JPH07501160A - 酸化ガリウムから成る薄膜及びその製造方法 - Google Patents
酸化ガリウムから成る薄膜及びその製造方法Info
- Publication number
- JPH07501160A JPH07501160A JP6502907A JP50290794A JPH07501160A JP H07501160 A JPH07501160 A JP H07501160A JP 6502907 A JP6502907 A JP 6502907A JP 50290794 A JP50290794 A JP 50290794A JP H07501160 A JPH07501160 A JP H07501160A
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- fatty acid
- acid alkanolamide
- neutralization
- carried out
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4222144.7 | 1992-07-06 | ||
DE4222144 | 1992-07-06 | ||
PCT/EP1993/001692 WO1994001792A1 (de) | 1992-07-06 | 1993-07-01 | Dünne schicht aus galliumoxid und herstellverfahren dafür |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07501160A true JPH07501160A (ja) | 1995-02-02 |
Family
ID=6462579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6502907A Pending JPH07501160A (ja) | 1992-07-06 | 1993-07-01 | 酸化ガリウムから成る薄膜及びその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5474851A (de) |
JP (1) | JPH07501160A (de) |
CH (1) | CH685137A5 (de) |
DE (1) | DE4321301A1 (de) |
WO (1) | WO1994001792A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5451548A (en) * | 1994-03-23 | 1995-09-19 | At&T Corp. | Electron beam deposition of gallium oxide thin films using a single high purity crystal source |
US5550089A (en) * | 1994-03-23 | 1996-08-27 | Lucent Technologies Inc. | Gallium oxide coatings for optoelectronic devices using electron beam evaporation of a high purity single crystal Gd3 Ga5 O12 source. |
US5597768A (en) * | 1996-03-21 | 1997-01-28 | Motorola, Inc. | Method of forming a Ga2 O3 dielectric layer |
DE19855623C1 (de) * | 1998-12-02 | 2000-02-24 | Lpkf Laser & Electronics Ag | Verfahren zur Erzeugung einer Markierung in einem Glaskörper |
US7223441B2 (en) * | 2004-03-10 | 2007-05-29 | Pilkington North America, Inc. | Method for depositing gallium oxide coatings on flat glass |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
US4331737A (en) * | 1978-04-01 | 1982-05-25 | Zaidan Hojin Handotai Kenkyu Shinkokai | Oxynitride film and its manufacturing method |
JPS5645092A (en) * | 1979-09-20 | 1981-04-24 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor luminous element |
US4371587A (en) * | 1979-12-17 | 1983-02-01 | Hughes Aircraft Company | Low temperature process for depositing oxide layers by photochemical vapor deposition |
US4595634A (en) * | 1983-08-01 | 1986-06-17 | Gordon Roy G | Coating process for making non-iridescent glass |
JPH01225315A (ja) * | 1988-03-04 | 1989-09-08 | Fuji Electric Co Ltd | スパッタリング方法 |
-
1993
- 1993-06-26 DE DE4321301A patent/DE4321301A1/de not_active Withdrawn
- 1993-07-01 CH CH634/94A patent/CH685137A5/de not_active IP Right Cessation
- 1993-07-01 JP JP6502907A patent/JPH07501160A/ja active Pending
- 1993-07-01 WO PCT/EP1993/001692 patent/WO1994001792A1/de active Application Filing
-
1994
- 1994-03-07 US US08/206,725 patent/US5474851A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5474851A (en) | 1995-12-12 |
CH685137A5 (de) | 1995-03-31 |
WO1994001792A1 (de) | 1994-01-20 |
DE4321301A1 (de) | 1994-01-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4940636A (en) | Optical interference filter | |
JP4330661B2 (ja) | 高屈折率と機械的耐磨耗性を有する酸化タンタルベースの無機ポリマー材料、その製法、および当該ポリマーを含む光学材料 | |
JP3808917B2 (ja) | 薄膜の製造方法及び薄膜 | |
JPS6366904B2 (de) | ||
US6180188B1 (en) | Method for preparing a multilayer optical material with crosslinking-densifying by ultraviolet radiation | |
JPS59213643A (ja) | 弗化マグネシウム層を基体上に設ける方法 | |
JPH03505611A (ja) | 赤外線透過性材料 | |
JP3723580B2 (ja) | 中程度の屈折率の光学コーテイング製造用の蒸気析出素材 | |
JPH06235803A (ja) | 高屈折の光学コーテイング製造用の蒸気析出素材 | |
JPH07501160A (ja) | 酸化ガリウムから成る薄膜及びその製造方法 | |
US1982774A (en) | Mirror | |
US6087014A (en) | Optical coatings of medium refractive index | |
JP5008807B2 (ja) | 高屈折率光学層製造用蒸着材料および蒸着材料の製造方法 | |
US3837884A (en) | Method of producing blue colored transparent layers | |
JPS6348502A (ja) | 反射鏡 | |
JPS62207728A (ja) | 成形用ガラス素材 | |
JP2001515542A (ja) | 光学的に使用可能なフッ化物薄膜の製造方法およびそのようにして製造された薄膜 | |
JPS5941163B2 (ja) | 多層干渉膜 | |
JPS6363002A (ja) | レ−ザ用反射鏡 | |
JP7188321B2 (ja) | 光吸収構造体及び光吸収構造体の製造方法 | |
JPH10339802A (ja) | 光学薄膜 | |
SU614050A1 (ru) | Светопоглощающее покрытие | |
Fulton et al. | Ion-Assisted-Deposition using a High-Output End-Hall Ion Source | |
JPH03183761A (ja) | 蒸着法 | |
JPS58136001A (ja) | 合成樹脂製レンズの反射防止膜 |