JPH059512B2 - - Google Patents
Info
- Publication number
- JPH059512B2 JPH059512B2 JP448585A JP448585A JPH059512B2 JP H059512 B2 JPH059512 B2 JP H059512B2 JP 448585 A JP448585 A JP 448585A JP 448585 A JP448585 A JP 448585A JP H059512 B2 JPH059512 B2 JP H059512B2
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- film
- base material
- cutting
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010432 diamond Substances 0.000 claims description 44
- 229910003460 diamond Inorganic materials 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 3
- 239000011247 coating layer Substances 0.000 claims 3
- 239000010410 layer Substances 0.000 claims 2
- 239000000463 material Substances 0.000 description 21
- 238000005520 cutting process Methods 0.000 description 14
- 239000012535 impurity Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 229910000997 High-speed steel Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000012808 vapor phase Substances 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- -1 TiC Chemical class 0.000 description 2
- 239000011195 cermet Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP448585A JPS61163273A (ja) | 1985-01-14 | 1985-01-14 | 被覆硬質部材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP448585A JPS61163273A (ja) | 1985-01-14 | 1985-01-14 | 被覆硬質部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61163273A JPS61163273A (ja) | 1986-07-23 |
| JPH059512B2 true JPH059512B2 (https=) | 1993-02-05 |
Family
ID=11585395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP448585A Granted JPS61163273A (ja) | 1985-01-14 | 1985-01-14 | 被覆硬質部材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61163273A (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06952B2 (ja) * | 1985-04-18 | 1994-01-05 | 鐘淵化学工業株式会社 | 硬質カ−ボン膜 |
| US5266409A (en) * | 1989-04-28 | 1993-11-30 | Digital Equipment Corporation | Hydrogenated carbon compositions |
| DE69013852T2 (de) * | 1989-06-15 | 1995-06-08 | Idemitsu Petrochemical Co., Ltd., Tokio/Tokyo | Mit diamant beschichtetes element. |
| US5334453A (en) * | 1989-12-28 | 1994-08-02 | Ngk Spark Plug Company Limited | Diamond-coated bodies and process for preparation thereof |
| US5126206A (en) * | 1990-03-20 | 1992-06-30 | Diamonex, Incorporated | Diamond-on-a-substrate for electronic applications |
| US6183843B1 (en) * | 1991-12-06 | 2001-02-06 | Raytheon Company | Method for producing low reflectance diamond and products therefor |
| CA2082711A1 (en) * | 1991-12-13 | 1993-06-14 | Philip G. Kosky | Cvd diamond growth on hydride-forming metal substrates |
| CA2089288A1 (en) * | 1992-03-20 | 1993-09-21 | David E. Slutz | Multilayer cvd diamond films |
| US5281851A (en) * | 1992-10-02 | 1994-01-25 | Hewlett-Packard Company | Integrated circuit packaging with reinforced leads |
| JP3498363B2 (ja) * | 1994-06-13 | 2004-02-16 | 住友電気工業株式会社 | ダイヤモンドの合成方法 |
-
1985
- 1985-01-14 JP JP448585A patent/JPS61163273A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61163273A (ja) | 1986-07-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |