JPH0745956Y2 - キャリア洗浄処理装置 - Google Patents

キャリア洗浄処理装置

Info

Publication number
JPH0745956Y2
JPH0745956Y2 JP1987067625U JP6762587U JPH0745956Y2 JP H0745956 Y2 JPH0745956 Y2 JP H0745956Y2 JP 1987067625 U JP1987067625 U JP 1987067625U JP 6762587 U JP6762587 U JP 6762587U JP H0745956 Y2 JPH0745956 Y2 JP H0745956Y2
Authority
JP
Japan
Prior art keywords
carrier
cleaning
pressure
cleaning liquid
pressure injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987067625U
Other languages
English (en)
Japanese (ja)
Other versions
JPS63177031U (enrdf_load_stackoverflow
Inventor
康夫 上村
寿朗 大森
基典 柳
隼明 福本
正治 浜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1987067625U priority Critical patent/JPH0745956Y2/ja
Priority to DE3815018A priority patent/DE3815018A1/de
Publication of JPS63177031U publication Critical patent/JPS63177031U/ja
Priority to US07/402,988 priority patent/US4941489A/en
Application granted granted Critical
Publication of JPH0745956Y2 publication Critical patent/JPH0745956Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
JP1987067625U 1987-05-06 1987-05-06 キャリア洗浄処理装置 Expired - Lifetime JPH0745956Y2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1987067625U JPH0745956Y2 (ja) 1987-05-06 1987-05-06 キャリア洗浄処理装置
DE3815018A DE3815018A1 (de) 1987-05-06 1988-05-03 Traegerreinigungs- und -trocknungsvorrichtung
US07/402,988 US4941489A (en) 1987-05-06 1989-09-05 Carrier cleaning and drying apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987067625U JPH0745956Y2 (ja) 1987-05-06 1987-05-06 キャリア洗浄処理装置

Publications (2)

Publication Number Publication Date
JPS63177031U JPS63177031U (enrdf_load_stackoverflow) 1988-11-16
JPH0745956Y2 true JPH0745956Y2 (ja) 1995-10-18

Family

ID=30906703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987067625U Expired - Lifetime JPH0745956Y2 (ja) 1987-05-06 1987-05-06 キャリア洗浄処理装置

Country Status (1)

Country Link
JP (1) JPH0745956Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113600585A (zh) * 2021-08-12 2021-11-05 江苏中科晶元信息材料有限公司 一种晶元篮清洗装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56149446U (enrdf_load_stackoverflow) * 1980-04-08 1981-11-10
JPS5783036A (en) * 1980-11-10 1982-05-24 Seiichiro Sogo Cleaning device for semiconductor material
JPS57191042U (enrdf_load_stackoverflow) * 1981-05-28 1982-12-03
JPS6118958A (ja) * 1984-07-04 1986-01-27 Mitsubishi Electric Corp 半導体装置用ガラスマスクの洗浄方法
JPS6188235U (enrdf_load_stackoverflow) * 1984-11-15 1986-06-09

Also Published As

Publication number Publication date
JPS63177031U (enrdf_load_stackoverflow) 1988-11-16

Similar Documents

Publication Publication Date Title
JP3990073B2 (ja) 基板洗浄装置及び基板洗浄方法
US4941489A (en) Carrier cleaning and drying apparatus
JP2001007069A5 (ja) 基板洗浄装置及び基板洗浄方法
JPH0568092B2 (enrdf_load_stackoverflow)
JPH08238463A (ja) 洗浄方法及び洗浄装置
JPS63136528A (ja) 処理液塗布装置
WO2019163651A1 (ja) 基板洗浄装置および基板洗浄方法
JPH10308374A (ja) 洗浄方法及び洗浄装置
JPH06151397A (ja) ウエハ洗浄装置
JPH0786218A (ja) 基板洗浄装置
JPH1187288A (ja) 基板洗浄方法および該洗浄方法に用いられる洗浄装置
JP2617535B2 (ja) 洗浄装置
JPH10335283A (ja) 洗浄設備及び洗浄方法
JPH0745956Y2 (ja) キャリア洗浄処理装置
KR101040289B1 (ko) 반도체 후면 세정을 위한 메가소닉 세정 시스템
JP3441304B2 (ja) 基板処理装置および方法
KR20110077705A (ko) 매엽식 웨이퍼 세정 장치 및 방법
JPH0745957Y2 (ja) キャリア洗浄乾燥装置
JPH06120192A (ja) 両面スクラブ洗浄装置
KR102134261B1 (ko) 기판 처리 장치 및 기판 처리 방법
KR100529432B1 (ko) 반도체 기판의 세정 장치
JP2001334219A (ja) スピン処理装置及びスピン処理方法
JPH10189526A (ja) レチクルの洗浄方法及びその装置
KR100645217B1 (ko) 웨이퍼 세정장치 및 세정 방법
KR20060025329A (ko) 웨이퍼 세정장치