JPH0586674B2 - - Google Patents
Info
- Publication number
- JPH0586674B2 JPH0586674B2 JP59042411A JP4241184A JPH0586674B2 JP H0586674 B2 JPH0586674 B2 JP H0586674B2 JP 59042411 A JP59042411 A JP 59042411A JP 4241184 A JP4241184 A JP 4241184A JP H0586674 B2 JPH0586674 B2 JP H0586674B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- region
- type
- source
- conductivity type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 28
- 239000004065 semiconductor Substances 0.000 claims description 14
- 239000013078 crystal Substances 0.000 claims description 13
- 239000012535 impurity Substances 0.000 claims description 13
- 230000000295 complement effect Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000010354 integration Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59042411A JPS60186053A (ja) | 1984-03-06 | 1984-03-06 | 薄膜相補型mos回路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59042411A JPS60186053A (ja) | 1984-03-06 | 1984-03-06 | 薄膜相補型mos回路 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6231630A Division JP2647020B2 (ja) | 1994-09-27 | 1994-09-27 | 相補型薄膜トランジスタ及びその製造方法 |
JP6231631A Division JP2562419B2 (ja) | 1994-09-27 | 1994-09-27 | 相補型薄膜トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60186053A JPS60186053A (ja) | 1985-09-21 |
JPH0586674B2 true JPH0586674B2 (ko) | 1993-12-13 |
Family
ID=12635322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59042411A Granted JPS60186053A (ja) | 1984-03-06 | 1984-03-06 | 薄膜相補型mos回路 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60186053A (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6412577A (en) * | 1987-07-06 | 1989-01-17 | Canon Kk | Thin film transistor |
JP2940880B2 (ja) * | 1990-10-09 | 1999-08-25 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
JPH04206971A (ja) * | 1990-11-30 | 1992-07-28 | Sharp Corp | 薄膜半導体装置 |
US7071910B1 (en) | 1991-10-16 | 2006-07-04 | Semiconductor Energy Laboratory Co., Ltd. | Electrooptical device and method of driving and manufacturing the same |
US7253440B1 (en) * | 1991-10-16 | 2007-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having at least first and second thin film transistors |
JP2784615B2 (ja) | 1991-10-16 | 1998-08-06 | 株式会社半導体エネルギー研究所 | 電気光学表示装置およびその駆動方法 |
US6441758B1 (en) | 1997-11-27 | 2002-08-27 | Semiconductor Energy Laboratory Co., Ltd. | D/A conversion circuit and semiconductor device |
JP4651773B2 (ja) * | 1999-04-06 | 2011-03-16 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US6346730B1 (en) | 1999-04-06 | 2002-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device having a pixel TFT formed in a display region and a drive circuit formed in the periphery of the display region on the same substrate |
JP4662647B2 (ja) * | 2001-03-30 | 2011-03-30 | シャープ株式会社 | 表示装置及びその製造方法 |
FR2829114B1 (fr) | 2001-09-04 | 2004-11-12 | Oreal | Dispositif de conditionnement et de distribution d'un produit liquide |
JP5844956B2 (ja) * | 2009-03-05 | 2016-01-20 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US20120104402A1 (en) * | 2010-11-03 | 2012-05-03 | Pei-Hua Chen | Architecture of analog buffer circuit |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52113177A (en) * | 1976-03-18 | 1977-09-22 | Matsushita Electric Ind Co Ltd | Semiconductor device |
JPS5721855A (en) * | 1980-07-16 | 1982-02-04 | Toshiba Corp | Manufacture of complementary mos semiconductor device |
JPS5750463A (en) * | 1980-09-11 | 1982-03-24 | Toshiba Corp | Complementary type mos semiconductor device |
JPS5771170A (en) * | 1980-10-22 | 1982-05-01 | Toshiba Corp | Manufacture of complementary mos semiconductor device |
-
1984
- 1984-03-06 JP JP59042411A patent/JPS60186053A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52113177A (en) * | 1976-03-18 | 1977-09-22 | Matsushita Electric Ind Co Ltd | Semiconductor device |
JPS5721855A (en) * | 1980-07-16 | 1982-02-04 | Toshiba Corp | Manufacture of complementary mos semiconductor device |
JPS5750463A (en) * | 1980-09-11 | 1982-03-24 | Toshiba Corp | Complementary type mos semiconductor device |
JPS5771170A (en) * | 1980-10-22 | 1982-05-01 | Toshiba Corp | Manufacture of complementary mos semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS60186053A (ja) | 1985-09-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |