JPH07179568A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH07179568A
JPH07179568A JP32856193A JP32856193A JPH07179568A JP H07179568 A JPH07179568 A JP H07179568A JP 32856193 A JP32856193 A JP 32856193A JP 32856193 A JP32856193 A JP 32856193A JP H07179568 A JPH07179568 A JP H07179568A
Authority
JP
Japan
Prior art keywords
formula
phenol
epoxy
epoxy resin
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32856193A
Other languages
Japanese (ja)
Other versions
JP2925905B2 (en
Inventor
Takeshi Masuda
剛 増田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP32856193A priority Critical patent/JP2925905B2/en
Publication of JPH07179568A publication Critical patent/JPH07179568A/en
Application granted granted Critical
Publication of JP2925905B2 publication Critical patent/JP2925905B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

PURPOSE:To obtain an epoxy resin composition containing respective specific epoxy resin, phenolic resin hardener and epoxy-modified silicone oil, having excellent soldering stress resistance and fluidity and suitable for the sealing of a semiconductor. CONSTITUTION:This composition contains (A) an epoxy resin containing 50-100wt.% of a biphenyl-type epoxy resin of formula I (R1 to R8 each is H, a halogen or an alkyl), (B) 70-93wt.% (based on the totai composition) of an inorganic filter (preferably fused silica powder), (C) a phenolic resin hardener containing 30-100wt.% of a flexible phenolic resin hardener of formula II (R is p-xylylene; (n) is 0-8), etc., (D) a cure accelerator (e.g. triphenyl phosphine) and (E) 0.1-3wt.% (based on the total composition) of an epoxy-modified silicone oil of formula III [R1 is group of formula IV or formula V; A is group of formula VI or formula VH (R is a 1-4C alkylene); the epoxy equivalent of the epoxy group of the group A is 140-500].

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体デバイスの表面
実装化における耐半田ストレス性及び、流動性に優れた
半導体封止用エポキシ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in solder stress resistance and fluidity in surface mounting of semiconductor devices.

【0002】[0002]

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたO−クレゾール
ノボラック型エポキシ樹脂をノボラック型フェノール樹
脂で硬化させたエポキシ樹脂が用いられている。ところ
が近年、集積回路の高集積化に伴いチップが段々大型化
し、かつパッケージは従来のDIPタイプから表面実装
化された小型、薄型のフラットパッケージ、SOP,S
OJ,PLCCに変わってきている。とくに半田付けの
工程において急激に200℃以上の高温にさらされるこ
とによりパッケージの割れや樹脂とチップの剥離により
耐湿性が劣化してしまうといった問題点がでてきてい
る。これらの問題を解決するためにエポキシ樹脂として
式(1)で示されるエポキシ樹脂の使用(特開昭64−
65116号公報)が検討されてきた。式(1)で示さ
れるエポキシ樹脂の使用により樹脂系の低粘度化が図ら
れ、従って無機充填材を更に多く配合することにより組
成物の成形後の低熱膨張化及び低吸湿化より、耐半田ス
トレス性の向上が図られた。ただし、無機充填材の充填
量の増加と共に、流動性が犠牲になりパッケージ内に空
隙が生じやすくなった。しかし、従来より流動性調整の
ために使用さとれてきたシリコーンオイルでは、パッケ
ージ内ボイドの低減は図れるものの、耐半田性ストレス
が低下するため、半田性ストレスと流動性の改善は両立
しなかった。
2. Description of the Related Art Conventionally, electronic parts such as diodes, transistors and integrated circuits have been sealed with a thermosetting resin. Especially in integrated circuits, an O-cresol novolac type epoxy resin excellent in heat resistance and moisture resistance is used. An epoxy resin cured with a novolac type phenolic resin is used. However, in recent years, as the integration of integrated circuits has increased, the size of the chip has gradually increased, and the package is a small and thin flat package surface-mounted from the conventional DIP type, SOP, S.
It is changing to OJ and PLCC. In particular, in the soldering process, when exposed to a high temperature of 200 ° C. or more, the moisture resistance is deteriorated due to cracking of the package and peeling of the resin and the chip. In order to solve these problems, the epoxy resin represented by the formula (1) is used as the epoxy resin (JP-A-64-
No. 65116) has been studied. By using the epoxy resin represented by the formula (1), the viscosity of the resin system can be reduced. Therefore, by adding a larger amount of the inorganic filler, it is possible to reduce the thermal expansion and the moisture absorption after the composition is molded, and thus the solder resistance can be improved. The stress property was improved. However, as the filling amount of the inorganic filler was increased, the fluidity was sacrificed, and voids were easily generated in the package. However, silicone oil, which has been used for adjusting fluidity, can reduce voids in the package, but since solder resistance stress decreases, solderability stress and fluidity improvement cannot be achieved at the same time. .

【0003】[0003]

【発明が解決しようとする課題】本発明は、半田付け工
程における急激な温度変化により熱ストレスを受けたと
きに耐クラック性に非常に優れ、かつ流動性にも優れた
樹脂組成物を提供するものである。
DISCLOSURE OF THE INVENTION The present invention provides a resin composition having excellent crack resistance and fluidity when subjected to thermal stress due to a rapid temperature change in a soldering process. It is a thing.

【0004】[0004]

【課題を解決するための手段】本発明のエポキシ樹脂組
成物は、 (A)下記式(1)で示されるエポキシ樹脂
The epoxy resin composition of the present invention comprises (A) an epoxy resin represented by the following formula (1):

【0005】[0005]

【化6】 (式中のR1〜R8は水素,ハロゲン,アルキル基の中か
ら選択される同一もしくは異なる原子または基)
[Chemical 6] (Wherein R 1 to R 8 are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups)

【0006】を総エポキシ樹脂量中に50〜100重量
%含むエポキシ樹脂、(B)総樹脂組成物量中に、70
〜93重量%含む無機充填材、(C)フェノール性水素
基を1分子中に複数個有する式(2)及び/又は式
(3)で示される可撓性フェノール樹脂硬化剤
An epoxy resin containing 50 to 100% by weight in the total amount of the epoxy resin, and 70 in the total amount of the resin composition (B).
To 93% by weight of inorganic filler, (C) flexible phenol resin curing agent represented by formula (2) and / or formula (3) having plural phenolic hydrogen groups in one molecule

【0007】[0007]

【化7】 (式中のRはパラキシリレン、n=0〜8)[Chemical 7] (R in the formula is paraxylylene, n = 0 to 8)

【0008】[0008]

【化8】 (式中のRはパラキシリレン、ジシクロペタジエンとフ
ェノールを付加反応したジシクロペタジエンジフェノー
ル、テルペン類とフェノールを付加反応したテルペンジ
フェノール、シクロペンタジエンとフェノールを付加反
応したシクロペンタジエンジフェノール及びシクロヘキ
サノンとフェノールを付加縮合したシクロヘキサノンジ
フェノールの各々の2個のフェノール部を除いた残基を
表し、これらの中から選択される1種、nの値は0〜
8)
[Chemical 8] (R in the formula is paraxylylene, dicyclopetadiene diphenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene and phenol, and Cyclohexanone represents a residue of cyclohexanone diphenol obtained by addition-condensing phenol with two phenol moieties removed, and one of these is selected, and the value of n is 0 to
8)

【0009】総フェノール樹脂硬化剤量に中に30〜1
00重量%含むフェノール樹脂硬化剤、(D)硬化促進
剤及び(E)式(4)及び/又は式(5)のエポキシ変
性シリコーンオイル
30 to 1 in the total amount of curing agent for phenol resin
Phenolic resin curing agent containing 100% by weight, (D) curing accelerator and (E) epoxy-modified silicone oil of formula (4) and / or formula (5)

【0010】[0010]

【化9】 [Chemical 9]

【0011】[0011]

【化10】 (式(4)、式(5)のRは、炭素数1〜4のアルキレ
ン基、10≦l+m+n+2≦400であり、かつAで
示されるエポキシ基のエポキシ当量は140〜500)
[Chemical 10] (R in the formulas (4) and (5) is an alkylene group having 1 to 4 carbon atoms, 10 ≦ l + m + n + 2 ≦ 400, and the epoxy equivalent of the epoxy group represented by A is 140 to 500)

【0012】を全組成物中に0.1〜3重量%含むこと
を特徴とする半導体封止用エポキシ樹脂組成物であり、
従来のエポキシ樹脂組成物に比べて、非常に優れた耐半
田ストレス性、流動性を有するものである。
An epoxy resin composition for semiconductor encapsulation, comprising 0.1 to 3% by weight of the total composition,
It has extremely excellent solder stress resistance and fluidity as compared with conventional epoxy resin compositions.

【0013】式(1)の構造で示されるビフェニル型エ
ポキシ樹脂は1分子中に2個のエポキシ基を有する2官
能性エポキシ樹脂で、従来の多官能性エポキシ樹脂に比
べ溶融粘度が低くトランスファー成形時の流動性に優れ
る。従って組成物中に無機充填材を多く配合することが
でき、低熱膨張化及び低吸水化が図られ、耐半田ストレ
ス性に優れるエポキシ樹脂組成物を得ることができる。
このビフェニル型エポキシ樹脂の使用量は、これを調節
することにより耐半田ストレス性を最大限に引き出すこ
とができる。耐半田ストレス性の効果を出すためには、
式(1)で示されるビフェニル型エポキシ樹脂を総エポ
キシ樹脂量の50重量%以上、好ましくは70重量%以
上の使用が望ましい。50重量%未満だと、低熱膨張化
及び低吸水性が図れず、耐半田ストレス性が不十分であ
る。更に、式中のR1〜R4はメチル基、R5〜R8は水素
原子が好ましい。式(1)で示されるビフェニル型エポ
キシ樹脂以外に他のエポキシ樹脂を併用する場合、用い
るエポキシ樹脂とは、エポキシ基を有するポリマー全般
をいう。例えばビスフェノール型エポキシ樹脂、クレゾ
ールノボラック型エポキシ樹脂、フェノールノボラック
型エポキシ樹脂及びトリフェノールメタン型エポキシ樹
脂、トリアジン核含有エポキシ樹脂等のことをいう。こ
れらは単独でも混合して用いても差し支えない。
The biphenyl type epoxy resin represented by the structure of the formula (1) is a bifunctional epoxy resin having two epoxy groups in one molecule and has a lower melt viscosity than the conventional polyfunctional epoxy resin and is transfer molded. Excellent fluidity over time. Therefore, a large amount of an inorganic filler can be blended in the composition, a low thermal expansion and a low water absorption can be achieved, and an epoxy resin composition excellent in solder stress resistance can be obtained.
By adjusting the amount of the biphenyl type epoxy resin used, solder stress resistance can be maximized. To obtain the effect of solder stress resistance,
It is desirable to use the biphenyl type epoxy resin represented by the formula (1) in an amount of 50% by weight or more, preferably 70% by weight or more based on the total amount of the epoxy resin. If it is less than 50% by weight, low thermal expansion and low water absorption cannot be achieved, and the solder stress resistance is insufficient. Further, in the formula, R 1 to R 4 are preferably methyl groups, and R 5 to R 8 are preferably hydrogen atoms. When another epoxy resin is used in combination with the biphenyl type epoxy resin represented by the formula (1), the epoxy resin to be used refers to all polymers having an epoxy group. For example, it means a bisphenol type epoxy resin, a cresol novolac type epoxy resin, a phenol novolac type epoxy resin, a triphenol methane type epoxy resin, a triazine nucleus-containing epoxy resin and the like. These may be used alone or in combination.

【0014】無機充填材としては、溶融シリカ粉末、結
晶シリカ粉末、アルミナ粉末、水和アルミナ粉末、窒化
珪素粉末、炭酸カルシウム粉末等があげられ、特に溶融
シリカ粉末が望ましい。無機充填材の配合量は、70〜
93重量%の範囲が好ましい。70重量%未満だと、吸
湿量が多くなり、また熱膨張係数も大きく実装時の熱ス
トレスに耐えられない。また、93重量%を越えると流
動特性が劣化し実用的でない。
Examples of the inorganic filler include fused silica powder, crystalline silica powder, alumina powder, hydrated alumina powder, silicon nitride powder, calcium carbonate powder and the like, and fused silica powder is particularly desirable. The compounding amount of the inorganic filler is 70-
A range of 93% by weight is preferred. If it is less than 70% by weight, the amount of moisture absorption increases, and the coefficient of thermal expansion is large, so that it cannot withstand thermal stress during mounting. On the other hand, if it exceeds 93% by weight, the flow characteristics deteriorate and it is not practical.

【0015】式(2)、式(3)の構造で示されるフェ
ノール樹脂硬化剤は、分子構造中のR部に比較的柔軟な
構造を有する可撓性フェノール樹脂硬化剤であり、ノボ
ラック型フェノール樹脂硬化剤等に較べ、半田処理温度
近辺での弾性率の低下と、リードフレーム及び半導体チ
ップとの密着力を向上せしめることができる。従って、
半田衝撃時の発生応力の低下と、それに伴う半導体チッ
プ等との剥離不良の防止に有効である。このようなフェ
ノール樹脂硬化剤の使用量は、これを調節することによ
り、耐半田ストレス性を最大限に引きだすことができ
る。耐半田ストレス性の効果をだす為には、式(2)及
び/又は式(3)で示される可撓性フェノール樹脂硬化
剤を、総フェノール樹脂硬化剤量に対して、30重量%
以上、好ましくは、50重量%以上の使用が望ましい。
使用量が30重量%未満だと低弾性及び、リードフレー
ム、半導体チップ等との密着力が不十分で、耐半田スト
レス性の向上が望めない。
The phenol resin curing agent represented by the structures of the formulas (2) and (3) is a flexible phenol resin curing agent having a relatively flexible structure at the R portion in the molecular structure, and is a novolac type phenol. As compared with a resin curing agent or the like, it is possible to lower the elastic modulus in the vicinity of the soldering processing temperature and improve the adhesive force between the lead frame and the semiconductor chip. Therefore,
This is effective in reducing the stress generated at the time of solder impact and preventing the defective peeling from the semiconductor chip or the like. By adjusting the amount of the phenol resin curing agent used, solder stress resistance can be maximized. In order to obtain the effect of resistance to solder stress, the flexible phenol resin curing agent represented by the formula (2) and / or the formula (3) is added in an amount of 30% by weight based on the total amount of the phenol resin curing agent.
Above, it is desirable to use 50% by weight or more.
If the amount used is less than 30% by weight, the elasticity is low and the adhesion to the lead frame, semiconductor chip, etc. is insufficient, and improvement in solder stress resistance cannot be expected.

【0016】更に式(2)中のRはパラキシリレンで、
nの値は0〜8である。nが8を越えるとトランスファ
ー成形時での流動性が低下し、成形性が劣る傾向があ
る。また式(3)中のRはパラキシリレン、ジシクロペ
タジエンとフェノールを付加反応したジシクロペタジエ
ンジフェノール、テルペン類とフェノールを付加反応し
たテルペンジフェノール、シクロペンタジエンとフェノ
ールを付加反応したシクロペンタジエンジフェノール及
びシクロヘキサノンとフェノールを付加縮合したシクロ
ヘキサノンジフェノールの各々の2個のフェノール部を
除いた残基を表し、これらの中ではパラキシリレン、テ
ルペン類とフェノールを付加反応したテルペンジフェノ
ール及びジシクロペタジエンとフェノールを付加反応し
たジシクロペタジエンジフェノールの2個のフェノール
部を除いた残基が好ましい。nの値は0〜8である。n
が8を越えるとトランスファー成形時での流動性が低下
し、成形性が劣る傾向がある。式(2)、(3)で示さ
れる可撓性フェノール樹脂硬化剤以外に、他のものを併
用する場合、用いるものとはフェノールノボラック樹
脂、クレゾールノボラック樹脂、ジシクロペンタジエン
変性フェノール樹脂とフェノールノボラック及び/又は
クレゾールノボラック樹脂との共重合物等を用いること
ができる。
Further, R in the formula (2) is paraxylylene,
The value of n is 0-8. If n exceeds 8, the fluidity at the time of transfer molding tends to deteriorate, and the moldability tends to deteriorate. R in the formula (3) is paraxylylene, dicyclopetadiene diphenol obtained by addition reaction of phenol with dicyclopetadiene, terpene diphenol obtained by addition reaction of terpenes with phenol, cyclopentadiene obtained by addition reaction of cyclopentadiene with phenol. Represents residues of diphenol and cyclohexanone diphenol obtained by addition-condensing cyclohexanone with phenol, excluding two phenol moieties, and among these, terpene diphenol obtained by addition reaction of paraxylylene, terpenes and phenol, and dicyclopeta A residue obtained by removing two phenol moieties of dicyclopetadiene diphenol obtained by addition reaction of diene and phenol is preferable. The value of n is 0-8. n
When it exceeds 8, the fluidity at the time of transfer molding tends to deteriorate, and the moldability tends to deteriorate. When other compounds are used in combination with the flexible phenol resin curing agents represented by the formulas (2) and (3), those used are phenol novolac resin, cresol novolac resin, dicyclopentadiene modified phenol resin and phenol novolac. And / or a copolymer with a cresol novolac resin or the like can be used.

【0017】本発明に用いる硬化促進剤は、エポキシ基
とフェノール性水酸基との反応を促進するものであれば
良く、一般に封止用材料に使用されているものを広く使
用することができ、例えば、ベンジルジメチルアミン等
の第三級アミン類、イミダゾール類、1.8−ジアザビ
シクロウンデセン、トリフェニルホスフィン等の有機燐
化合物等が挙げられ、単独でも混合して用いても差し支
えない。
The curing accelerator used in the present invention may be any one as long as it accelerates the reaction between the epoxy group and the phenolic hydroxyl group, and those generally used for sealing materials can be widely used. , Tertiary amines such as benzyldimethylamine, imidazoles, organic phosphorus compounds such as 1.8-diazabicycloundecene and triphenylphosphine, and the like, and they may be used alone or in combination.

【0018】式(4)、式(5)で示される、シリコー
ンオイルは、ジメチルシロキサンのメチル置換基の一部
を、エポキシ基を有する置換基で置換したエポキシ変性
型シリコーンオイルで、エポキシ基を有さないシリコー
ンオイルと比較した場合、樹脂との親和性に優れるため
耐半田ストレス性を低減させることなしに、流動性に良
好なエポキシ樹脂組成物を得ることができる。このエポ
キシ変性シリコーンオイルの使用量は、これを調節する
ことにより耐半田ストレス性、流動性改善効果を最大限
に引き出すことができる。他の利点として、このシリコ
ーンオイルは他のシリコーンオイルに比較して、添加時
に樹脂特性のひとつであるスパイラルフローへの影響が
殆どない。耐半田ストレスと流動性改善を両立させるた
めには、式(4)、式(5)で示されるエポキシ変性シ
リコーンオイルを全組成物中に0.1〜3重量%の範囲
で使用するのが望ましい。0.1重量%未満だと流動性
改善ができず、外部ボイド等が発生しやすくなり、逆に
3重量%を越えると流動性は良好だが、耐半田ストレス
性が急激に悪化する。また、式中Aで示されるエポキシ
基の当量は140〜500の範囲であり、エポキシ当量
が140未満だと硬化物の耐熱性が低下し、また500
を越えると耐半田ストレス性が低下してしまう。また、
10≦l+m+n+2≦400であり、これが10未満
だと硬化物の耐熱性が低下し、また、400を越えると
耐半田ストレス性が低下してしまう。
The silicone oil represented by the formulas (4) and (5) is an epoxy-modified silicone oil obtained by substituting a part of the methyl substituents of dimethylsiloxane with a substituent having an epoxy group. When compared with a silicone oil that does not have it, an epoxy resin composition having good fluidity can be obtained without reducing solder stress resistance because of its excellent affinity with a resin. By adjusting the amount of the epoxy-modified silicone oil used, the effects of improving solder stress resistance and fluidity can be maximized. As another advantage, this silicone oil has almost no effect on the spiral flow, which is one of the resin characteristics, when added, as compared with other silicone oils. In order to achieve both resistance to soldering stress and improvement of fluidity, it is preferable to use the epoxy-modified silicone oil represented by the formulas (4) and (5) in the range of 0.1 to 3% by weight in the total composition. desirable. If it is less than 0.1% by weight, the fluidity cannot be improved and external voids and the like tend to occur. On the contrary, if it exceeds 3% by weight, the fluidity is good, but the solder stress resistance deteriorates sharply. Further, the equivalent of the epoxy group represented by A in the formula is in the range of 140 to 500, and when the epoxy equivalent is less than 140, the heat resistance of the cured product decreases, and
If it exceeds, the solder stress resistance will be reduced. Also,
10 ≦ l + m + n + 2 ≦ 400, and if this is less than 10, the heat resistance of the cured product will decrease, and if it exceeds 400, the solder stress resistance will decrease.

【0019】本発明のエポキシ樹脂組成物には、必要に
よりシランカップリング剤、ブロム化エポキシ樹脂、三
酸化アンチモン、ヘキサブロムベンゼン等の難燃剤、カ
ーボンブラック、ベンガラ等の着色剤、天然ワックス、
合成ワックス等の離型剤、ゴム等の低応力剤等の添加剤
を適宜配合しても差し支えない。本発明の封止用エポキ
シ樹脂組成物を成形材料として製造するには、エポキシ
樹脂、硬化剤、硬化促進剤、シリコーンオイル、無機充
填材、その他の添加剤をミキサー等によって十分均一に
混合した後、更に熱ロール又はニーダー等で溶融混練
し、冷却粉砕して成形材料とすることができる。これら
の成形材料は電子部品あるいは電気部品の封止、被覆、
絶縁等適用することができる。
In the epoxy resin composition of the present invention, if necessary, a silane coupling agent, a brominated epoxy resin, a flame retardant such as antimony trioxide, hexabromobenzene, a coloring agent such as carbon black and red iron oxide, a natural wax,
A release agent such as a synthetic wax and an additive such as a low stress agent such as rubber may be appropriately mixed. To produce the encapsulating epoxy resin composition of the present invention as a molding material, the epoxy resin, the curing agent, the curing accelerator, the silicone oil, the inorganic filler, and other additives are sufficiently uniformly mixed by a mixer or the like. Further, it can be melt-kneaded with a hot roll, a kneader or the like, and cooled and pulverized to obtain a molding material. These molding materials are used to seal and cover electronic or electrical components,
Insulation etc. can be applied.

【0020】[0020]

【実施例】以下実施例で本発明を詳細に説明する。配合
割合は重量部とする。 実施例1 下記組成物 3,3’,5,5’−テトラメチルビフェノールジグリシジルエーテル (軟化点107℃、エポキシ当量191g/eq) 8.09重量部 式(2)で示される硬化剤(三井東圧化学(株)製、商品名ザイロック) (軟化点70℃、水酸基当量174g/eq) 1.97重量部 式(6)で示される硬化剤 (軟化点130℃、水酸基当量174g/eq) 1.97重量部
The present invention will be described in detail with reference to the following examples. The mixing ratio is parts by weight. Example 1 The following composition 3,3 ′, 5,5′-tetramethylbiphenol diglycidyl ether (softening point 107 ° C., epoxy equivalent 191 g / eq) 8.09 parts by weight The curing agent represented by the formula (2) (Mitsui Toatsu Chemical Co., Ltd., trade name Zyloc) (softening point 70 ° C., hydroxyl equivalent 174 g / eq) 1.97 parts by weight Curing agent represented by the formula (6) (softening point 130 ° C., hydroxyl equivalent 174 g / eq) 1.97 parts by weight

【0021】[0021]

【化11】 [Chemical 11]

【0022】 フェノールノボラック樹脂硬化剤(以下PNという) (軟化点90℃、水酸基当量103g/eq) 1.97重量部 式(7)で示されるシリコーンオイル (エポキシ当量200g/eq) 1重量部Phenol novolac resin curing agent (hereinafter referred to as PN) (softening point 90 ° C., hydroxyl group equivalent 103 g / eq) 1.97 parts by weight Silicone oil represented by the formula (7) (epoxy equivalent 200 g / eq) 1 part by weight

【0023】[0023]

【化12】 [Chemical 12]

【0024】 溶融シリカ粉末 84.0重量部 トリフェニルホスフィン 0.2重量部 カーボンブラック 0.3重量部 カルナバワックス 0.5重量部 をミキサーで常温で混合し、80〜90℃でロール混練
し、冷却後粉砕し成形材料を得た。得られた成形材料
を、タブレット化し、低圧トランスファー成形機にて1
75℃、70kg/cm2、120秒の条件で、半田ク
ラック試験用として6mm×6mm のチップを52p
QFPに封止した。封止したテスト用素子について下記
の半田クラック試験及び、ボイド観察を行った。評価結
果を表1に示す。
Fused silica powder 84.0 parts by weight Triphenylphosphine 0.2 parts by weight Carbon black 0.3 parts by weight Carnauba wax 0.5 parts by weight are mixed with a mixer at room temperature and roll-kneaded at 80 to 90 ° C., After cooling, it was pulverized to obtain a molding material. The obtained molding material is made into a tablet, and 1
52p of 6mm x 6mm chip for solder crack test under the condition of 75 ° C, 70kg / cm 2 and 120 seconds.
Sealed in QFP. The sealed test element was subjected to the following solder crack test and void observation. The evaluation results are shown in Table 1.

【0025】評価方法 スパイラルフロー:EMMI−I−66に準じて、金型
温度175℃、圧力60kg/cm2で硬化したときの
金型内で樹脂が流動した長さ。 半田クラック試験:封止したテスト用素子を85℃、8
5RHの環境下で168hr及び336hr処理し、そ
の後IRリフロー(240℃、10秒)処理した後、顕
微鏡で外部クラックを観察した。 外部ボイド観察:半田クラック試験用として成形したパ
ッケージを、目視により確認した。 内部ボイド観察:半田クラック試験用として成形したパ
ッケージを、断面研磨して観察した。 実施例2〜16 表1,2,3に従って配合し、実施例1と同様にして成
形材料を得た。この成形材料で試験用の封止した成形品
を得、この成形品を用いて実施例1と同様に半田クラッ
ク試験及びボイド観察を行った。試験結果は表1、表
2、表3に示す。実施例16に用いる式(8)のシリコ
ーンオイルは下記の構造のものである。
Evaluation method Spiral flow: According to EMMI-I-66, the length of resin flow in the mold when cured at a mold temperature of 175 ° C. and a pressure of 60 kg / cm 2 . Solder crack test: sealed test element at 85 ° C, 8
After 168 hr and 336 hr treatments in an environment of 5RH, and then IR reflow treatment (240 ° C, 10 seconds) treatment, external cracks were observed with a microscope. External void observation: A package molded for a solder crack test was visually confirmed. Observation of internal voids: A package molded for a solder crack test was cross-section polished and observed. Examples 2 to 16 Compounding was carried out according to Tables 1, 2 and 3 and a molding material was obtained in the same manner as in Example 1. A sealed molded product for testing was obtained from this molding material, and a solder crack test and void observation were performed using this molded product in the same manner as in Example 1. The test results are shown in Tables 1, 2 and 3. The silicone oil of the formula (8) used in Example 16 has the following structure.

【0026】[0026]

【化13】 [Chemical 13]

【0027】比較例1〜6 表1,2,3に従って配合し、実施例1と同様にして成
形材料を得た。この成形材料で試験用の封止した成形品
を得、この成形品を用いて実施例1と同様に半田クラッ
ク試験及びボイド観察を行った。試験結果を表1、表
2、表3に示す。比較例5に用いる式(9)で示される
シリコーンオイルは下記の構造のもので、エポキシ当量
は700である。
Comparative Examples 1 to 6 Compounding was carried out according to Tables 1, 2 and 3 and a molding material was obtained in the same manner as in Example 1. A sealed molded product for testing was obtained from this molding material, and a solder crack test and void observation were performed using this molded product in the same manner as in Example 1. The test results are shown in Tables 1, 2 and 3. The silicone oil represented by the formula (9) used in Comparative Example 5 has the following structure and has an epoxy equivalent of 700.

【0028】[0028]

【化14】 [Chemical 14]

【0029】[0029]

【表1】 [Table 1]

【0030】[0030]

【表2】 [Table 2]

【0031】[0031]

【表3】 [Table 3]

【0032】[0032]

【発明の効果】本発明に従うと、従来技術では得ること
のできなかった、耐半田ストレス性とボイドの発生しな
い流動特性を両立したエポキシ樹脂組成物を得ることが
できるので、半田付け工程時の急激な温度変化による、
熱ストレスを受けた時の耐クラック性が悪化せず、かつ
成形性が非常に良好となる。従って、電子、電気部品の
封止用、被覆用、絶縁用等に用いた場合、特に、表面実
装パッケージに搭載された高集積大型チップICにおい
て、信頼性を非常に必要とする製品について好適であ
る。
According to the present invention, it is possible to obtain an epoxy resin composition which has both soldering stress resistance and void-free flow characteristics, which cannot be obtained by the prior art. Due to sudden temperature changes,
The crack resistance does not deteriorate when heat stress is applied, and the moldability becomes very good. Therefore, when it is used for encapsulation, coating, insulation, etc. of electronic and electric parts, it is particularly suitable for a product that requires extremely high reliability in a highly integrated large chip IC mounted in a surface mount package. is there.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 (A)下記式(1)で示されるエポキシ
樹脂 【化1】 (式中のR1〜R8は水素,ハロゲン,アルキル基の中か
ら選択される同一もしくは異なる原子または基)を総エ
ポキシ樹脂量中に50〜100重量%含むエポキシ樹
脂、(B)総樹脂組成物量中に、70〜93重量%含む
無機充填材、(C)フェノール性水素基を1分子中に複
数個有する式(2)及び/又は式(3)で示される可撓
性フェノール樹脂硬化剤 【化2】 (式中のRはパラキシリレン、n=0〜8) 【化3】 (式中のRはパラキシリレン、ジシクロペタジエンとフ
ェノールを付加反応したジシクロペタジエンジフェノー
ル、テルペン類とフェノールを付加反応したテルペンジ
フェノール、シクロペンタジエンとフェノールを付加反
応したシクロペンタジエンジフェノール及びシクロヘキ
サノンとフェノールを付加縮合したシクロヘキサノンジ
フェノールの各々の2個のフェノール部を除いた残基を
表し、これらの中から選択される1種、nの値は0〜
8)総フェノール樹脂硬化剤量に中に30〜100重量
%含むフェノール樹脂硬化剤、(D)硬化促進剤及び
(E)式(4)及び/又は式(5)のエポキシ変性シリ
コーンオイル 【化4】 【化5】 (式(4)、式(5)のRは、炭素数1〜4のアルキレ
ン基、10≦l+m+n+2≦400であり、かつAで
示されるエポキシ基のエポキシ当量は140〜500)
を全組成物中に0.1〜3重量%含むことを特徴とする
半導体封止用エポキシ樹脂組成物。
1. An epoxy resin represented by the following formula (1): An epoxy resin containing 50 to 100% by weight in the total amount of epoxy resin, wherein R 1 to R 8 are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups, and (B) total resin. Inorganic filler containing 70 to 93% by weight in the amount of composition, (C) flexible phenol resin curing represented by formula (2) and / or formula (3) having a plurality of phenolic hydrogen groups in one molecule Agent [Chemical Formula 2] (R in the formula is paraxylylene, n = 0 to 8) (R in the formula is paraxylylene, dicyclopetadiene diphenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene and phenol, and Cyclohexanone represents a residue of cyclohexanone diphenol obtained by addition-condensing phenol with two phenol moieties removed, and one of these is selected, and the value of n is 0 to
8) A phenol resin curing agent containing 30 to 100% by weight in the total amount of the phenol resin curing agent, (D) a curing accelerator, and (E) an epoxy-modified silicone oil of formula (4) and / or formula (5) 4] [Chemical 5] (R in the formulas (4) and (5) is an alkylene group having 1 to 4 carbon atoms, 10 ≦ l + m + n + 2 ≦ 400, and the epoxy equivalent of the epoxy group represented by A is 140 to 500)
An epoxy resin composition for semiconductor encapsulation, comprising 0.1 to 3% by weight of the total composition.
JP32856193A 1993-12-24 1993-12-24 Epoxy resin composition Expired - Lifetime JP2925905B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32856193A JP2925905B2 (en) 1993-12-24 1993-12-24 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32856193A JP2925905B2 (en) 1993-12-24 1993-12-24 Epoxy resin composition

Publications (2)

Publication Number Publication Date
JPH07179568A true JPH07179568A (en) 1995-07-18
JP2925905B2 JP2925905B2 (en) 1999-07-28

Family

ID=18211655

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2925905B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100429363B1 (en) * 1998-12-08 2004-10-14 제일모직주식회사 Epoxy resin composition for semiconductor device sealing
KR100458274B1 (en) * 1998-12-30 2005-04-20 제일모직주식회사 Epoxy resin composition for semiconductor device sealing
JP2008127553A (en) * 2006-11-24 2008-06-05 Matsushita Electric Works Ltd Epoxy resin composition for sealing, and semiconductor device using it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100429363B1 (en) * 1998-12-08 2004-10-14 제일모직주식회사 Epoxy resin composition for semiconductor device sealing
KR100458274B1 (en) * 1998-12-30 2005-04-20 제일모직주식회사 Epoxy resin composition for semiconductor device sealing
JP2008127553A (en) * 2006-11-24 2008-06-05 Matsushita Electric Works Ltd Epoxy resin composition for sealing, and semiconductor device using it

Also Published As

Publication number Publication date
JP2925905B2 (en) 1999-07-28

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