JPH0586651B2 - - Google Patents
Info
- Publication number
- JPH0586651B2 JPH0586651B2 JP57171254A JP17125482A JPH0586651B2 JP H0586651 B2 JPH0586651 B2 JP H0586651B2 JP 57171254 A JP57171254 A JP 57171254A JP 17125482 A JP17125482 A JP 17125482A JP H0586651 B2 JPH0586651 B2 JP H0586651B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- flat band
- band voltage
- silicon
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H10P34/42—
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57171254A JPS5961138A (ja) | 1982-09-30 | 1982-09-30 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57171254A JPS5961138A (ja) | 1982-09-30 | 1982-09-30 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5961138A JPS5961138A (ja) | 1984-04-07 |
| JPH0586651B2 true JPH0586651B2 (show.php) | 1993-12-13 |
Family
ID=15919908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57171254A Granted JPS5961138A (ja) | 1982-09-30 | 1982-09-30 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5961138A (show.php) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5210766A (en) * | 1990-12-27 | 1993-05-11 | Xerox Corporation | Laser crystallized cladding layers for improved amorphous silicon light-emitting diodes and radiation sensors |
| US5162239A (en) * | 1990-12-27 | 1992-11-10 | Xerox Corporation | Laser crystallized cladding layers for improved amorphous silicon light-emitting diodes and radiation sensors |
| JP3600245B2 (ja) * | 1995-03-16 | 2004-12-15 | ローム株式会社 | カード用プリンタおよびこれを用いたカード印刷方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5758363A (en) * | 1980-09-26 | 1982-04-08 | Oki Electric Ind Co Ltd | Manufacture of mos type semiconductor device |
-
1982
- 1982-09-30 JP JP57171254A patent/JPS5961138A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5961138A (ja) | 1984-04-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4369040B2 (ja) | 固体材料からなる薄膜の作製方法 | |
| JPS6259896B2 (show.php) | ||
| JPH1050607A (ja) | 半導体装置の製造方法 | |
| JPH0586651B2 (show.php) | ||
| JPH023308B2 (show.php) | ||
| JP2009048199A (ja) | 液晶表示装置用薄膜トランジスタ基板およびその製造方法 | |
| JPH08148692A (ja) | 薄膜半導体装置の製造方法 | |
| JPH0467336B2 (show.php) | ||
| JPS5823475A (ja) | 半導体装置及び製造方法 | |
| JPS5833822A (ja) | 半導体基体の製作方法 | |
| JPS5860560A (ja) | 半導体装置の冗長回路およびそのフユ−ズ部切断方法 | |
| JPS6250972B2 (show.php) | ||
| KR20080074023A (ko) | 전기 절연 재료의 표면 상에 안착하는 반도체층의 두께감소 및 균일화 방법 | |
| JPH0468770B2 (show.php) | ||
| JPS5837934A (ja) | 半導体装置の製造方法 | |
| JPS58190043A (ja) | 多層配線法 | |
| JP3413710B2 (ja) | 薄膜トランジスタの製造方法 | |
| JPH01256124A (ja) | Mos型半導体装置の製造方法 | |
| JPH0620895A (ja) | Soi基板の製造方法 | |
| JPH01287964A (ja) | 半導体装置の製造方法 | |
| JPS6333292B2 (show.php) | ||
| JP2560030B2 (ja) | 半導体装置の製造方法 | |
| JPH0642493B2 (ja) | 半導体装置の製造方法 | |
| JPH0336312B2 (show.php) | ||
| JPH10163112A (ja) | 半導体装置の製造方法 |