JPH0737311Y2 - Bubble prevention device for processing equipment - Google Patents

Description

[Detailed Description of the Invention] << Industrial Application Field >> The present invention relates to a cleaning line for cleaning a glass substrate, a silicon wafer, a ceramic chip (hereinafter referred to as a substrate) used for a liquid crystal display element with a detergent, The present invention relates to a bubble generation preventing device of a processing device such as a developing line for showering a developing solution on a substrate.

<< Prior Art >> Conventionally, for example, a substrate (glass substrate) has been used for a liquid crystal display element, and if impurities such as dust and fluff adhere to the substrate, unexpected troubles ( For example, it may cause uneven alignment of liquid crystal molecules, defective sealing, short circuit between the segment electrode and the common electrode, and the like.

For this reason, conventionally, the substrate is cleaned at the beginning of the manufacturing process of the liquid crystal element, for example, using a cleaning line as shown in FIG.

That is, the glass substrate carried into the line in the direction of arrow a is first carried into the shower chamber c by the loader b, and the processing liquid (cleaning liquid) is applied to the substrate, and then the brush cleaning chamber d.
After being cleaned with a brush in (1), the processing liquid adhering to the substrate is drained in the liquid draining chamber (e) by using, for example, cold air.

After that, it is cleaned in a jet cleaning chamber f with a jet stream of pure water or the like, further dried in a drying chamber i through a shower chamber g, an ultrasonic cleaning chamber h, and then dried by an unloader j.
It is being carried out more.

In the cleaning line as described above, the processing apparatus B as shown in FIG. 4 is used in the shower room c, the brush cleaning room d and the like. This processing apparatus is composed of a processing tank k having a discharge port m at the bottom and a tank n. The processing tank k (in the case of a brush cleaning chamber, a rotary brush is added) is used to transfer the processing liquid supplied from the pump 1 to the substrate o through the nozzle in the vertical direction (even if only one direction is required). The substrate o is cleaned by spraying.

Further, after the cleaning, the processing liquid is dropped into the tank n through the discharge port m provided at the bottom of the processing tank k and collected, and then circulated again in the processing tank k by the pump l. Has become.

<< Problems to be Solved by the Invention >> In the processing tank k of the processing apparatus B of the conventional cleaning line described above, when the processing solution that has been cleaned falls from the discharge port m into the tank n, air is trapped in the processing solution. Bubbles p are generated in the tank, and the bubbles p are circulated to the treatment tank k by the pump 1 together with the treatment liquid, or the bubbles p generated in the tank n overflow and reach the treatment tank k, which causes uneven cleaning. This may cause a defective product of the substrate o or a failure of the pump l.

The present invention has been made in order to improve the above problems, and an object of the present invention is to provide a bubble generation preventing device for a processing device, which prevents bubbles from being generated in a processing tank.

<Means for Solving the Problems> In order to achieve the above object, the present invention provides a treatment tank, a discharge port provided at the bottom of the treatment tank, and a discharge port provided below the treatment tank. In the processing device including the tank for collecting the processing liquid, the spiral plate is provided in the discharge port.

<< Operation >> With this configuration, when the processing liquid after cleaning the substrate is recovered from the processing tank into the tank through the discharge port,
Since air is less likely to be entrapped in the processing liquid,
It is possible to minimize the generation of bubbles in the processing liquid.

<< Embodiment >> An embodiment of the present invention will be described in detail below with reference to the drawings shown in FIGS. 1 and 2.

FIG. 1 shows a sectional view of a processing apparatus A such as a shower room of a cleaning line, a brush cleaning room, a shower room of a developing line, and the like.
The processing apparatus A is provided in the processing tank 1, a discharge port 7 provided at the bottom of the processing tank 1, a tank 8 for collecting the processing liquid from the discharge port 7, and the discharge port 7. And a bubble generation preventing device 10 including a spiral plate 13 and the like.

An upper surface of the processing tank 1 is opened, and the opening is inclined with respect to the substrate surface. The opening is closed by an openable / closable lid 2.

A transfer device 4 for transferring the substrate 3 to be cleaned is provided in the processing tank 1, and a shower nozzle 5 (either one of them may be provided if necessary) is provided above and below the transfer device 4. is set up. The shower nozzle 5 is connected to a pump 6 provided outside the processing tank 1,
The processing liquid supplied from the pump 6 is jetted from the shower nozzle 5 onto the substrate 3 on the transfer device 4 from above and below,
The substrate 3 is cleaned.

On the other hand, the processing liquid after the cleaning of the substrate 3 is collected in the discharge port 7 provided at the bottom of the processing tank 1 and drops from the discharge port 7 into the tank 8 installed below the processing tank 1. It is like this.

The discharge port 7 is formed in a tubular shape, and the lower end is a tank 8
A bubble generation preventing device 10 is provided in the discharge port 7 while reaching the vicinity of the bottom of the device. This bubble prevention device 10
Is a core rod 12 which is located at the center of the discharge port 7 and whose upper and lower ends are fixed to the upper and lower ends of the discharge port 7 by brackets 11,
A spiral plate 13 is provided on the core rod 12 in a spiral shape as a means for alleviating a drop impact of the processing liquid.
The outer peripheral portion of is close to or in contact with the inner peripheral surface of the outlet 7.

Then, the processing liquid dropped into the tank 8 through the spiral plate 13 of the bubble generation preventing device 10 and collected is again circulated into the processing tank 1 by the pump 6.

Next, the operation will be described. The processing liquid supplied into the processing bath 1 by the pump 6 is sprayed from the shower nozzle 5 onto the substrate 3 from above and below, and is used for cleaning the substrate 3. At this time, bubbles are mixed in the treatment liquid.

When the processing liquid that has washed the substrate 3 drops into the tank 8 from the discharge port 7 at the bottom of the processing tank 1, the processing liquid is guided by the spiral plate 13 of the bubble generation preventing device 10 and swirled as shown by the arrow while the tank 8 is being rotated. Since it reaches the inside, there is almost no foaming caused by the entrainment of air, which can minimize the generation of bubbles in the processing liquid. Also,
As is clear from FIG. 1, the lower end of the discharge port 7 is the tank 8
Since it reaches the vicinity of the bottom of the processing liquid, it is not affected by the effect of mitigating the drop impact even when the processing liquid fluctuates up and down. Further, even with the treatment liquid containing bubbles, the treatment liquid slowly drops in a long flow path while swirling by the spiral plate 13, so that the bubbles disappear.

In the above embodiment, the treatment liquid is stored in the tank 8 by the spiral plate 13.
Although the falling speed is slowed down, similar baffle prevention effect can be obtained even if the baffle plates 14 are alternately provided in the discharge port 7 as shown in FIG. To be

Further, since the opening of the processing tank 1 is configured to be inclined with respect to the substrate surface, water droplets and the like attached to the inner surface of the lid 2 will not fall on the substrate 3, so that processing irregularities due to water droplets and the like occur. Absent.

<Effects of the Invention> As described in detail above, the present invention reduces the impact of the processing liquid falling from the discharge port into the tank after the cleaning of the substrate by the spiral plate. Occurrence can be prevented to a minimum.

As a result, it is not circulated in the processing tank of the air bubble processing equipment that is mixed in the processing liquid, so uneven cleaning of the substrate due to air bubbles, pump failure, outflow of bubbles from the tank, and invasion of bubbles into the processing bath. It is possible to eliminate inconveniences such as

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a processing device and a bubble generation preventing device according to an embodiment of the present invention, FIG. 2 is an explanatory view showing another embodiment of the bubble generation preventing device, and FIG. 3 is an explanatory view of a cleaning line. Fourth
The figure is an illustration of the processing apparatus. 1 ... Processing tank, 3 ... Substrate, 7 ... Discharge port, 8 ... Tank, 10 ... Bubble generation prevention device, A, B ... Processing device.

Claims (1)

[Scope of utility model registration request] 1. A processing apparatus comprising a processing tank, a discharge port provided at the bottom of the processing tank, and a tank provided below the processing tank for collecting the processing liquid from the discharge port,
A bubble generation preventing device for a processing apparatus, wherein a spiral plate is provided in the discharge port.