JP3004454B2 - Resin composition - Google Patents

Resin composition

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Publication number
JP3004454B2
JP3004454B2 JP4059975A JP5997592A JP3004454B2 JP 3004454 B2 JP3004454 B2 JP 3004454B2 JP 4059975 A JP4059975 A JP 4059975A JP 5997592 A JP5997592 A JP 5997592A JP 3004454 B2 JP3004454 B2 JP 3004454B2
Authority
JP
Japan
Prior art keywords
epoxy resin
solder
resin composition
weight
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4059975A
Other languages
Japanese (ja)
Other versions
JPH05267506A (en
Inventor
明信 楠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
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Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP4059975A priority Critical patent/JP3004454B2/en
Publication of JPH05267506A publication Critical patent/JPH05267506A/en
Application granted granted Critical
Publication of JP3004454B2 publication Critical patent/JP3004454B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体デバイスの表面
実装化における耐半田ストレス性に優れた半導体封止用
エポキシ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in soldering stress resistance in surface mounting of a semiconductor device.

【0002】[0002]

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたオルソクレゾー
ルノボラックエポキシ樹脂をノボラック型フェノール樹
脂で硬化させるエポキシ樹脂組成物が用いられている。
ところが近年、集積回路の高集積化に伴いチップがだん
だん大型化し、かつパッケージは従来のDIPタイプか
ら表面実装化された小型、薄型のフラットパッケージ、
SOP、SOJ、PLCCに変わってきている。
2. Description of the Related Art Conventionally, electronic components such as diodes, transistors, and integrated circuits are sealed with a thermosetting resin. In particular, in an integrated circuit, ortho-cresol novolak epoxy resin having excellent heat resistance and moisture resistance is made of a novolak type. An epoxy resin composition cured with a phenol resin is used.
However, in recent years, chips have become larger and larger as integrated circuits have become more highly integrated, and packages have become smaller and thinner flat packages that are surface-mounted from conventional DIP types.
It is changing to SOP, SOJ, PLCC.

【0003】即ち大型チップを小型で薄いパッケージに
封入することになり、応力によりクラック発生、これら
のクラックによる耐湿性の低下等の問題が大きくクロー
ズアップされてきている。特に半田付けの工程において
急激に200℃以上の高温にさらされることによりパッ
ケージの割れや樹脂とチップの剥離により耐湿性が劣化
してしまうといった問題点がでてきている。これらの大
型チップを封止するのに適した、信頼性の高い封止用樹
脂組成物の開発が望まれてきている。これらの問題を解
決するために半田付け時の熱衝撃を緩和する目的で、熱
可塑性オリゴマーの添加(特開昭62−115849号
公報)や各種シリコーン化合物の添加(特開昭62−1
1585号公報、62−116654号公報、62−1
28162号公報)、更にはシリコーン変性(特開昭6
2−136860号公報)などの手法で対処しているが
いずれも半田付け時にパッケージにクラックが生じてし
まい信頼性の優れた半導体封止用エポキシ樹脂組成物を
得るまでには至らなかった。
That is, a large chip is enclosed in a small and thin package, and cracks are generated due to stress, and problems such as a decrease in moisture resistance due to the cracks have been greatly highlighted. In particular, there has been a problem in that abrupt exposure to a high temperature of 200 ° C. or more in a soldering process causes a crack in a package and a peeling of a resin and a chip to deteriorate moisture resistance. Development of a highly reliable sealing resin composition suitable for sealing these large chips has been desired. In order to solve these problems, thermoplastic oligomers (Japanese Patent Application Laid-Open No. 62-15849) and various silicone compounds (Japanese Patent Application Laid-Open No. 62-1) have been added for the purpose of reducing thermal shock during soldering.
No. 1585, No. 62-116654, No. 62-1
No. 28162), and further modified with silicone (Japanese Unexamined Patent Publication No.
However, in any case, cracks occur in the package at the time of soldering, and it has not been possible to obtain a highly reliable epoxy resin composition for semiconductor encapsulation.

【0004】一方、半田付け時の耐熱ストレス性つまり
耐半田ストレス性に優れた半導体封止用エポキシ樹脂組
成物を得るために、樹脂系としてビフェニル型エポキシ
樹脂の使用(特開昭64−65116号公報)等が、検
討されてきたがビフェニル型エポキシ樹脂の使用により
リードフレームとの密着性及び低吸水性が向上し、耐半
田ストレス性の向上、特にクラック発生が低減するが、
250℃以上のような高温では耐半田ストレス性が不十
分である。
On the other hand, in order to obtain an epoxy resin composition for semiconductor encapsulation having excellent heat stress resistance during soldering, that is, excellent solder stress resistance, a biphenyl type epoxy resin is used as a resin system (Japanese Patent Application Laid-Open No. 65116/1988). Publication) has been studied, but the use of a biphenyl type epoxy resin improves the adhesion to the lead frame and low water absorption, and improves the solder stress resistance, and in particular, reduces the occurrence of cracks.
At a high temperature such as 250 ° C. or higher, the solder stress resistance is insufficient.

【0005】[0005]

【発明が解決しようとする課題】本発明はこのような問
題に対して、式(1)で示されるエポキシ樹脂を用い
て、低吸水化、低線膨張化をはかり、また式(2)で示
される硬化剤を用いて、低吸水化、熱時低弾性化をはか
り、その相乗効果により、基板実装時における半導体パ
ッケージの耐半田ストレス性を著しく向上させた、半導
体封止用エポキシ樹脂組成物を提供することにある。
The present invention solves such a problem by using an epoxy resin represented by the formula (1) to reduce water absorption and linear expansion. Epoxy resin composition for semiconductor encapsulation that uses the curing agent shown to achieve low water absorption and low elasticity during heat, and the synergistic effect significantly improves the solder stress resistance of the semiconductor package when mounted on a substrate. Is to provide.

【0006】[0006]

【課題を解決するための手段】本発明の樹脂組成物は、
(A)下記式(1)で示されるエポキシ樹脂 1,6−
ビス(2,3−エポキシプロポキシ)ナフタレン
The resin composition of the present invention comprises:
(A) Epoxy resin 1,6- represented by the following formula (1)
Bis (2,3-epoxypropoxy) naphthalene

【0007】[0007]

【化3】 Embedded image

【0008】を総エポキシ樹脂量に対して30〜100
重量%含むエポキシ樹脂、(B)下記式(2)で示され
るフェノール樹脂
[0008] 30 to 100 with respect to the total amount of epoxy resin
(B) a phenolic resin represented by the following formula (2):

【0009】[0009]

【化4】 Embedded image

【0010】を総フェノール樹脂硬化剤量に対して30
〜100重量%含む硬化剤、(C)無機充填材及び
(D)硬化促進剤からなる半導体封止用エポキシ樹脂組
成物で、従来の樹脂組成物に比べ、優れた耐半田ストレ
ス性を有するものである。
Of the total phenolic resin curing agent by 30
An epoxy resin composition for semiconductor encapsulation, comprising a curing agent containing up to 100% by weight, (C) an inorganic filler and (D) a curing accelerator, which has excellent solder stress resistance as compared with conventional resin compositions. It is.

【0011】本発明に用いる式(1)で示されるエポキ
シ樹脂は、1,6−ビス(2,3−エポキシプロポキ
シ)ナフタレンであり、常温で半固形の性状を示し、成
形温度(175℃)において非常に低粘度であることか
ら、充填材の添加量を大幅に増加させることが可能とな
る。このことより、低吸水性に優れ、樹脂の線膨張係数
が小さく、成形時の離型性に優れるという樹脂本体の特
長に加え、充填材が高充填された樹脂組成物は、吸水率
及び線膨張係数がさらに小さく、かつ衝撃強度に優れる
という特長を有し、半田付け時の耐半田ストレス性に良
好の結果を示す。この1,6−ビス(2,3−エポキシ
プロポキシ)ナフタレンの使用量は、これを調節するこ
とにより耐半田ストレス性を最大限に引き出すことがで
きる。
The epoxy resin represented by the formula (1) used in the present invention is 1,6-bis (2,3-epoxypropoxy) naphthalene, which exhibits a semi-solid property at room temperature and a molding temperature (175 ° C.) In this case, the viscosity is very low, so that the amount of the filler added can be greatly increased. Thus, in addition to the characteristics of the resin body that is excellent in low water absorption, the coefficient of linear expansion of the resin is small, and the mold releasability during molding is excellent, the resin composition highly filled with a filler has a water absorption rate and a linear It has the characteristics that the coefficient of expansion is smaller and the impact strength is excellent, and shows good results in the resistance to soldering stress during soldering. The amount of 1,6-bis (2,3-epoxypropoxy) naphthalene used can be adjusted to maximize the solder stress resistance.

【0012】耐半田ストレス性の効果をだすためには、
1,6−ビス(2,3−エポキシプロポキシ)ナフタレ
ンを総エポキシ樹脂量の30重量%以上、好ましくは6
0重量%以上の使用が望ましい。30重量%未満では、
低吸水性、低線熱膨張係数が十分に得られず、耐半田ス
トレス性が不十分である。1,6−ビス(2,3−エポ
キシプロポキシ)ナフタレン以外のエポキシ樹脂を併用
する場合、用いるエポキシ樹脂とは、エポキシ基を有す
るポリマー全般をいう。たとえばビスフェノール型エポ
キシ樹脂、クレゾールノボラック型エポキシ樹脂、ビフ
ェニル型エポキシ樹脂、フェノールノボラック型エポキ
シ樹脂及びトリフェノールメタン型エポキシ樹脂、アル
キル変性トリフェノールメタン型エポキシ樹脂等の3官
能エポキシ樹脂、トリアジン核含有エポキシ樹脂等が挙
げられる。
In order to obtain the effect of resistance to soldering stress,
1,6-bis (2,3-epoxypropoxy) naphthalene is used in an amount of 30% by weight or more, preferably 6% by weight of the total epoxy resin.
It is desirable to use 0% by weight or more. If it is less than 30% by weight,
Low water absorption and low coefficient of linear thermal expansion cannot be obtained sufficiently, and solder stress resistance is insufficient. When an epoxy resin other than 1,6-bis (2,3-epoxypropoxy) naphthalene is used in combination, the epoxy resin used generally refers to any polymer having an epoxy group. For example, trifunctional epoxy resins such as bisphenol type epoxy resin, cresol novolak type epoxy resin, biphenyl type epoxy resin, phenol novolak type epoxy resin, triphenolmethane type epoxy resin, alkyl-modified triphenolmethane type epoxy resin, and epoxy resin containing triazine nucleus And the like.

【0013】式(2)で示されるフェノール樹脂硬化剤
は、フェノールとP−キシレングリコールジメチルエー
テルの重縮合物であり、低吸水性及び可撓性に優れる特
徴を有する。特に半田付け時の高温時の可撓性に優れて
おり、250〜260℃での半田付け時の半田耐熱性に
著しい効果をもたらす。この、フェノールとP−キシレ
ングリコールジメチルエーテルの重縮合フェノール樹脂
硬化剤の使用量は、これを調整することにより半田耐熱
性を最大限に引き出すことができる。半田耐熱性の効果
を引き出すには式(2)で示されるフェノール樹脂硬化
剤を総硬化剤の30重量%以上、好ましくは60重量%
以上の使用が望ましい。30重量%未満では可撓性が不
充分となり、半田付け時の半田耐熱性が充分に得られな
い。nの値は1〜6であり、6を超えると流動性が低下
し、成形性が悪くなる。
The phenol resin curing agent represented by the formula (2) is a polycondensate of phenol and P-xylene glycol dimethyl ether, and has characteristics of low water absorption and excellent flexibility. In particular, it has excellent flexibility at high temperatures during soldering, and has a remarkable effect on solder heat resistance during soldering at 250 to 260 ° C. By adjusting the amount of the polycondensed phenol resin curing agent of phenol and P-xylene glycol dimethyl ether, the solder heat resistance can be maximized by adjusting the amount. In order to bring out the effect of solder heat resistance, the phenol resin curing agent represented by the formula (2) is used in an amount of 30% by weight or more, preferably 60% by weight of the total curing agent.
The above use is desirable. If the amount is less than 30% by weight, the flexibility becomes insufficient, and the soldering heat resistance at the time of soldering cannot be sufficiently obtained. The value of n is from 1 to 6, and when it exceeds 6, the fluidity is reduced and the moldability is deteriorated.

【0014】式(2)で示されるフェノール樹脂硬化剤
以外に他のものを併用する場合、用いるものとしては主
にフェノール性水酸基を有するポリマー全般をいう。例
えば、フェノールノボラック樹脂、クレゾールノボラッ
ク樹脂、ジシクロペンタジエン変性フェノール樹脂、ジ
シクロペンタジエン変性フェノール樹脂とフェノールノ
ボラック及びクレゾールノボラック樹脂との共重合物、
ナフタレン変性フェノール樹脂等を用いることが出来
る。本発明で用いる無機充填材としては、溶融シリカ粉
末、球状シリカ粉末、結晶シリカ粉末、2次凝集シリカ
粉末、多孔質シリカ粉末、2次凝集シリカ粉末または多
孔質シリカ粉末を粉砕したシリカ粉末、アルミナ等が挙
げられ、特に溶融シリカ粉末が好ましい。
When other than the phenolic resin curing agent represented by the formula (2) is used in combination, the term mainly refers to all polymers having a phenolic hydroxyl group. For example, a phenol novolak resin, a cresol novolak resin, a dicyclopentadiene-modified phenol resin, a copolymer of a dicyclopentadiene-modified phenol resin with a phenol novolak and a cresol novolak resin,
A naphthalene-modified phenol resin or the like can be used. Examples of the inorganic filler used in the present invention include fused silica powder, spherical silica powder, crystalline silica powder, secondary aggregated silica powder, porous silica powder, silica powder obtained by pulverizing secondary aggregated silica powder or porous silica powder, alumina And the like, and a fused silica powder is particularly preferred.

【0015】本発明に使用される硬化促進剤はエポキシ
基とフェノール性水酸基との反応を促進するものであれ
ばよく、一般に封止用材料に使用されているものを広く
使用することができ、例えばジアザビシクロウンデセン
(DBU)、トリフェニルホスフィン(TPP)、ジメ
チルベンジルアミン(BDMA)や2メチルイミダゾー
ル(2MZ)等が単独もしくは2種類以上混合して用い
られる。本発明の封止用エポキシ樹脂組成物はエポキシ
樹脂、硬化剤、無機充填材及び硬化促進剤を必須成分と
するが、これ以外に必要に応じてシランカップリング
剤、ブロム化エポキシ樹脂、三酸化アンチモン、ヘキサ
ブロムベンゼン等の難燃剤、カーボンブラック、ベンガ
ラ等の着色剤、天然ワックス、合成ワックス等の離型剤
及びシリコーンオイル、ゴム等の低応力添加剤等の種々
の添加剤を適宜配合しても差し支えがない。
The curing accelerator used in the present invention may be any one that promotes the reaction between an epoxy group and a phenolic hydroxyl group, and those commonly used for sealing materials can be widely used. For example, diazabicycloundecene (DBU), triphenylphosphine (TPP), dimethylbenzylamine (BDMA), 2-methylimidazole (2MZ), or the like is used alone or in combination of two or more. The epoxy resin composition for encapsulation of the present invention contains an epoxy resin, a curing agent, an inorganic filler and a curing accelerator as essential components, but may optionally further comprise a silane coupling agent, a brominated epoxy resin, and trioxide. Various additives such as flame retardants such as antimony and hexabromobenzene, coloring agents such as carbon black and red iron oxide, release agents such as natural wax and synthetic wax, and low stress additives such as silicone oil and rubber are appropriately mixed. No problem.

【0016】又、本発明の封止用エポキシ樹脂組成物を
成形材料として製造するには、エポキシ樹脂、硬化剤、
硬化促進剤、充填材、その他の添加剤をミキサー等によ
って十分に均一に混合した後、さらに熱ロールまたはニ
ーダー等で溶融混練し、冷却後粉砕して成形材料とする
ことができる。これらの成形材料は電子部品あるいは電
気部品の封止、被覆、絶縁等に適用することができる。
In order to produce the encapsulating epoxy resin composition of the present invention as a molding material, an epoxy resin, a curing agent,
After a curing accelerator, a filler, and other additives are sufficiently and uniformly mixed by a mixer or the like, the mixture is further melt-kneaded by a hot roll or a kneader, cooled, and pulverized to obtain a molding material. These molding materials can be applied to sealing, coating, insulating and the like of electronic parts or electric parts.

【0017】以下、本発明を実施例で具体的に説明す
る。
Hereinafter, the present invention will be described specifically with reference to Examples.

【実施例】実施例1 下記式(1)で示されるエポキシ樹脂(エポキシ当量150) 4.4重量部Example 1 4.4 parts by weight of an epoxy resin represented by the following formula (1) (epoxy equivalent: 150)

【0018】[0018]

【化5】 Embedded image

【0019】 オルソクレゾールノボラックエポキシ樹脂(軟化点65℃、エポキシ当量200 ) 8.8重量部 式(3)で示されるフェノール樹脂硬化剤(軟化点80℃、水酸基当量170) 3.6重量部Orthocresol novolak epoxy resin (softening point 65 ° C., epoxy equivalent 200) 8.8 parts by weight Phenolic resin curing agent represented by the formula (3) (softening point 80 ° C., hydroxyl equivalent 170) 3.6 parts by weight

【0020】[0020]

【化6】 Embedded image

【0021】 (n=1が20重量%、n=2が60重量%、n=3が20重量%の混合物) フェノールノボラック樹脂硬化剤(軟化点105℃、水酸基当量100) 7.2重量部 溶融シリカ粉末 75.0重量部 トリフェニルホスフィン 0.2重量部 カーボンブラック 0.3重量部 カルナバワックス 0.5重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕し成形材料とした。得られ
た成形材料を、タブレット化し、低圧トランスファー成
形機にて175℃、70kg/cm2 、120秒の条件で半
田クラック試験用として6×6mmのチップを52pパッ
ケージに封止し、又半田耐湿性試験用として3×6mmの
チップを16pSOPパッケージに封止した。封止した
テスト用素子について下記の半田クラック試験及び半田
耐湿性試験を行った。試験結果を表1に示す。半田スト
レス性及び半田耐湿性とともに優れたものであった。
(A mixture in which n = 1 is 20% by weight, n = 2 is 60% by weight, and n = 3 is 20% by weight) 7.2 parts by weight of a phenol novolak resin curing agent (softening point: 105 ° C., hydroxyl equivalent: 100) 75.0 parts by weight of fused silica powder 0.2 parts by weight of triphenylphosphine 0.3 parts by weight of carbon black 0.5 parts by weight of carnauba wax are mixed at room temperature with a mixer, and kneaded at 70-100 ° C. with a biaxial roll, After cooling, it was pulverized to obtain a molding material. The obtained molding material is tableted, and a low pressure transfer molding machine is used to seal a 6 × 6 mm chip in a 52p package at 175 ° C., 70 kg / cm 2 , for 120 seconds for solder cracking test. A 3 × 6 mm chip was sealed in a 16 pSOP package for a sex test. The sealed test element was subjected to the following solder crack test and solder moisture resistance test. Table 1 shows the test results. It was excellent together with solder stress property and solder moisture resistance.

【0022】半田ストレス試験:封止したテスト用素子
を85℃、85%RHの環境下で72Hr処理し、その
後260℃の半田槽に10秒間浸漬後、顕微鏡で外部ク
ラックを観察した。 半田耐湿性試験:封止したテスト用素子を85℃で、8
5%RHの環境下で72Hr処理し、その後240℃の
半田槽に10秒間浸漬後、プレッシャークッカー試験
(125℃、100%RH)を行い回路のオープン不良
を測定した。
Solder stress test: The sealed test element was treated for 72 hours in an environment of 85 ° C. and 85% RH, then immersed in a solder bath at 260 ° C. for 10 seconds, and external cracks were observed with a microscope. Solder moisture resistance test: Sealed test element was tested at 85 ° C for 8
After treating for 72 hours in an environment of 5% RH and then immersing in a solder bath at 240 ° C. for 10 seconds, a pressure cooker test (125 ° C., 100% RH) was performed to measure the open failure of the circuit.

【0023】実施例2〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料で試験用の封止した成形品を
得、この成形品を用いて実施例1と同様に半田クラック
試験及び半田耐湿性試験を行った。試験結果を表1に示
す。すべて半田ストレス性及び半田耐湿性に優れたもの
であった。
Examples 2 to 5 Compounded according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A sealed molded product for a test was obtained from this molding material, and a solder crack test and a solder moisture resistance test were performed using this molded product in the same manner as in Example 1. Table 1 shows the test results. All were excellent in solder stress property and solder moisture resistance.

【0024】比較例1〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料で試験用の封止した成形品を
得、この成形品を用いて実施例1と同様に半田クラック
試験及び半田耐湿性試験を行った。試験結果を表1に示
す。いずれも半田ストレス性、半田耐湿性で不良であっ
た。
Comparative Examples 1 to 5 Compounded according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A sealed molded product for a test was obtained from this molding material, and a solder crack test and a solder moisture resistance test were performed using this molded product in the same manner as in Example 1. Table 1 shows the test results. All were poor in solder stress property and solder moisture resistance.

【0025】[0025]

【表1】 [Table 1]

【0026】[0026]

【発明の効果】本発明による半導体封止用エポキシ樹脂
組成物は、耐半田ストレス性および耐湿性に極めて優れ
ていることにより、表面実装パッケージ封止用樹脂組成
物として好適である。
The epoxy resin composition for encapsulating a semiconductor according to the present invention is extremely excellent in solder stress resistance and moisture resistance, and thus is suitable as a resin composition for encapsulating a surface mount package.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H01L 23/31 ──────────────────────────────────────────────────の Continued on front page (51) Int.Cl. 7 Identification code FI H01L 23/31

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 (A)下記式(1)で示されるエポキシ
樹脂 1,6−ビス(2,3−エポキシプロポキシ)ナ
フタレン 【化1】 を総エポキシ樹脂量に対して30〜100重量%含むエ
ポキシ樹脂、 (B)下記式(2)で示されるフェノール樹脂 【化2】 を総フェノール樹脂硬化剤量に対して30〜100重量
%含む硬化剤、 (C)無機充填材及び (D)硬化促進剤 を必須成分とする半導体封止用エポキシ樹脂組成物。
(A) An epoxy resin represented by the following formula (1): 1,6-bis (2,3-epoxypropoxy) naphthalene (B) a phenolic resin represented by the following formula (2): An epoxy resin composition for semiconductor encapsulation comprising, as essential components, a curing agent containing from 30 to 100% by weight based on the total amount of the phenol resin curing agent, (C) an inorganic filler and (D) a curing accelerator.
JP4059975A 1992-03-17 1992-03-17 Resin composition Expired - Fee Related JP3004454B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4059975A JP3004454B2 (en) 1992-03-17 1992-03-17 Resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4059975A JP3004454B2 (en) 1992-03-17 1992-03-17 Resin composition

Publications (2)

Publication Number Publication Date
JPH05267506A JPH05267506A (en) 1993-10-15
JP3004454B2 true JP3004454B2 (en) 2000-01-31

Family

ID=13128687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4059975A Expired - Fee Related JP3004454B2 (en) 1992-03-17 1992-03-17 Resin composition

Country Status (1)

Country Link
JP (1) JP3004454B2 (en)

Also Published As

Publication number Publication date
JPH05267506A (en) 1993-10-15

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