JPH058856B2 - - Google Patents

Info

Publication number
JPH058856B2
JPH058856B2 JP9028386A JP9028386A JPH058856B2 JP H058856 B2 JPH058856 B2 JP H058856B2 JP 9028386 A JP9028386 A JP 9028386A JP 9028386 A JP9028386 A JP 9028386A JP H058856 B2 JPH058856 B2 JP H058856B2
Authority
JP
Japan
Prior art keywords
film
resist film
pattern
resist
patterned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP9028386A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62247523A (ja
Inventor
Eiichi Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9028386A priority Critical patent/JPS62247523A/ja
Publication of JPS62247523A publication Critical patent/JPS62247523A/ja
Publication of JPH058856B2 publication Critical patent/JPH058856B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9028386A 1986-04-18 1986-04-18 半導体装置の製造方法 Granted JPS62247523A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9028386A JPS62247523A (ja) 1986-04-18 1986-04-18 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9028386A JPS62247523A (ja) 1986-04-18 1986-04-18 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS62247523A JPS62247523A (ja) 1987-10-28
JPH058856B2 true JPH058856B2 (en, 2012) 1993-02-03

Family

ID=13994187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9028386A Granted JPS62247523A (ja) 1986-04-18 1986-04-18 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62247523A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4524774B2 (ja) * 2003-06-13 2010-08-18 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP5638883B2 (ja) * 2010-09-09 2014-12-10 ラピスセミコンダクタ株式会社 感光性レジストパターンの形成方法、及び半導体装置の製造方法
JP6713336B2 (ja) * 2016-04-21 2020-06-24 Hoya株式会社 マスクブランクの製造方法、および転写用マスクの製造方法

Also Published As

Publication number Publication date
JPS62247523A (ja) 1987-10-28

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