JPH07275771A - Coating applicator for paste - Google Patents

Coating applicator for paste

Info

Publication number
JPH07275771A
JPH07275771A JP6072151A JP7215194A JPH07275771A JP H07275771 A JPH07275771 A JP H07275771A JP 6072151 A JP6072151 A JP 6072151A JP 7215194 A JP7215194 A JP 7215194A JP H07275771 A JPH07275771 A JP H07275771A
Authority
JP
Japan
Prior art keywords
paste
substrate
nozzle
nozzles
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6072151A
Other languages
Japanese (ja)
Other versions
JP2880642B2 (en
Inventor
Shigeru Ishida
茂 石田
Haruo Sankai
春夫 三階
Fukuo Yoneda
福男 米田
Satoshi Hachiman
聡 八幡
Yukihiro Kawasumi
幸宏 川隅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Plant Technologies Ltd
Original Assignee
Hitachi Techno Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Techno Engineering Co Ltd filed Critical Hitachi Techno Engineering Co Ltd
Priority to JP6072151A priority Critical patent/JP2880642B2/en
Priority to KR1019950007696A priority patent/KR0159421B1/en
Publication of JPH07275771A publication Critical patent/JPH07275771A/en
Application granted granted Critical
Publication of JP2880642B2 publication Critical patent/JP2880642B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
    • B05C5/0212Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To apply and form plural paste patterns of a desired form on a substrate simultaneously, with high precision and at high speed by making the control of the opposite distance between a nozzle and the substrate be independent of that of the horizontal relative movement of the two. CONSTITUTION:This applicator is provided with nozzles 1a, 1b, optical range finders 3a, 3b for individually measuring the opposite distance between an discharge port of each nozzle and the surface of a substrate 7, tables 6, 8 controlled by a main controller 14a and for horizontally and relatively moving each nozzle and the substrate 7, and an auxiliary controller 14b for individually controlling the opposite distance between the discharge port of each nozzle and the surface of the substrate 7 by using data of each optical range finder 3a, 3b on the relative movement.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、テーブル上に載置した
基板上に複数のノズルからペ−ストを吐出させながら該
基板と該ノズルとを相対的に移動させることにより、該
基板上に所望形状の複数のペーストパターンを同時に塗
布描画するペースト塗布機に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate placed on a table by moving the substrate relative to the substrate while ejecting the paste from the nozzles. The present invention relates to a paste applicator for simultaneously applying and drawing a plurality of paste patterns having a desired shape.

【0002】[0002]

【従来の技術】ペーストが収納されたペースト収納筒の
先端に固定されたノズルに、テーブル上に載置された基
板を対向させ、ノズルのペースト吐出口からペーストを
吐出させながら該ノズルと該基板の少なくともいずれか
一方を水平方向に移動させて相対位置関係を変化させる
ことにより、基板上に所望のパタ−ンでペ−ストを塗布
する吐出描画技術を用いたペースト塗布機の一例が、例
えば特開平2−52742号公報に記載されている。
2. Description of the Related Art A substrate mounted on a table is opposed to a nozzle fixed to the tip of a paste accommodating cylinder in which a paste is accommodated, and the nozzle and the substrate are ejected while ejecting the paste from a paste ejection port of the nozzle. An example of a paste applicator using a discharge drawing technique for applying a paste in a desired pattern on a substrate by moving at least one of the two in the horizontal direction to change the relative positional relationship, It is described in JP-A-2-52742.

【0003】かかるペースト塗布機は、1つのノズル
と、このノズルや基板の位置を制御する制御装置とを備
えており、基板として使用する絶縁基板上にノズル先端
のペースト吐出口から抵抗ペ−ストを吐出させることに
より、この絶縁基板上に所望の抵抗ペーストパタ−ンを
形成していくというものである。
Such a paste applicator is equipped with one nozzle and a control device for controlling the positions of the nozzle and the substrate, and a paste paste discharge port at the tip of the nozzle is used to form a resistance paste on an insulating substrate used as the substrate. Is discharged to form a desired resistance paste pattern on the insulating substrate.

【0004】[0004]

【発明が解決しようとする課題】ところで、ペーストパ
タ−ンを塗布描画しようとする基板表面には通常、僅か
なうねりがあるので、描画したペ−ストについて塗布箇
所のみならず塗布幅や塗布高さにも高い精度が要求され
る場合には、ノズルと基板を水平方向において相対的に
移動させつつ、ノズルと基板表面との対向間隔を計測し
て該間隔が所望の範囲に収まるように制御する必要があ
る。そして、従来技術ではこのような動作の全てを1台
の制御装置が管理しているが、制御が複雑なため描画速
度が遅く、量産工場ではかかるペ−スト描画工程で生産
速度や生産量が決定されてしまう傾向がある。したがっ
て、生産性を高めるためには複数のペースト塗布機を設
置しなければならないが、その場合、生産ラインが複雑
化し、また生産現場のスペース拡張も必要となるので、
イニシャルコストが嵩んで製品価格の上昇を余儀なくさ
れてしまう。
By the way, since there is usually a slight undulation on the surface of the substrate on which the paste pattern is applied and drawn, not only the applied portion but also the applied width and applied height of the drawn paste. When high accuracy is required, the nozzle and the substrate are moved relatively in the horizontal direction, and the facing distance between the nozzle and the substrate surface is measured and controlled so that the distance falls within a desired range. There is a need to. In the prior art, all such operations are managed by one control device, but the drawing speed is slow because the control is complicated, and the production speed and the amount of production in the paste drawing process are large in the mass production plant. It tends to be decided. Therefore, in order to improve productivity, it is necessary to install multiple paste applicators, but in that case, the production line becomes complicated and it is necessary to expand the space of the production site.
The initial cost increases and the product price is forced to rise.

【0005】それゆえ、本発明の目的は、かかる従来技
術の課題を解消し、基板上に所望形状の複数のペースト
パターンを同時に高精度に、しかも高速に塗布描画する
ことができるペースト塗布機を提供することにある。
Therefore, an object of the present invention is to solve the above-mentioned problems of the prior art and to provide a paste coating machine capable of coating and drawing a plurality of paste patterns of a desired shape on a substrate simultaneously with high precision and at high speed. To provide.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、本発明は、ノズルのペースト吐出口と対向するよう
に基板をテーブル上に載置し、ペースト収納筒に収納し
たペーストを上記吐出口から上記基板上へ吐出させなが
ら該ノズルと該基板との相対位置関係を変化させ、該基
板上に所望形状のペーストパターンを描画形成するペー
スト塗布機において、複数のノズルと、これら各ノズル
のペースト吐出口と上記基板の表面との対向間隔を個別
に計測する複数の計測手段と、上記各ノズルと上記基板
とを水平方向に相対的に移動させる移動手段と、この相
対的移動時における上記各計測手段の計測デ−タを用い
て上記各ノズルのペースト吐出口と上記基板の表面との
対向間隔を個別に制御する制御手段とを備える構成とし
た。
In order to achieve the above object, according to the present invention, a substrate is placed on a table so as to face a paste discharge port of a nozzle, and the paste stored in a paste storage cylinder is discharged as described above. In a paste coating machine that changes the relative positional relationship between the nozzle and the substrate while ejecting from the outlet onto the substrate, and forms and forms a paste pattern of a desired shape on the substrate, a plurality of nozzles and the nozzles A plurality of measuring means for individually measuring the facing distance between the paste ejection port and the surface of the substrate, a moving means for relatively moving the nozzles and the substrate in the horizontal direction, and the moving means for moving the nozzles relative to each other. The control means is provided for individually controlling the facing distance between the paste ejection port of each nozzle and the surface of the substrate by using the measurement data of each measurement means.

【0007】[0007]

【作用】本発明においては、各ノズルと基板とを水平方
向に相対的に移動させる移動手段と、各ノズルのペース
ト吐出口と基板表面との対向間隔を個別に制御する制御
手段とが区別されていて、この対向間隔の制御を、水平
方向の相対的移動の制御に対して独立して処理すること
ができるので、各計測手段による計測周期を短くして計
測回数を多くすることにより対向間隔が高精度に制御で
き、そのため各ノズルをそれぞれ対向する基板表面のう
ねりに追従させながら該基板上にペーストを吐出してい
くことができて、所望形状の複数のペーストパターンが
同時に得られる。
In the present invention, the moving means for moving the nozzles and the substrate relatively in the horizontal direction and the controlling means for individually controlling the facing distance between the paste discharge port of each nozzle and the substrate surface are distinguished. However, since the control of the facing interval can be processed independently of the control of the relative movement in the horizontal direction, the facing interval can be increased by shortening the measurement cycle of each measuring means and increasing the number of measurements. Can be controlled with high precision, and therefore, the paste can be discharged onto the substrate while causing the nozzles to follow the undulations of the opposing substrate surfaces, and a plurality of paste patterns having a desired shape can be obtained at the same time.

【0008】[0008]

【実施例】以下、本発明の実施例を図面を用いて説明す
る。
Embodiments of the present invention will be described below with reference to the drawings.

【0009】図1は本発明によるペ−スト塗布機の一実
施例を示す概略斜視図であって、1a,1bはノズル、
2a,2bはペ−スト収納筒(またはシリンジ)、3
a,3bは光学式距離計、4a,4bはZ軸テ−ブル、
5はX軸テーブル、6はY軸テーブル、7はペーストパ
ターンが描画される基板、8はθ軸テーブル、9は架台
部、10はZ軸テーブル支持部、11a,11bは画像
認識カメラ、12a,12bはノズル支持具、13は基
板7を吸着固定している吸着台、14aは主制御装置、
14bは副制御装置、15は画像処理装置、16は外部
記憶装置、17は画像モニタ、18は両制御装置14
a,14bによる制御処理状況を表示するディスプレ
イ、19はキーボード、20a,20bはそれぞれ画像
認識カメラ11a,11bの鏡筒、21aおよび21c
〜21eはサーボモータ、22はカメラ支持部である。
なお、図面の煩雑化を避けるため、Z軸テーブル支持部
10に対するZ軸テ−ブル4a,4bのX軸テーブルお
よびY軸テーブルは図示省略してある。
FIG. 1 is a schematic perspective view showing an embodiment of a paste coating machine according to the present invention, in which 1a and 1b are nozzles,
2a and 2b are paste storage cylinders (or syringes), 3
a and 3b are optical rangefinders, 4a and 4b are Z-axis tables,
5 is an X-axis table, 6 is a Y-axis table, 7 is a substrate on which a paste pattern is drawn, 8 is a θ-axis table, 9 is a mount part, 10 is a Z-axis table support part, 11a and 11b are image recognition cameras, and 12a. , 12b is a nozzle support, 13 is a suction table for suction-fixing the substrate 7, 14a is a main controller,
14b is a sub-control device, 15 is an image processing device, 16 is an external storage device, 17 is an image monitor, and 18 is both control devices 14
A display for displaying the control processing status by a and 14b, 19 is a keyboard, 20a and 20b are lens barrels of the image recognition cameras 11a and 11b, 21a and 21c, respectively.
21e is a servo motor, and 22 is a camera support.
Note that the X-axis table and the Y-axis table of the Z-axis tables 4a and 4b for the Z-axis table support portion 10 are not shown in order to avoid complication of the drawing.

【0010】同図において、架台部9上にX軸テーブル
5が固定され、このX軸テーブル5上にX軸方向に移動
可能にY軸テーブル6が搭載されている。そして、この
Y軸テーブル6上にY軸方向に移動可能かつ回動可能に
θ軸テーブル8が搭載され、このθ軸テーブル8上に吸
着台13が固定されている。この吸着台13上に基板7
が、例えばその各辺がX,Y各軸方向に平行となるよう
に、吸着されて固定される。
In FIG. 1, an X-axis table 5 is fixed on a gantry 9, and a Y-axis table 6 is mounted on the X-axis table 5 so as to be movable in the X-axis direction. The θ-axis table 8 is mounted on the Y-axis table 6 so as to be movable and rotatable in the Y-axis direction, and the suction table 13 is fixed on the θ-axis table 8. The substrate 7 is placed on the suction table 13.
However, it is adsorbed and fixed, for example, so that its sides are parallel to the X and Y axis directions.

【0011】そして、吸着台13上に搭載された基板7
は、主制御装置14aの制御駆動により、X,Y各軸方
向に移動することができる。即ち、サーボモータ21a
が主制御装置14aにより駆動されると、Y軸テーブル
6がX軸方向に移動して基板7がX軸方向へ移動し、図
3に示すサーボモータ21bが主制御装置14aにより
駆動されると、θ軸テーブル8がY軸方向に移動して基
板7がY軸方向へ移動する。したがって、主制御装置1
4aによりY軸テーブル6とθ軸テーブル8とをそれぞ
れ任意の距離だけ移動させると、基板7は架台部9に平
行な面内で任意の方向に任意の距離だけ移動することに
なる。なお、θ軸テーブル8は、サーボモータ21eに
より、その中心位置を中心にθ方向に任意量だけ回動さ
せることができる。
The substrate 7 mounted on the suction table 13
Can be moved in the X and Y axis directions by the control drive of the main controller 14a. That is, the servo motor 21a
Is driven by the main controller 14a, the Y-axis table 6 moves in the X-axis direction, the substrate 7 moves in the X-axis direction, and the servo motor 21b shown in FIG. 3 is driven by the main controller 14a. , The θ-axis table 8 moves in the Y-axis direction, and the substrate 7 moves in the Y-axis direction. Therefore, the main controller 1
When the Y-axis table 6 and the θ-axis table 8 are moved by arbitrary distances by 4a, the substrate 7 is moved by an arbitrary distance in an arbitrary direction within a plane parallel to the gantry 9. It should be noted that the θ-axis table 8 can be rotated by an arbitrary amount in the θ direction around the center position thereof by the servo motor 21e.

【0012】また、架台部9上にはZ軸テーブル支持部
10が設置されており、これにZ軸方向(上下方向)に
移動可能にZ軸テーブル4a,4bが取り付けられてい
る。そして、一方のZ軸テーブル4aにはノズル1aや
ペースト収納筒2aや光学式距離計3aが載置されてお
り、他方のZ軸テーブル4bにはノズル1bやペースト
収納筒2bや光学式距離計3bが載置されている。これ
らZ軸テーブル4a,4bのZ軸方向の制御駆動は、副
制御装置14bによって行なわれる。即ち、サーボモー
タ21c,21dが副制御装置14bにより駆動される
と、Z軸テーブル4a,4bがZ軸方向に移動し、これ
に伴ってノズル1a,1bやペースト収納筒2a,2b
や光学式距離計3a,3bがZ軸方向に移動する。な
お、ノズル1a,1bはそれぞれ、ペースト収納筒2
a,2bの先端に設けられているが、ノズル1a,1b
とペースト収納筒2a,2bの下端とはそれぞれ、連結
部を備えたノズル支持具12a,12bを介して僅かに
離れている。
A Z-axis table support portion 10 is installed on the pedestal portion 9, and Z-axis tables 4a and 4b are attached to the Z-axis table support portion 10 so as to be movable in the Z-axis direction (vertical direction). The nozzle 1a, the paste storage cylinder 2a, and the optical distance meter 3a are mounted on one Z-axis table 4a, and the nozzle 1b, the paste storage cylinder 2b, and the optical distance meter are mounted on the other Z-axis table 4b. 3b is mounted. Control drive of these Z-axis tables 4a and 4b in the Z-axis direction is performed by the sub-control device 14b. That is, when the servo motors 21c and 21d are driven by the sub-control device 14b, the Z-axis tables 4a and 4b move in the Z-axis direction, and along with this, the nozzles 1a and 1b and the paste storage cylinders 2a and 2b.
The optical rangefinders 3a and 3b move in the Z-axis direction. The nozzles 1a and 1b are respectively provided in the paste container 2
Nozzles 1a and 1b are provided at the tips of a and 2b.
And the lower ends of the paste storage cylinders 2a and 2b are slightly apart from each other via nozzle support members 12a and 12b having a connecting portion.

【0013】光学式距離計3a,3bはそれぞれ、ノズ
ル1a,1bの先端(下端)であるペースト吐出口と基
板7の上面との間の距離を、非接触な三角測法によって
測定する。
The optical distance meters 3a and 3b respectively measure the distance between the paste discharge port, which is the tip (lower end) of the nozzles 1a and 1b, and the upper surface of the substrate 7 by non-contact triangulation.

【0014】即ち、これらの光学式距離計3a,3bは
同一構成なので一方の距離計3aについてのみ図2を参
照しつつ説明すると、光学式距離計3aの下端部は三角
状に切り込まれており、この切込み部分に対向する2つ
の斜面の一方に発光素子が、他方に受光素子が設けられ
ている。ノズル支持具12aはペースト収納筒2aの先
端に取り付けられて光学式距離計3aの上記切込み部の
下方まで延伸しており、その先端部の下面にノズル1a
が取り付けられている。光学式距離計3aの上記切込み
部に設けられた発光素子は、一点鎖線で示すようにノズ
ル1のペースト吐出口の真下近傍を照射し、そこからの
反射光を上記受光素子が受光するようになっている。そ
して、ノズル1aのペースト吐出口と該吐出口の下方に
配置された基板7(図1参照)との間の距離が所定の範
囲内である場合、発光素子からの光が受光素子に受光さ
れるように、ノズル1aと光学式距離計3aとの位置関
係が設定されていて、ノズル1aのペースト吐出口と基
板7との間の距離(対向間隔)が変化すると、該吐出口
の真下近傍において、発光素子からの光の基板7上での
照射点(以下、これを計測点という)の位置が変化し、
よって受光素子での受光状態が変化するので、ノズル1
aのペースト吐出口と基板7との間の距離を計測するこ
とができる。
That is, since these optical rangefinders 3a and 3b have the same structure, only one of the rangefinders 3a will be described with reference to FIG. 2. The lower end of the optical rangefinder 3a is cut in a triangular shape. The light emitting element is provided on one of the two slopes facing the cut portion, and the light receiving element is provided on the other. The nozzle support 12a is attached to the tip of the paste storage cylinder 2a and extends below the cut portion of the optical distance meter 3a, and the nozzle 1a is provided on the lower surface of the tip.
Is attached. The light emitting element provided in the cut portion of the optical distance meter 3a irradiates the area immediately below the paste discharge port of the nozzle 1 as indicated by the alternate long and short dash line so that the light receiving element receives the reflected light from there. Has become. When the distance between the paste ejection port of the nozzle 1a and the substrate 7 (see FIG. 1) arranged below the ejection port is within a predetermined range, the light from the light emitting element is received by the light receiving element. As described above, when the positional relationship between the nozzle 1a and the optical distance meter 3a is set and the distance (opposing distance) between the paste discharge port of the nozzle 1a and the substrate 7 changes, the vicinity immediately below the discharge port At, the position of the irradiation point of the light from the light emitting element on the substrate 7 (hereinafter referred to as the measurement point) changes,
Therefore, since the light receiving state of the light receiving element changes, the nozzle 1
The distance between the paste ejection port of a and the substrate 7 can be measured.

【0015】後述するように、基板7がX,Y軸方向に
移動してペーストパターンを形成しているとき、発光素
子からの光の基板7上での照射点(以下、これを計測点
という)が既に形成されたペーストパターンを横切る
と、光学式距離計3a(3b)によるノズル1a(1
b)のペースト吐出口と基板7の表面との間の距離の計
測値にペーストパターンの厚み分だけの誤差が生ずる。
そこで、計測点がペーストパターンをできるだけ横切ら
ないようにするため、ノズル1a(1b)から基板7上
へのペースト滴下点(以下、これを塗布点という)から
X,Y軸に対して斜め方向にずれた位置を計測点とする
と良い。
As will be described later, when the substrate 7 moves in the X- and Y-axis directions to form a paste pattern, the irradiation point of light from the light emitting element on the substrate 7 (hereinafter referred to as measurement point). ) Crosses the already formed paste pattern, the nozzle 1a (1) by the optical rangefinder 3a (3b)
An error corresponding to the thickness of the paste pattern occurs in the measured value of the distance between the paste discharge port of b) and the surface of the substrate 7.
Therefore, in order to prevent the measurement point from crossing the paste pattern as much as possible, the paste is dropped from the nozzle 1a (1b) onto the substrate 7 (hereinafter referred to as the application point) in an oblique direction with respect to the X and Y axes. It is advisable to use the displaced position as the measurement point.

【0016】なお、ペースト収納筒2a(2b)中のペ
ーストが使い尽くされるとノズル交換が行われ、塗布点
が基板7上のペーストを塗布しようとするある設定位置
と一致するようにノズル1a(1b)が取り付けられる
が、ペースト収納筒2a(2b)やノズル支持具12a
(12b)、ノズル1a(1b)の取付け精度のばらつ
きなどによって、ノズル交換の前と後でノズル位置が変
わることがある。しかし、図2に示すように、塗布点が
設定位置を中心に予め設定された大きさの許容範囲(Δ
X,ΔY)内にあるとき、ノズル1a(1b)は正常に
取り付けられているものとする。但し、ΔXは許容範囲
のX軸方向の幅、ΔYは同じくY軸方向の幅である。そ
して、画像認識カメラ11a,11bはそれぞれ、ノズ
ル1a,1bの交換後の位置確認や、これらのノズル1
a,1bの間隔を計測することなどに使用される。
When the paste in the paste accommodating cylinder 2a (2b) is used up, the nozzle is replaced, and the nozzle 1a (so that the application point coincides with a certain set position on the substrate 7 where the paste is to be applied). 1b) is attached, but the paste storage cylinder 2a (2b) and the nozzle support 12a
(12b), the nozzle position may change before and after the nozzle replacement due to variations in the mounting accuracy of the nozzle 1a (1b). However, as shown in FIG. 2, the application point has an allowable range (Δ
When it is in (X, ΔY), the nozzle 1a (1b) is assumed to be normally attached. However, ΔX is the width in the X-axis direction of the allowable range, and ΔY is the width in the Y-axis direction. Then, the image recognition cameras 11a and 11b respectively confirm the positions of the nozzles 1a and 1b after the replacement, and check the nozzles 1a and 1b.
It is used to measure the distance between a and 1b.

【0017】主および副制御装置14a,14bはそれ
ぞれ、光学式距離計3a,3bや画像認識カメラ11
a,11bからのデータが供給されると、これに応じて
サーボモータ21a〜21eを駆動する。また、これら
のサーボモータに設けたエンコーダから、各モータ21
a〜21eの駆動状況についてのデータが両制御装置1
4a,14bにフィードバックされる。
The main and sub-control devices 14a and 14b are the optical rangefinders 3a and 3b and the image recognition camera 11, respectively.
When the data from a and 11b is supplied, the servo motors 21a to 21e are driven in response to the data. In addition, each of the motors 21
The data on the driving conditions of a to 21e are both control devices 1
It is fed back to 4a and 14b.

【0018】かかる構成において、方形状をなす基板7
が吸着台13上に置かれると、吸着台13は基板7を真
空吸着して固定保持する。そして、θ軸テーブル8を回
動させることにより、基板7の各辺がX軸とY軸のそれ
ぞれに平行となるように設定される。しかる後、光学式
距離計3a,3bの測定結果をもとにサーボモータ21
c,21dが駆動制御されることにより、Z軸テーブル
4a,4bが下方に移動し、ノズル1a,1bのペース
ト吐出口と基板7の表面との間の距離が規定の距離にな
るまで、これらのノズル1a,1bを基板7の上方から
下降させる。
In this structure, the rectangular substrate 7
Is placed on the suction table 13, the suction table 13 holds the substrate 7 by vacuum suction. Then, by rotating the θ-axis table 8, each side of the substrate 7 is set to be parallel to each of the X axis and the Y axis. After that, the servo motor 21 is determined based on the measurement results of the optical rangefinders 3a and 3b.
By driving and controlling c and 21d, the Z-axis tables 4a and 4b move downward, and until the distance between the paste discharge ports of the nozzles 1a and 1b and the surface of the substrate 7 becomes a prescribed distance. The nozzles 1a and 1b are lowered from above the substrate 7.

【0019】その後、ペースト収納筒2a,2bからノ
ズル支持具12a,12bを介して供給されるペースト
がノズル1a,1bのペースト吐出口から基板7上へ吐
出され、これとともに、サーボモータ21a,21b
(図3参照)の駆動制御によってY軸テーブル6とθ軸
テーブル8が適宜移動し、これによって基板7上の2箇
所に同時に所望形状のパターンでペーストが塗布され
る。形成しようとするペーストパターンはX,Y各軸方
向の距離で換算できるので、所望形状のパターンを形成
するためのデータをキーボード19から入力すると、主
制御装置14aはこのデータをサーボモータ21a,2
1bに与えるパルス数に変換して命令を出力し、描画が
自動的に行われる。
After that, the paste supplied from the paste accommodating cylinders 2a, 2b through the nozzle supports 12a, 12b is discharged from the paste discharge ports of the nozzles 1a, 1b onto the substrate 7, and at the same time, the servo motors 21a, 21b.
The Y-axis table 6 and the θ-axis table 8 are appropriately moved by the drive control (see FIG. 3), whereby the paste is applied to the two positions on the substrate 7 at the same time in a pattern of a desired shape. Since the paste pattern to be formed can be converted by the distances in the X and Y axis directions, when the data for forming the pattern of the desired shape is input from the keyboard 19, the main controller 14a outputs this data to the servo motors 21a, 2a.
Drawing is automatically performed by converting the number of pulses given to 1b and outputting a command.

【0020】図3は図1における両制御装置14a,1
4bの一具体例を示すブロック図であって、図1と対応
する部分には同一符号が付してある。
FIG. 3 shows both control devices 14a, 1 in FIG.
4b is a block diagram showing a specific example, in which parts corresponding to those in FIG. 1 are designated by the same reference numerals.

【0021】同図において、14a−1,14b−1
は、処理プログラムを格納しているROMや各種データ
を記憶するRAMや各種データの演算を行うCPUなど
を内蔵したマイクロコンピュータ、14a−2,14b
−2は、画像処理装置15あるいは光学式距離計3a,
3bといった外部装置が接続されるとともに両制御装置
14a,14b間を接続する外部インターフェース、1
4a−3,14b−3は各サーボモータ21a〜21e
のモータコントローラ、14a−4はサーボモータ21
aを駆動するX軸ドライバ、14a−5はサーボモータ
21bを駆動するY軸ドライバ、14a−6はサーボモ
ータ21eを駆動するθ軸ドライバ、14b−4,14
b−5はサーボモータ21c,21dを駆動するZ軸ド
ライバ、Eはエンコーダである。
In the figure, 14a-1 and 14b-1
Is a microcomputer containing a ROM storing a processing program, a RAM storing various data, a CPU for calculating various data, and the like, 14a-2, 14b.
-2 is the image processing device 15 or the optical rangefinder 3a,
An external interface for connecting an external device such as 3b and connecting both control devices 14a and 14b, 1
4a-3 and 14b-3 are servo motors 21a to 21e.
Motor controller 14a-4 is a servomotor 21
X-axis driver that drives a, 14a-5 is a Y-axis driver that drives the servomotor 21b, 14a-6 is a θ-axis driver that drives the servomotor 21e, 14b-4, 14
Reference numeral b-5 is a Z-axis driver that drives the servomotors 21c and 21d, and E is an encoder.

【0022】キ−ボ−ド19からのペ−スト描画パタ−
ンやノズル交換などを示す各種デ−タや、光学式距離計
3a,3bで計測したデ−タや、マイクロコンピュ−タ
14a−1,14b−1の処理で生成された各種デ−タ
は、各マイクロコンピュ−タ14a−1,14b−1に
内蔵されたRAMに格納される。
A pattern drawing pattern from the keyboard 19
Data indicating the exchange of nozzles and nozzles, the data measured by the optical rangefinders 3a and 3b, and the data generated by the processing of the microcomputers 14a-1 and 14b-1. , Are stored in the RAM built in each of the microcomputers 14a-1 and 14b-1.

【0023】次に、ペ−スト塗布描画に際しての両制御
装置14a,14bの処理動作について説明する。な
お、図4以降のフローチャートにおいて、図中の符号S
はステップを意味している。また、各図において処理の
流れが単流であるものは主制御装置14aにおいて実行
され、複流になっている場合には、左側の処理の流れは
主制御装置14aにおいて実行され、右側の処理の流れ
は副制御装置14bにおいて実行されるものである。
Next, the processing operation of both control devices 14a and 14b at the time of painting and painting the paste will be described. In the flow charts of FIG. 4 and subsequent figures, reference numeral S in the figure
Means step. Further, in each figure, the process flow having a single flow is executed by the main control device 14a, and when the process flow is double flow, the process flow on the left side is executed by the main control device 14a and the process flow on the right side is executed. The flow is to be executed in the sub control device 14b.

【0024】図4において、電源が投入されると(ステ
ップ100)、ペースト塗布機の初期設定が実行される
(ステップ200)。この初期設定は、図5に示すよう
に、Y軸テ−ブル6やθ軸テ−ブル8を予め決められた
原点位置に位置決めし(ステップ211)、ペ−ストパ
タ−ンについてのデ−タの設定、即ち、使用するノズル
のデ−タ(NZL−N)や、ペ−ストパタ−ンの高さに
関係するペ−ストの吐出圧力およびノズルの高さデ−タ
や、ペ−ストの吐出開始位置デ−タや、ペ−ストパタ−
ンと基板7の関係についての位置デ−タなどを設定し
て、これらのデータを主制御装置14a内蔵のRAMに
一旦格納する処理(ステップ212)を行い,ペ−スト
の吐出終了位置デ−タを設定し(ステップ213)、Z
軸テ−ブル4a,4bを予め決められた原点位置に位置
決めし(ステップ221)、ステップ212で設定され
たペ−ストパタ−ンについてのデ−タを主制御装置14
a内蔵のRAMから副制御装置14b内蔵のRAMに移
して格納する処理(ステップ222)を行うというもの
であり、これらの設定のためのデ−タ入力はキ−ボ−ド
19から行われる。なお、使用するノズルのデ−タNZ
L−Nが1の場合は、ノズル1aのみ使用し、ノズル1
bによるペーストパターンの塗布描画は行われない。
In FIG. 4, when the power is turned on (step 100), the initial setting of the paste applicator is executed (step 200). In this initial setting, as shown in FIG. 5, the Y-axis table 6 and the θ-axis table 8 are positioned at a predetermined origin position (step 211), and data regarding the paste pattern is set. Setting, that is, the data (NZL-N) of the nozzle to be used, the discharge pressure of the paste related to the height of the paste pattern, the height data of the nozzle, and the paste Discharge start position data and paste pattern
The position data and the like regarding the relationship between the board and the substrate 7 are set, and a process of temporarily storing these data in the RAM incorporated in the main controller 14a is performed (step 212), and the discharge end position data of the paste is recorded. Setting (step 213), Z
The axis tables 4a and 4b are positioned at a predetermined origin position (step 221), and the data about the paste pattern set in step 212 is transferred to the main controller 14.
A process of moving from the built-in RAM to the built-in RAM of the sub-control unit 14b and storing it (step 222) is performed, and data input for these settings is performed from the keyboard 19. In addition, the data NZ of the nozzle to be used
When L-N is 1, only nozzle 1a is used and nozzle 1
The paste pattern is not applied and drawn by b.

【0025】以上の初期設定処理が終わると、図4にお
いて、ペーストパターンを描画するための基板7を吸着
台13上に搭載して吸着保持させ(ステップ300)、
基板位置決め処理(ステップ400)を行う。
After the above initial setting process is completed, in FIG. 4, the substrate 7 for drawing the paste pattern is mounted on the suction table 13 and held by suction (step 300).
Substrate positioning processing (step 400) is performed.

【0026】以下、図6により、このステップ400に
ついて詳細に説明する。
The step 400 will be described in detail below with reference to FIG.

【0027】図6において、まず、吸着台13に搭載さ
れた基板7に予め付されている位置決め用マ−クを画像
認識カメラ11a,11bで撮影し(ステップ40
1)、画像認識カメラ11a,11bの視野内での位置
決め用マ−クの重心位置を画像処理で求める(ステップ
402)。そして、この視野の中心と位置決め用マーク
の重心位置とのずれ量を算出し(ステップ403)、こ
のずれ量を用いて、基板7を所望位置に移動させるため
に必要なY軸テ−ブル6およびθ軸テ−ブル8の移動量
を算出する(ステップ404)。そして、算出されたこ
れら移動量をサーボモータ21a,21b,21eの操
作量に換算し(ステップ405)、かかる操作量に応じ
てサーボモータ21a,21b,21eを駆動すること
により、各テーブル6,8が移動して基板7が所望位置
の方へ移動する(ステップ406)。
In FIG. 6, first, the positioning marks previously attached to the substrate 7 mounted on the suction table 13 are photographed by the image recognition cameras 11a and 11b (step 40).
1) The position of the center of gravity of the positioning mark within the visual fields of the image recognition cameras 11a and 11b is obtained by image processing (step 402). Then, the amount of deviation between the center of this field of view and the position of the center of gravity of the positioning mark is calculated (step 403), and this amount of deviation is used to move the Y-axis table 6 required to move the substrate 7 to the desired position. And the amount of movement of the θ-axis table 8 is calculated (step 404). Then, the calculated movement amounts are converted into the operation amounts of the servo motors 21a, 21b, 21e (step 405), and the servo motors 21a, 21b, 21e are driven according to the operation amounts, so that each table 6, 8 moves to move the substrate 7 toward the desired position (step 406).

【0028】こうして移動が終了したなら、再び基板7
上の位置決め用マ−クを画像認識カメラ11a,11b
で撮影して、その視野内での位置決め用マ−クの中心
(重心位置)を計測し(ステップ407)、視野の中心
とマ−ク中心との偏差を求め、基板7の位置ずれ量とし
てマイクロコンピュータ14aのRAMに格納する(ス
テップ408)。そして、位置ずれ量が図2で説明した
許容範囲の例えば1/2以下の値の範囲内にあるか否か
を確認する(ステップ409)。この範囲内にあれば、
ステップ400の処理が終了したことになる。この範囲
外にあれば、ステップ404に戻って以上の一連の処理
を再び行い、基板7の位置ずれ量が上記値の範囲内に入
るまで繰り返す。
When the movement is completed in this way, the substrate 7
Image recognition cameras 11a and 11b are provided for the upper positioning mark.
Then, the center (center of gravity) of the positioning mark in the field of view is measured (step 407), the deviation between the center of the field of view and the center of the mark is obtained, and the amount of displacement of the substrate 7 is calculated. The data is stored in the RAM of the microcomputer 14a (step 408). Then, it is confirmed whether or not the displacement amount is within a range of, for example, 1/2 or less of the allowable range described in FIG. 2 (step 409). Within this range,
This means that the process of step 400 is completed. If it is out of this range, the process returns to step 404 and the above-mentioned series of processes is performed again, and the process is repeated until the positional deviation amount of the substrate 7 falls within the range of the above value.

【0029】これにより、基板7上のこれから塗布を開
始しようとする所望の塗布点が、ノズル1a,1bのペ
ースト吐出口の真下より所定範囲を越えて外れることの
ないように、基板7が位置決めされたことになる。
As a result, the substrate 7 is positioned so that the desired coating point on the substrate 7 from which the coating is to be started does not deviate beyond a predetermined range from directly below the paste discharge ports of the nozzles 1a and 1b. It was done.

【0030】再び図4において、ステップ400の処理
が終了すると、次に、ステップ500のペ−スト膜形成
処理に移る。これを、以下、図7で説明する。
In FIG. 4 again, when the process of step 400 is completed, the process proceeds to the paste film forming process of step 500. This will be described below with reference to FIG.

【0031】図7において、主制御装置14a側では、
まず、塗布開始位置へ基板7を移動させる(ステップ5
11)。基板7は先に説明した基板位置決め処理(図4
のステップ400)で所望位置に位置決めされているの
で、このステップ511では基板7を精度良く塗布開始
位置に移動させることができる。一方、副制御装置14
b側では、ノズル1a,1bを設定された高さ位置に移
動する(ステップ521)。即ち、ノズル1a,1bの
ペースト吐出口から基板7の表面までの対向間隔が、形
成するペ−スト膜の厚みに等しくなるように設定する。
ノズル1a,1bの移動の完了通知(ステップ522)
を受けて、主制御装置14a側ではステップ512に移
り、塗布開始位置から基板のパターン移動を開始し、ノ
ズル1a,1bがペ−ストの吐出を開始するステップ5
13に移動する。同時に、副制御装置14b側では、光
学式距離計3a,3bによるノズル1a,1bのペース
ト吐出口と基板7との対向間隔の実測デ−タを入力して
該基板7の表面のうねりを測定し(ステップ523)、
また、この実測デ−タに基づいて、光学式距離計3a,
3bの前述した計測点がペ−スト膜上を横切っているか
否かの判定が行われる(ステップ524)。例えば、光
学式距離計3a,3bの実測デ−タが、設定した対向間
隔の許容値を外れたような場合には、計測点がペ−スト
膜上にあると判定される。
In FIG. 7, on the main controller 14a side,
First, the substrate 7 is moved to the coating start position (step 5
11). The board 7 is subjected to the board positioning process described above (see FIG.
Since the substrate 7 is positioned at the desired position in step 400), the substrate 7 can be accurately moved to the coating start position in step 511. On the other hand, the sub controller 14
On the b side, the nozzles 1a and 1b are moved to the set height position (step 521). That is, the facing distance from the paste discharge ports of the nozzles 1a and 1b to the surface of the substrate 7 is set to be equal to the thickness of the paste film to be formed.
Notification of completion of movement of the nozzles 1a and 1b (step 522)
In response to this, the main controller 14a moves to step 512, starts the pattern movement of the substrate from the coating start position, and the nozzles 1a and 1b start the ejection of the paste step 5
Move to 13. At the same time, on the side of the sub-control device 14b, the measured data of the facing distance between the paste discharge ports of the nozzles 1a and 1b and the substrate 7 by the optical distance meters 3a and 3b is input to measure the waviness of the surface of the substrate 7. (Step 523),
In addition, based on the measured data, the optical rangefinder 3a,
It is judged whether or not the above-mentioned measurement point of 3b crosses over the paste film (step 524). For example, when the measured data of the optical rangefinders 3a and 3b deviates from the set tolerance value of the facing distance, it is determined that the measurement point is on the paste film.

【0032】光学式距離計3a,3bの計測点がペ−ス
ト膜上にないとき、実測デ−タを基にZ軸テ−ブル4
a,4bを移動させるための補正デ−タを算出する(ス
テップ525)。そして、Z軸テ−ブル4a,4bを駆
動してノズル1a,1bの高さを個別に補正し、Z軸方
向でのノズル1a,1bの位置を設定値に維持する(ス
テップ526)。これに対し、計測点がペ−スト膜上を
通過中と判定された場合には、ノズル1a,1bの高さ
補正は行わず、判定前の高さに保持しておく。なお、僅
かな幅のペ−スト膜上を計測点が通過中のときには、基
板7のうねりには殆ど変化がないので、ノズル1a,1
bの高さ補正を行わなくともペ−ストの吐出形状に変化
はなく、所望の厚さのペ−ストパターンを描くことがで
きる。
When the measuring points of the optical rangefinders 3a and 3b are not on the paste film, the Z-axis table 4 is based on the measured data.
Correction data for moving a and 4b is calculated (step 525). Then, the Z-axis tables 4a and 4b are driven to individually correct the heights of the nozzles 1a and 1b, and the positions of the nozzles 1a and 1b in the Z-axis direction are maintained at the set values (step 526). On the other hand, when it is determined that the measurement point is passing over the paste film, the heights of the nozzles 1a and 1b are not corrected, and the heights before the determination are maintained. When the measurement point is passing over the paste film having a slight width, the undulation of the substrate 7 hardly changes, so the nozzles 1a, 1
Even if the height correction of b is not performed, there is no change in the ejection shape of the paste, and a paste pattern having a desired thickness can be drawn.

【0033】次に、主制御装置14aにおいては、ペー
ストの吐出を終了させるか否かを判定し(ステップ51
4)、吐出を終了させた場合(ステップ515)は、ス
テップ516において、部分パターンの形成が終了した
か否かを判定する。そして、部分パターンが完了してい
なければ、ペーストの吐出を開始させる処理(ステップ
513)へ戻るが、部分パターンが完了した場合は、ノ
ズル上昇通知が出されて(ステップ517)、副制御装
置14bはノズル上昇処理(ステップ528)を行う。
主制御装置14aではさらに、基板7上の全パタ−ンの
形成が終了したか否かの判定を行い(ステップ51
8)、まだ描画する必要があれば、基板7を塗布開始位
置へ移動させる処理(ステップ511)およびノズル1
a,1bの高さを設定する処理(ステップ521)へ戻
って以上の一連の工程を繰り返し、全パタ−ンが完了し
た場合は、このペ−スト膜形成工程(ステップ500)
を終了する。
Next, in the main controller 14a, it is judged whether or not the discharge of the paste is ended (step 51).
4) If the ejection has ended (step 515), it is determined in step 516 whether formation of the partial pattern has ended. Then, if the partial pattern is not completed, the process returns to the process of starting paste ejection (step 513), but if the partial pattern is completed, a nozzle rise notification is issued (step 517), and the sub-control device 14b. Performs nozzle rise processing (step 528).
The main controller 14a further determines whether formation of all patterns on the substrate 7 is completed (step 51).
8) If there is still a need for drawing, a process of moving the substrate 7 to the coating start position (step 511) and the nozzle 1
When the process returns to the process of setting the heights of a and 1b (step 521) and the above series of steps is repeated and all the patterns are completed, this paste film forming step (step 500)
To finish.

【0034】即ち、ステップ514は、それまで連続し
て描画していたペーストパタ−ンの終了点に達したか否
かを判定する処理動作であって、これらの終了点は必ず
しも基板7に描画する所望形状全体のパターンの終了点
ではない。つまり、所望形状全体のパターンは複数の互
いに分かれた部分パターンからなる場合もあり、また部
分パターンが不連続なパターンからなる場合もあるの
で、それらをすべて含む全パターンの終了点に達したか
否かの判定はステップ518で行うようになっている。
一方、副制御装置14bでは、ノズル1a,1bを退避
位置まで上昇させるか否かの判断(ステップ527)が
常になされており、上昇させる必要がなければ基板表面
うねり計測処理(ステップ523)へ戻って上述した一
連の処理を繰り返すので、計測点がペ−スト膜上を通過
し終わればノズル高さの補正工程が再開される。
That is, step 514 is a processing operation for determining whether or not the end points of the paste patterns which have been continuously drawn until then are reached, and these end points are not necessarily drawn on the substrate 7. It is not the end point of the pattern of the entire desired shape. That is, the pattern of the entire desired shape may be composed of a plurality of partial patterns that are separated from each other, or the partial patterns may be discontinuous patterns. Therefore, whether or not the end point of all patterns including all of them has been reached The determination is made in step 518.
On the other hand, in the sub-control device 14b, it is always judged whether or not the nozzles 1a and 1b should be raised to the retracted position (step 527), and if it is not necessary to raise the nozzle, it returns to the substrate surface waviness measurement processing (step 523). Since the series of processes described above is repeated, the nozzle height correction process is restarted when the measurement point has finished passing over the paste film.

【0035】以下、上述したペ−スト膜形成工程(ステ
ップ500)における各処理について詳細に説明する。
Each process in the above-mentioned paste film forming step (step 500) will be described in detail below.

【0036】まず、図7のステップ521のノズル移動
処理について、図8を参照しつつ説明する。
First, the nozzle moving process of step 521 in FIG. 7 will be described with reference to FIG.

【0037】始めに、図5のステップ212で設定され
てステップ222で副制御装置14bのRAMに格納済
みの使用ノズルに関するデ−タNZL−Nの値を比較判
定し(ステップ521a)、デ−タNZL−Nが2の場
合には、ノズル1b,1aを設定された高さに順次移動
させ(ステップ521b,ステップ521c)、デ−タ
NZL−Nが2でない場合には、ノズル1aのみの移動
を行う(ステップ521c)。
First, the value of the data NZL-N relating to the used nozzle which is set in step 212 of FIG. 5 and stored in the RAM of the sub-control device 14b in step 222 is compared and judged (step 521a), and the data is deselected. When the data NZL-N is 2, the nozzles 1b and 1a are sequentially moved to the set height (steps 521b and 521c), and when the data NZL-N is not 2, only the nozzle 1a is moved. It is moved (step 521c).

【0038】次に、図7のステップ512の主制御装置
14aにおけるペ−スト吐出処理について、図9を参照
しつつ説明する。
Next, the paste ejection process in the main controller 14a in step 512 of FIG. 7 will be described with reference to FIG.

【0039】ペ−スト吐出処理でも、まず、図8のステ
ップ521aと同様に、使用ノズルに関するデ−タNZ
L−Nの値を比較判定し(ステップ512a)、デ−タ
NZL−Nが2の場合には、ノズル1b,1aそれぞれ
のペ−スト吐出口からペーストの吐出を順次開始し(ス
テップ512b,ステップ512c)、デ−タNZL−
Nが2でない場合には、ノズル1aのみからペ−ストの
吐出を開始する(ステップ512c)。
Also in the paste discharge process, first, similarly to step 521a in FIG.
The values of L-N are compared and determined (step 512a), and when the data NZL-N is 2, the discharge of paste is sequentially started from the paste discharge ports of the nozzles 1b and 1a (step 512b, 512b). Step 512c), data NZL-
If N is not 2, ejection of the paste is started from only the nozzle 1a (step 512c).

【0040】さらに、図7のステップ523の副制御装
置14bにおける基板表面うねり計測処理について、図
10を参照しつつ説明する。
Further, the substrate surface waviness measuring process in the sub controller 14b in step 523 of FIG. 7 will be described with reference to FIG.

【0041】まず、図8のステップ521aや図9のス
テップ512aと同様に、使用ノズルに関するデ−タN
ZL−Nの値を比較判定し(ステップ523a)、デ−
タNZL−Nが2の場合には、ノズル1b,1aと基板
7の表面との対向間隔をそれぞれ、光学式距離計3b,
3aによって順次計測し(ステップ523b,ステップ
523c)、デ−タNZL−Nが2でない場合には、ノ
ズル1aと基板7の表面との対向間隔のみを光学式距離
計3aにて計測する(ステップ523c)。この計測デ
−タは、図3に示したマイクロコンピュ−タ14b−1
内蔵のRAMに格納しておいて、引き続き行われるペ−
スト膜上か否かの判定処理(ステップ524)やZ軸補
正デ−タ算出処理(ステップ525)などに使用する。
First, similar to step 521a in FIG. 8 and step 512a in FIG.
The value of ZL-N is compared and judged (step 523a), and the
When the NZL-N is 2, the distances between the nozzles 1b and 1a and the surface of the substrate 7 are set to the optical distance meters 3b and 3b, respectively.
3a are sequentially measured (step 523b, step 523c), and when the data NZL-N is not 2, only the facing distance between the nozzle 1a and the surface of the substrate 7 is measured by the optical distance meter 3a (step). 523c). This measurement data corresponds to the microcomputer 14b-1 shown in FIG.
Stored in the built-in RAM and continue
It is used for the judgment processing (step 524) of whether it is on the storage film or the Z-axis correction data calculation processing (step 525).

【0042】即ち、ステップ524におけるペ−スト膜
上か否かの判定処理では、図11に示すように、まず、
光学式距離計3aによるノズル1a側の計測点が既に描
いたペ−スト膜上を通過中か否かを判定し(ステップ5
24a)、通過中ならフラグNZLF1に1を設定し
(ステップ524b)、通過中でなければフラグNZL
F1に0を設定する(ステップ524c)。次に、光学
式距離計3bによるノズル1b側の計測点が既に描いた
ペ−スト膜上を通過中か否かを判定し(ステップ524
d)、通過中ならフラグNZLF2に1を設定し(ステ
ップ524e)、通過中でなければフラグNZLF2に
0を設定する(ステップ524f)。この判定結果は、
後述するノズル高さ補正処理で使用する。
That is, in the process of determining whether or not it is on the paste film in step 524, as shown in FIG.
It is judged whether or not the measurement point on the nozzle 1a side by the optical distance meter 3a is passing over the already drawn paste film (step 5).
24a), 1 is set to the flag NZLF1 if the vehicle is passing (step 524b), and if the vehicle is not passing, the flag NZL1
F1 is set to 0 (step 524c). Next, it is determined whether or not the measurement point on the nozzle 1b side by the optical distance meter 3b is passing over the already drawn paste film (step 524).
d) If the vehicle is passing, the flag NZLF2 is set to 1 (step 524e), and if not passing, the flag NZLF2 is set to 0 (step 524f). This judgment result is
It is used in the nozzle height correction processing described later.

【0043】また、ステップ525におけるZ軸補正デ
−タ算出処理では、図12に示すように、まず、使用ノ
ズルに関するデ−タNZL−Nの値を比較判定し(ステ
ップ525a)、デ−タNZL−Nが2の場合には、ノ
ズル1b,1aの補正デ−タを順次算出し(ステップ5
25b,ステップ525c)、デ−タNZL−Nが2で
ない場合には、ノズル1aだけについて補正デ−タを算
出する(ステップ525c)。この算出デ−タは、図3
に示したマイクロコンピュ−タ14b−1内蔵のRAM
に格納しておく。
In the Z-axis correction data calculation processing in step 525, first, as shown in FIG. 12, the value of data NZL-N relating to the nozzle used is compared and determined (step 525a), and the data is calculated. When NZL-N is 2, the correction data of the nozzles 1b and 1a are sequentially calculated (step 5).
25b, step 525c), if the data NZL-N is not 2, the correction data is calculated only for the nozzle 1a (step 525c). This calculation data is shown in FIG.
RAM with built-in microcomputer 14b-1 shown in FIG.
Stored in.

【0044】最後に、図7のステップ526のノズル高
さ補正処理について、図13を参照しつつ説明する。
Finally, the nozzle height correction processing in step 526 of FIG. 7 will be described with reference to FIG.

【0045】まず、図11の判定処理で設定されたノズ
ル1a側のフラグNZLF1が立っているかどうかを判
定し(ステップ526a)、フラグNZLF1がないと
き、つまり計測点がペ−スト膜上を通過していないとき
には、ステップ526bに進んで、ノズル1aの補正デ
−タ算出処理(図12のステップ525c)により求め
ておいた算出デ−タをマイクロコンピュ−タ14b−1
のRAMから読み出して該ノズル1aの高さ補正を行う
(ステップ526b)。また、フラグNZLF1が立て
られている場合は、計測点がペ−スト膜上を通過中なの
でステップ526cに飛び、よってノズル1aの高さは
補正されず通過前の高さが維持される。同様に、ステッ
プ526cでは、図11の判定処理で設定されたノズル
1b側のフラグNZLF2が立っているかどうかを判定
し、フラグNZLF2が0で計測点がペ−スト膜上を通
過中でないときにはステップ526dに進んで、ノズル
1bの補正デ−タ算出処理(図12のステップ525
b)により求めておいた算出デ−タを上記RAMから読
み出して該ノズル1bの高さ補正を行い、また、フラグ
NZLF2が1で計測点がペ−スト膜上を通過中のとき
は、ノズル1bの高さは補正せず通過前の高さを維持し
て終了する。
First, it is determined whether or not the flag NZLF1 on the nozzle 1a side set in the determination process of FIG. 11 is set (step 526a), and when the flag NZLF1 is not present, that is, the measurement point passes over the paste film. If not, the routine proceeds to step 526b, where the calculated data obtained by the correction data calculation processing (step 525c in FIG. 12) of the nozzle 1a is the microcomputer 14b-1.
Then, the height of the nozzle 1a is corrected by reading from the RAM (step 526b). If the flag NZLF1 is set, the measurement point is passing over the paste film, so the process jumps to step 526c. Therefore, the height of the nozzle 1a is not corrected and the height before passing is maintained. Similarly, in step 526c, it is determined whether or not the flag NZLF2 on the nozzle 1b side set in the determination process of FIG. 11 is set. If the flag NZLF2 is 0 and the measurement point is not passing over the paste film, step 526c is performed. Proceeding to step 526d, the correction data calculation process for the nozzle 1b (step 525 in FIG. 12).
The calculated data obtained in step b) is read from the RAM to correct the height of the nozzle 1b, and when the flag NZLF2 is 1 and the measurement point is passing over the paste film, the nozzle is The height of 1b is not corrected and the height before passing is maintained, and the process ends.

【0046】こうしてノズル高さ補正処理(ステップ5
26)が終了したなら、図7のステップ527に進ん
で、ノズルを退避位置まで上昇させる指令があるか否か
を判定し、指令がなければペ−ストパターンを塗布描画
中ということなので、基板表面うねり計測処理(ステッ
プ523)に戻って同様の処理を繰り返す。
Thus, the nozzle height correction process (step 5
26) is completed, the process proceeds to step 527 in FIG. 7 to determine whether or not there is a command to raise the nozzle to the retracted position. If there is no command, it means that the paste pattern is being applied and drawn. The process returns to the surface waviness measurement process (step 523) and the same process is repeated.

【0047】さて、上述したように所望形状のパタ−ン
のペ−スト膜形成工程(ステップ500)が終了したな
ら、吸着台13に載置保持されている基板7についてペ
−ストの塗布描画が終了したことになるので、図4のス
テップ600に進んで該基板7を吸着台13から排出
し、次にステップ700で全ての処理を停止するかどう
かを判定する。即ち、複数枚の基板7に同じパタ−ンで
ペ−ストを塗布描画する場合は、ステップ300に戻っ
てステップ700までの一連の処理を繰返し実施すれ
ば、量産性が高まる。
Now, as described above, when the paste film forming step (step 500) of the pattern of the desired shape is completed, the paste application drawing of the substrate 7 placed and held on the suction table 13 is completed. Is completed, the process proceeds to step 600 in FIG. 4 to discharge the substrate 7 from the suction table 13, and then in step 700, it is determined whether or not all the processes are stopped. That is, in the case where the paste is applied and drawn on the plurality of substrates 7 with the same pattern, the mass productivity is enhanced by returning to step 300 and repeating the series of processing up to step 700.

【0048】このように上記実施例では、基板7とノズ
ル1a,1bとの水平方向の相対位置関係を制御してペ
ーストパターンの描画位置を管理する主制御装置14a
と、ノズル1a,1bの高さを制御してペ−ストの塗布
高さを管理する副制御装置14bとを備えており、この
副制御装置14bは全体を統括する主制御装置14aと
機能を分離してはいるものの、両制御装置14a,14
b間でノズル昇降などに関する若干量のデ−タの授受を
行えば塗布描画の一連の工程を一体的に制御することが
できる。そして、副制御装置14bがノズル1a,1b
の高さ管理以外の処理を負担しないことから、この高さ
管理周期を短くすること、つまり光学式距離計3a,3
bによる計測デ−タと高さ補正の回数を多くすることが
できて、これにより、ノズル1a,1bの高さをそれぞ
れ基板7の表面のうねりに正確に追随させることができ
る。したがって、各ノズル1a,1bを用いて描かれた
ペ−ストパタ−ンの幅や高さは、いずれも所望のものに
なる。また、光学式距離計3a,3bによる計測データ
が副制御装置14bの記憶手段に格納されるようになっ
ているため、データの授受が高速に実行できて処理の遅
れは生じない。
As described above, in the above embodiment, the main controller 14a which controls the relative positional relationship between the substrate 7 and the nozzles 1a and 1b in the horizontal direction to manage the drawing position of the paste pattern.
And a sub-control device 14b that controls the height of the nozzles 1a and 1b to manage the coating height of the paste. The sub-control device 14b functions as a main control device 14a that controls the whole. Although separated, both control devices 14a, 14
By exchanging a small amount of data regarding the elevation of the nozzle and the like between b, a series of steps for coating and drawing can be integrally controlled. Then, the sub control device 14b causes the nozzles 1a and 1b to
Since the processing other than the height management is not burdened, the height management cycle is shortened, that is, the optical rangefinders 3a, 3
It is possible to increase the number of times of measurement data and height correction by b, whereby the heights of the nozzles 1a and 1b can accurately follow the waviness of the surface of the substrate 7, respectively. Therefore, the width and height of the paste pattern drawn using the nozzles 1a and 1b are both desired. Further, since the measurement data obtained by the optical rangefinders 3a and 3b are stored in the storage means of the sub-control device 14b, the data can be exchanged at high speed and the processing delay does not occur.

【0049】一方、主制御装置14aについてみれば、
光学式距離計3a,3bの測定結果などに基づくノズル
1a,1bの高さ補正の処理から解放されるので、エン
コ−ダEのデ−タを基にY,θ軸テ−ブル6,8を細か
く駆動させて微細なパタ−ンが描けるようになり、全体
を統括するための管理もこまめに実行できるようにな
る。
On the other hand, regarding the main controller 14a,
Since the height correction processing of the nozzles 1a and 1b based on the measurement results of the optical rangefinders 3a and 3b is released, the Y and θ axis tables 6 and 8 are based on the data of the encoder E. It becomes possible to draw fine patterns by finely driving, and it becomes possible to execute management to control the whole as a whole.

【0050】即ち、上記実施例は、分業により制御の複
雑化が回避できるので、所望形状の複数のペーストパタ
ーンを同時に高精度に、しかも高速に描画することが可
能となっており、きめ細かな管理を実行して信頼性を高
めることも容易である。
That is, in the above-described embodiment, since control complexity can be avoided by division of labor, a plurality of paste patterns having a desired shape can be simultaneously drawn with high precision and at high speed, and fine control is possible. It is also easy to perform and increase reliability.

【0051】さらに装置製作面においても、主制御装置
14aと副制御装置14bの処理ソフトは独立したモジ
ュ−ルとすることができるので、開発が容易で、デバグ
作業も容易となり、処理ソフト面での高信頼性も確保で
きる。
Further, in terms of device manufacturing, the processing software of the main control unit 14a and the sub-control unit 14b can be independent modules, which facilitates development and facilitates debugging work. High reliability can be secured.

【0052】例えば、描画の開始位置と終了位置とが接
近した開いた瓶の断面形状のペーストパターンを形成す
る場合、該パターンの始端と終端において、ペ−ストの
吐出圧力や、Y,θ軸テ−ブル6,8の位置や、両ノズ
ル1a,1bの高さなどを一致させる必要があるが、上
記実施例では、主および副制御装置14a,14bが自
律分散処理でこれらの制御を分担するので、始端および
終端の形状が乱れない所望のペ−ストパタ−ンを容易に
描くことができる。
For example, when forming a paste pattern having an open bottle cross-sectional shape in which the drawing start position and the drawing end position are close to each other, at the beginning and end of the pattern, the discharge pressure of the paste, the Y and θ axes are formed. The positions of the tables 6 and 8 and the heights of both nozzles 1a and 1b need to be matched, but in the above-described embodiment, the main and sub control devices 14a and 14b share these controls by autonomous distributed processing. Therefore, it is possible to easily draw a desired paste pattern in which the shapes of the start end and the end are not disturbed.

【0053】なお、塗布機初期設定処理(ステップ20
0)での所要時間の短縮化を図るために、外部インタ−
フェ−ス14a−2に接続されてICカ−ドあるいはフ
ロッピディスクやハ−ドディスクなどの記憶手段が装填
される外部記憶装置16に、必要な各種データを前もっ
て格納しておき、これらのデ−タをマイクロコンピュ−
タ14a−1,14b−1のRAMに移すようにしても
良い。また、計測したデ−タを外部記憶装置16に格納
してマイクロコンピュ−タ14a−1,14b−1のR
AMの記憶容量拡大化を図ったり、判定結果についての
デ−タを外部記憶装置16に格納して後日利用できるよ
うにしても良い。
The initial setting process of the applicator (step 20)
In order to reduce the time required in 0), the external interface
An external storage device 16 connected to the face 14a-2 and loaded with storage means such as an IC card or a floppy disk or a hard disk stores various necessary data in advance, and these data are stored in advance. -Computer
It may be moved to the RAM of the data 14a-1 and 14b-1. In addition, the measured data is stored in the external storage device 16 and stored in the R of the microcomputers 14a-1 and 14b-1.
The storage capacity of the AM may be expanded, or the data about the determination result may be stored in the external storage device 16 for later use.

【0054】さらに、上記実施例では一枚の基板に複数
のペ−ストパタ−ンを描く場合について説明したが、吸
着台13に複数の基板を吸着保持せしめ、各基板に同時
に同様のペ−ストパタ−ンを描かせても良い。その際、
Z軸テ−ブル4a,4bの図示省略せるX,Y軸テ−ブ
ルを駆動制御すれば、各基板の位置合わせ対応において
好都合である。また、画像認識カメラ11a,11bが
X,Y軸テ−ブルを備えていると、大きさの異なる基板
の位置決め用マ−クに従ってこれらのテ−ブルを駆動制
御し、所定の場所に画像認識カメラ11a,11bを移
動させることができるので、各種の大きさの基板にペー
ストパターンを描画することができる。
Further, in the above embodiment, the case where a plurality of paste patterns are drawn on one substrate has been described, but a plurality of substrates are suction-held on the suction table 13 and the same paste pattern is simultaneously applied to each substrate. -You may draw a picture. that time,
Driving and controlling the X and Y axis tables (not shown) of the Z axis tables 4a and 4b is convenient for aligning the substrates. Further, when the image recognition cameras 11a and 11b are provided with X and Y axis tables, these tables are driven and controlled according to the positioning marks of the boards of different sizes, and the image recognition is performed at a predetermined place. Since the cameras 11a and 11b can be moved, paste patterns can be drawn on substrates of various sizes.

【0055】[0055]

【発明の効果】以上説明したように、本発明によるペー
スト塗布機は、ノズルと基板表面との対向間隔の制御
を、該ノズルと該基板との水平方向の相対位置制御に対
し独立して処理することができるので、複数のノズルを
それぞれ対向する基板表面のうねりに追従させながらペ
ーストパターンを形成することができ、そのため、基板
上に所望形状の複数のペーストパターンを同時に高精度
に、しかも高速に塗布描画することができる。したがっ
て、量産工場において、ラインの複雑化や現場スペース
の拡張を行わなくとも、容易に生産性を高めることがで
きて、製品価格を大幅に低減することが可能となる。
As described above, in the paste applicator according to the present invention, the control of the facing distance between the nozzle and the substrate surface is performed independently of the relative position control of the nozzle and the substrate in the horizontal direction. Therefore, it is possible to form a paste pattern while making a plurality of nozzles follow the undulations of the substrate surface facing each other, so that a plurality of paste patterns of a desired shape can be formed on the substrate simultaneously with high accuracy and at high speed. Can be applied and drawn. Therefore, in a mass production factory, the productivity can be easily increased and the product price can be significantly reduced without complicating the line or expanding the site space.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明によるペ−スト塗布機の一実施例を示す
概略斜視図である。
FIG. 1 is a schematic perspective view showing an embodiment of a paste applicator according to the present invention.

【図2】同実施例のノズルと光学式距離計との配置関係
を示す斜視図である。
FIG. 2 is a perspective view showing a positional relationship between a nozzle and an optical distance meter of the embodiment.

【図3】同実施例の制御装置の一具体例を示すブロック
図である。
FIG. 3 is a block diagram showing a specific example of a control device of the same embodiment.

【図4】同実施例の全体動作を示すフローチャートであ
る。
FIG. 4 is a flowchart showing the overall operation of the same embodiment.

【図5】図4におけるペ−スト塗布機の初期設定工程を
示すフローチャートである。
5 is a flowchart showing an initial setting process of the paste applicator in FIG.

【図6】図4における基板位置決め工程を示すフローチ
ャートである。
6 is a flowchart showing a substrate positioning process in FIG.

【図7】図4におけるペ−スト膜形成工程を示すフロー
チャートである。
7 is a flowchart showing a paste film forming process in FIG.

【図8】図7におけるノズル移動処理を示すフローチャ
ートである。
8 is a flowchart showing a nozzle moving process in FIG.

【図9】図7におけるペ−スト吐出処理を示すフローチ
ャートである。
9 is a flowchart showing a paste ejection process in FIG.

【図10】図7における基板表面うねり計測処理を示す
フローチャートである。
10 is a flowchart showing a substrate surface waviness measurement process in FIG.

【図11】図7におけるペ−スト膜上通過判定処理を示
すフローチャートである。
FIG. 11 is a flowchart showing a past film passage determination process in FIG. 7.

【図12】図7におけるZ軸補正デ−タ算出処理を示す
フローチャートである。
12 is a flowchart showing a Z-axis correction data calculation process in FIG.

【図13】図7におけるノズル高さ補正処理を示すフロ
ーチャートである。
FIG. 13 is a flowchart showing a nozzle height correction process in FIG.

【符号の説明】[Explanation of symbols]

1a,1b ノズル 2a,2b ペ−スト収納筒 3a,3b 光学式距離計 4a,4b Z軸テ−ブル 5 X軸テ−ブル 6 Y軸テ−ブル 7 基板 8 θ軸テ−ブル 9 架台部 10 Z軸テ−ブル支持部 11a,11b 画像認識カメラ 12a,12b ノズル支持具 13 吸着台 14a,14b 制御装置 15 画像処理装置 16 外部記憶装置 17 画像モニタ 18 ディスプレィ 19 キ−ボ−ド 21a〜21e サ−ボモ−タ 1a, 1b Nozzle 2a, 2b Paste storage cylinder 3a, 3b Optical rangefinder 4a, 4b Z-axis table 5 X-axis table 6 Y-axis table 7 Substrate 8 θ-axis table 9 Stand part 10 Z-axis table support part 11a, 11b Image recognition camera 12a, 12b Nozzle support tool 13 Suction table 14a, 14b Control device 15 Image processing device 16 External storage device 17 Image monitor 18 Display 19 Key board 21a-21e Servo motor

フロントページの続き (72)発明者 米田 福男 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 (72)発明者 八幡 聡 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 (72)発明者 川隅 幸宏 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内Front Page Continuation (72) Inventor Fukuo Yoneda 5-2 Koyodai, Ryugasaki, Ibaraki Hitachi Techno Engineering Co., Ltd. Development Laboratory (72) Satoshi Yawata 5-2 Koyodai, Ryugasaki, Ibaraki Hitachi Techno Engineering Development Laboratory Co., Ltd. (72) Inventor Yukihiro Kawasumi 5-2, Koyodai, Ryugasaki City, Ibaraki Prefecture Hitachi Techno Engineering Co., Ltd. Development Laboratory

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ノズルのペースト吐出口と対向するよう
に基板をテーブル上に載置し、ペースト収納筒に収納し
たペーストを上記吐出口から上記基板上へ吐出させなが
ら上記ノズルと該基板との相対位置関係を変化させ、該
基板上に所望形状のペーストパターンを描画形成するペ
ースト塗布機において、 複数のノズルと、これら各ノズルのペースト吐出口と上
記基板の表面との対向間隔を個別に計測する複数の計測
手段と、上記各ノズルと上記基板とを水平方向に相対的
に移動させる移動手段と、この相対的移動時における上
記各計測手段の計測デ−タを用いて上記各ノズルのペー
スト吐出口と上記基板の表面との対向間隔を個別に制御
する制御手段とを備えたことを特徴とするペースト塗布
機。
1. A substrate is placed on a table so as to face a paste discharge port of a nozzle, and the nozzle and the substrate are separated from each other while discharging the paste stored in the paste storage cylinder from the discharge port onto the substrate. In a paste coating machine that changes the relative positional relationship and draws and forms a paste pattern of a desired shape on the substrate, individually measures the plurality of nozzles and the facing interval between the paste discharge port of each nozzle and the surface of the substrate. A plurality of measuring means, a moving means for relatively moving the nozzles and the substrate relative to each other in the horizontal direction, and a paste for the nozzles using the measurement data of the measuring means during the relative movement. A paste applicator comprising: a control unit that individually controls the facing distance between the ejection port and the surface of the substrate.
【請求項2】 請求項1の記載において、上記複数のノ
ズルが、上記テ−ブル上に載置した複数の基板に対して
個別にペーストを吐出するものであるとともに、上記移
動手段が、上記各ノズルと上記各基板との水平方向の相
対的移動を同量かつ同時に行わせるものであることを特
徴とするペースト塗布機。
2. The method according to claim 1, wherein the plurality of nozzles individually discharge the paste onto the plurality of substrates mounted on the table, and the moving means comprises the A paste applicator, wherein the horizontal relative movements of the nozzles and the substrates are performed in the same amount and at the same time.
【請求項3】 請求項1または2の記載において、上記
制御手段が、上記各計測手段の計測デ−タを記憶する記
憶手段を備えていることを特徴とするペースト塗布機。
3. The paste applicator according to claim 1, wherein the control means includes a storage means for storing the measurement data of each of the measuring means.
JP6072151A 1994-04-11 1994-04-11 Paste coating machine Expired - Lifetime JP2880642B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP6072151A JP2880642B2 (en) 1994-04-11 1994-04-11 Paste coating machine
KR1019950007696A KR0159421B1 (en) 1994-04-11 1995-04-03 Coating applicator for paste

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6072151A JP2880642B2 (en) 1994-04-11 1994-04-11 Paste coating machine

Publications (2)

Publication Number Publication Date
JPH07275771A true JPH07275771A (en) 1995-10-24
JP2880642B2 JP2880642B2 (en) 1999-04-12

Family

ID=13480978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6072151A Expired - Lifetime JP2880642B2 (en) 1994-04-11 1994-04-11 Paste coating machine

Country Status (2)

Country Link
JP (1) JP2880642B2 (en)
KR (1) KR0159421B1 (en)

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