JPH0737311Y2 - 処理装置の気泡発生防止装置 - Google Patents

処理装置の気泡発生防止装置

Info

Publication number
JPH0737311Y2
JPH0737311Y2 JP1990032816U JP3281690U JPH0737311Y2 JP H0737311 Y2 JPH0737311 Y2 JP H0737311Y2 JP 1990032816 U JP1990032816 U JP 1990032816U JP 3281690 U JP3281690 U JP 3281690U JP H0737311 Y2 JPH0737311 Y2 JP H0737311Y2
Authority
JP
Japan
Prior art keywords
processing
tank
discharge port
substrate
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990032816U
Other languages
English (en)
Japanese (ja)
Other versions
JPH03124635U (US07321065-20080122-C00160.png
Inventor
均 佐藤
Original Assignee
株式会社芝浦製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社芝浦製作所 filed Critical 株式会社芝浦製作所
Priority to JP1990032816U priority Critical patent/JPH0737311Y2/ja
Publication of JPH03124635U publication Critical patent/JPH03124635U/ja
Application granted granted Critical
Publication of JPH0737311Y2 publication Critical patent/JPH0737311Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP1990032816U 1990-03-30 1990-03-30 処理装置の気泡発生防止装置 Expired - Lifetime JPH0737311Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990032816U JPH0737311Y2 (ja) 1990-03-30 1990-03-30 処理装置の気泡発生防止装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990032816U JPH0737311Y2 (ja) 1990-03-30 1990-03-30 処理装置の気泡発生防止装置

Publications (2)

Publication Number Publication Date
JPH03124635U JPH03124635U (US07321065-20080122-C00160.png) 1991-12-17
JPH0737311Y2 true JPH0737311Y2 (ja) 1995-08-23

Family

ID=31536016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990032816U Expired - Lifetime JPH0737311Y2 (ja) 1990-03-30 1990-03-30 処理装置の気泡発生防止装置

Country Status (1)

Country Link
JP (1) JPH0737311Y2 (US07321065-20080122-C00160.png)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009032217A1 (de) * 2009-07-06 2011-01-13 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zur Behandlung von Substraten
JP2011106888A (ja) * 2009-11-13 2011-06-02 Aloka Co Ltd 液体計量容器および液体計量装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6319331U (US07321065-20080122-C00160.png) * 1986-07-25 1988-02-08

Also Published As

Publication number Publication date
JPH03124635U (US07321065-20080122-C00160.png) 1991-12-17

Similar Documents

Publication Publication Date Title
JPH07132262A (ja) 浸漬式の液処理装置
JP2900788B2 (ja) 枚葉式ウェーハ処理装置
JP3573504B2 (ja) 半導体装置の製造方法
JPH0737311Y2 (ja) 処理装置の気泡発生防止装置
US5743280A (en) Apparatus for cleansing semiconductor wafer
JPH10172945A (ja) ウエハー洗浄装置
JPH08215648A (ja) 下降整流式浸漬洗浄装置
JPH06333899A (ja) 薬液処理方法およびその処理装置
JPH0499025A (ja) 水洗装置
JP2703424B2 (ja) 洗浄装置
JP3068404B2 (ja) 半導体基板洗浄装置
JP3067398B2 (ja) 噴流式ウェットエッチング装置
JPH06291102A (ja) 基板の洗浄装置
JPH05243202A (ja) 枚葉式半導体製造ウェット処理装置
JP2571261Y2 (ja) 半導体ウェーハ洗浄装置
JP2564065B2 (ja) 回転塗布方法およびその装置
KR930000402Y1 (ko) 튜브의 고효율 세정장치
KR100313518B1 (ko) 웨이퍼 세정장치
KR0161865B1 (ko) 제트노즐을 이용한 반도체웨이퍼 세정장치
JPS60234985A (ja) レチクルケ−スの洗浄装置
JPS63160233A (ja) 鏡面ウエハの洗浄方法
JP3191379B2 (ja) ウェハ乾燥装置と半導体装置の製造方法
JPH0684785A (ja) 浸漬式の液処理装置
JPH04118067A (ja) 塗布装置および塗布処理方法
KR100646060B1 (ko) 현상방법 및 현상장치