JPH0735295Y2 - イオン注入装置 - Google Patents
イオン注入装置Info
- Publication number
- JPH0735295Y2 JPH0735295Y2 JP1989143826U JP14382689U JPH0735295Y2 JP H0735295 Y2 JPH0735295 Y2 JP H0735295Y2 JP 1989143826 U JP1989143826 U JP 1989143826U JP 14382689 U JP14382689 U JP 14382689U JP H0735295 Y2 JPH0735295 Y2 JP H0735295Y2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- chamber
- sample
- gate valve
- front chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001816 cooling Methods 0.000 claims description 6
- 238000010884 ion-beam technique Methods 0.000 claims description 6
- 238000005468 ion implantation Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 210000002159 anterior chamber Anatomy 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989143826U JPH0735295Y2 (ja) | 1989-12-13 | 1989-12-13 | イオン注入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989143826U JPH0735295Y2 (ja) | 1989-12-13 | 1989-12-13 | イオン注入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0382552U JPH0382552U (enrdf_load_stackoverflow) | 1991-08-22 |
| JPH0735295Y2 true JPH0735295Y2 (ja) | 1995-08-09 |
Family
ID=31690579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989143826U Expired - Fee Related JPH0735295Y2 (ja) | 1989-12-13 | 1989-12-13 | イオン注入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0735295Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7794486B2 (en) * | 2005-12-15 | 2010-09-14 | Kimberly-Clark Worldwide, Inc. | Therapeutic kit employing a thermal insert |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4926151A (enrdf_load_stackoverflow) * | 1972-07-04 | 1974-03-08 | ||
| JPS57152653A (en) * | 1981-03-17 | 1982-09-21 | Ulvac Corp | Wafer processing equipment for ion implanting device |
| JPS63200452A (ja) * | 1987-02-16 | 1988-08-18 | Nec Corp | 線状電子ビ−ム装置 |
-
1989
- 1989-12-13 JP JP1989143826U patent/JPH0735295Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0382552U (enrdf_load_stackoverflow) | 1991-08-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |