TW226492B - - Google Patents

Info

Publication number
TW226492B
TW226492B TW081105760A TW81105760A TW226492B TW 226492 B TW226492 B TW 226492B TW 081105760 A TW081105760 A TW 081105760A TW 81105760 A TW81105760 A TW 81105760A TW 226492 B TW226492 B TW 226492B
Authority
TW
Taiwan
Application number
TW081105760A
Other languages
Chinese (zh)
Original Assignee
Toshiba Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Co Ltd filed Critical Toshiba Co Ltd
Application granted granted Critical
Publication of TW226492B publication Critical patent/TW226492B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H01S3/0326—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube by an electromagnetic field

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lasers (AREA)
TW081105760A 1991-07-29 1992-07-21 TW226492B (OSRAM)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3187995A JPH081972B2 (ja) 1991-07-29 1991-07-29 ガスレーザ発振器

Publications (1)

Publication Number Publication Date
TW226492B true TW226492B (OSRAM) 1994-07-11

Family

ID=16215791

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081105760A TW226492B (OSRAM) 1991-07-29 1992-07-21

Country Status (5)

Country Link
US (1) US5454003A (OSRAM)
JP (1) JPH081972B2 (OSRAM)
KR (1) KR960013517B1 (OSRAM)
DE (1) DE4224023A1 (OSRAM)
TW (1) TW226492B (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI874737B (zh) * 2020-12-14 2025-03-01 德商創浦半導體製造雷射系統歐洲股份公司 磁場橫向穿過電場的雷射放大器、雷射及其操作方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725594B2 (ja) * 1994-04-28 1998-03-11 松下電器産業株式会社 気体レーザ装置
US5596593A (en) * 1996-02-09 1997-01-21 Luxar Corporation Orthogonal RFDC transverse excited gas laser
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
JP3730223B2 (ja) * 2003-01-31 2005-12-21 ファナック株式会社 ガスレーザ発振装置
DE10325512A1 (de) * 2003-06-04 2005-01-05 Thales Electron Devices Gmbh Gaslaseranordnung
EP1976346A1 (en) * 2007-03-30 2008-10-01 Ecole Polytechnique Apparatus for generating a plasma

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004249A (en) * 1976-01-22 1977-01-18 General Motors Corporation Optical waveguide laser pumped by guided electromagnetic wave
US4672618A (en) * 1983-03-07 1987-06-09 Beckman Instruments, Inc. Laser stabilization servo system
JPS59188987A (ja) * 1983-04-11 1984-10-26 Nec Corp イオンレ−ザ装置
JPS6037189A (ja) * 1983-08-09 1985-02-26 Mitsubishi Electric Corp 無声放電励起同軸型レ−ザ発振器
US4785458A (en) * 1984-02-13 1988-11-15 Mitsubishi Denki Kabushiki Kaisha Gas laser device
US4779279A (en) * 1984-03-05 1988-10-18 Beckman Instruments, Inc. Magnetic laser control
US4755999A (en) * 1985-03-25 1988-07-05 Macken John A Laser apparatus utilizing a magnetically enhanced electrical discharge
US4849984A (en) * 1986-02-03 1989-07-18 Hill Alan E Large volume gaseous electric discharge system
JPS62291189A (ja) * 1986-06-11 1987-12-17 Nec Corp Ｈｅ−Ｎｅガスレ−ザ装置
US4730334A (en) * 1987-01-05 1988-03-08 Collins George J Ultraviolet metal ion laser
JPS63229793A (ja) * 1987-03-19 1988-09-26 Fanuc Ltd レ−ザ発振器配管系の異常検出装置
IL82545A (en) * 1987-05-15 1991-11-21 Galram Technology Ind Ltd Method and apparatus for the cooling of gas lasers
EP0295539A3 (de) * 1987-06-12 1989-06-14 Siemens Aktiengesellschaft Gaslaser
JPH025585A (ja) * 1988-06-24 1990-01-10 Fanuc Ltd レーザ発振装置
DE3926965A1 (de) * 1989-08-16 1991-02-21 Siemens Ag Gaslaser
US5048032A (en) * 1990-07-18 1991-09-10 Spectra-Physics Air cooled RF induction excited ion laser

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI874737B (zh) * 2020-12-14 2025-03-01 德商創浦半導體製造雷射系統歐洲股份公司 磁場橫向穿過電場的雷射放大器、雷射及其操作方法

Also Published As

Publication number Publication date
DE4224023A1 (de) 1993-02-04
JPH0537056A (ja) 1993-02-12
JPH081972B2 (ja) 1996-01-10
KR960013517B1 (ko) 1996-10-05
KR930003516A (ko) 1993-02-24
US5454003A (en) 1995-09-26

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