JPH0749791Y2 - 枚葉式スピン乾燥装置 - Google Patents
枚葉式スピン乾燥装置Info
- Publication number
- JPH0749791Y2 JPH0749791Y2 JP1989034389U JP3438989U JPH0749791Y2 JP H0749791 Y2 JPH0749791 Y2 JP H0749791Y2 JP 1989034389 U JP1989034389 U JP 1989034389U JP 3438989 U JP3438989 U JP 3438989U JP H0749791 Y2 JPH0749791 Y2 JP H0749791Y2
- Authority
- JP
- Japan
- Prior art keywords
- work
- peripheral
- wafer
- center
- spin dryer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000002093 peripheral effect Effects 0.000 claims description 24
- 210000000078 claw Anatomy 0.000 claims description 15
- 238000001035 drying Methods 0.000 claims description 13
- 230000005484 gravity Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
Landscapes
- Drying Of Solid Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989034389U JPH0749791Y2 (ja) | 1989-03-28 | 1989-03-28 | 枚葉式スピン乾燥装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989034389U JPH0749791Y2 (ja) | 1989-03-28 | 1989-03-28 | 枚葉式スピン乾燥装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02127033U JPH02127033U (enrdf_load_stackoverflow) | 1990-10-19 |
JPH0749791Y2 true JPH0749791Y2 (ja) | 1995-11-13 |
Family
ID=31538817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989034389U Expired - Lifetime JPH0749791Y2 (ja) | 1989-03-28 | 1989-03-28 | 枚葉式スピン乾燥装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0749791Y2 (enrdf_load_stackoverflow) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
JPS60163436A (ja) * | 1984-02-06 | 1985-08-26 | Seiichiro Sogo | 半導体材料の洗浄乾燥方法 |
JPS63185029A (ja) * | 1987-01-28 | 1988-07-30 | Hitachi Ltd | ウエハ処理装置 |
-
1989
- 1989-03-28 JP JP1989034389U patent/JPH0749791Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH02127033U (enrdf_load_stackoverflow) | 1990-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |