995A priority Critical patent/JPH081972B2/ja
Priority to DE4224023A priority patent/DE4224023A1/de
Priority to TW081105760A priority patent/TW226492B/zh
Priority to KR1019920013578A priority patent/KR960013517B1/ko
Publication of JPH0537056A publication Critical patent/JPH0537056A/ja
Priority to US08/329,663 priority patent/US5454003A/en
Publication of JPH081972B2 publication Critical patent/JPH081972B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H01S3/0326—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube by an electromagnetic field

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lasers (AREA)
JP3187995A 1991-07-29 1991-07-29 ガスレーザ発振器 Expired - Lifetime JPH081972B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP3187995A JPH081972B2 (ja) 1991-07-29 1991-07-29 ガスレーザ発振器
DE4224023A DE4224023A1 (de) 1991-07-29 1992-07-21 Gaslaseroszillator
TW081105760A TW226492B (OSRAM) 1991-07-29 1992-07-21
KR1019920013578A KR960013517B1 (ko) 1991-07-29 1992-07-29 가스레이저 발진기
US08/329,663 US5454003A (en) 1991-07-29 1994-10-26 Gas laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3187995A JPH081972B2 (ja) 1991-07-29 1991-07-29 ガスレーザ発振器

Publications (2)

Publication Number Publication Date
JPH0537056A JPH0537056A (ja) 1993-02-12
JPH081972B2 true JPH081972B2 (ja) 1996-01-10

Family

ID=16215791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3187995A Expired - Lifetime JPH081972B2 (ja) 1991-07-29 1991-07-29 ガスレーザ発振器

Country Status (5)

Country Link
US (1) US5454003A (OSRAM)
JP (1) JPH081972B2 (OSRAM)
KR (1) KR960013517B1 (OSRAM)
DE (1) DE4224023A1 (OSRAM)
TW (1) TW226492B (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725594B2 (ja) * 1994-04-28 1998-03-11 松下電器産業株式会社 気体レーザ装置
US5596593A (en) * 1996-02-09 1997-01-21 Luxar Corporation Orthogonal RFDC transverse excited gas laser
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
JP3730223B2 (ja) * 2003-01-31 2005-12-21 ファナック株式会社 ガスレーザ発振装置
DE10325512A1 (de) * 2003-06-04 2005-01-05 Thales Electron Devices Gmbh Gaslaseranordnung
EP1976346A1 (en) * 2007-03-30 2008-10-01 Ecole Polytechnique Apparatus for generating a plasma
WO2022128056A1 (de) * 2020-12-14 2022-06-23 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Laserverstärker, laser und verfahren mit quer zum e-feld verlaufendem b-feld

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004249A (en) * 1976-01-22 1977-01-18 General Motors Corporation Optical waveguide laser pumped by guided electromagnetic wave
US4672618A (en) * 1983-03-07 1987-06-09 Beckman Instruments, Inc. Laser stabilization servo system
JPS59188987A (ja) * 1983-04-11 1984-10-26 Nec Corp イオンレ−ザ装置
JPS6037189A (ja) * 1983-08-09 1985-02-26 Mitsubishi Electric Corp 無声放電励起同軸型レ−ザ発振器
US4785458A (en) * 1984-02-13 1988-11-15 Mitsubishi Denki Kabushiki Kaisha Gas laser device
US4779279A (en) * 1984-03-05 1988-10-18 Beckman Instruments, Inc. Magnetic laser control
US4755999A (en) * 1985-03-25 1988-07-05 Macken John A Laser apparatus utilizing a magnetically enhanced electrical discharge
US4849984A (en) * 1986-02-03 1989-07-18 Hill Alan E Large volume gaseous electric discharge system
JPS62291189A (ja) * 1986-06-11 1987-12-17 Nec Corp Ｈｅ−Ｎｅガスレ−ザ装置
US4730334A (en) * 1987-01-05 1988-03-08 Collins George J Ultraviolet metal ion laser
JPS63229793A (ja) * 1987-03-19 1988-09-26 Fanuc Ltd レ−ザ発振器配管系の異常検出装置
IL82545A (en) * 1987-05-15 1991-11-21 Galram Technology Ind Ltd Method and apparatus for the cooling of gas lasers
EP0295539A3 (de) * 1987-06-12 1989-06-14 Siemens Aktiengesellschaft Gaslaser
JPH025585A (ja) * 1988-06-24 1990-01-10 Fanuc Ltd レーザ発振装置
DE3926965A1 (de) * 1989-08-16 1991-02-21 Siemens Ag Gaslaser
US5048032A (en) * 1990-07-18 1991-09-10 Spectra-Physics Air cooled RF induction excited ion laser

Also Published As

Publication number Publication date
KR960013517B1 (ko) 1996-10-05
DE4224023A1 (de) 1993-02-04
TW226492B (OSRAM) 1994-07-11
JPH0537056A (ja) 1993-02-12
KR930003516A (ko) 1993-02-24
US5454003A (en) 1995-09-26

Similar Documents

Publication Publication Date Title
US4481634A (en) RF Excited metal waveguide laser
US4755999A (en) Laser apparatus utilizing a magnetically enhanced electrical discharge
JPH081972B2 (ja) ガスレーザ発振器
US5048032A (en) Air cooled RF induction excited ion laser
US4677637A (en) TE laser amplifier
US4974228A (en) Magnetic field profile for improved ion laser performance
US5115439A (en) Pole piece to shape axial magnetic field in gas laser
JPS639393B2 (OSRAM)
JPS6398171A (ja) 高周波放電励起レ−ザ装置
EP0196218B1 (en) Laser apparatus and method
JPH04167481A (ja) 気体レーザ
JPS639395B2 (OSRAM)
JP2626566B2 (ja) 固体レーザ発振器
JP2578014Y2 (ja) レーザ装置の誘電体板
JPS6339113B2 (OSRAM)
CA1153093A (en) Optical noise suppression and power enhancement in positive column lasers using magnetic fields
US20010001003A1 (en) Laser oscillation device
JPH0337318B2 (OSRAM)
JP3159528B2 (ja) 放電励起エキシマレーザ装置
JPH05315688A (ja) ガスレーザ発振器
CN1014664B (zh) 气体激光放电设备和放电方法
JP2001257397A (ja) 位相制御多電極型交流放電励起レーザ装置
JPH0671108B2 (ja) 磁気的に高められた放電を利用するレ−ザ−装置
JPS5851581A (ja) 横方向励起型ガスレ−ザ装置
JPH01260871A (ja) 無声放電ガスレーザ装置の誘電体電極冷却方法及びその装置