JPH0583080B2 - - Google Patents
Info
- Publication number
- JPH0583080B2 JPH0583080B2 JP15991887A JP15991887A JPH0583080B2 JP H0583080 B2 JPH0583080 B2 JP H0583080B2 JP 15991887 A JP15991887 A JP 15991887A JP 15991887 A JP15991887 A JP 15991887A JP H0583080 B2 JPH0583080 B2 JP H0583080B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- nitrogen
- printed wiring
- wiring board
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1216—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by screen printing or stencil printing
- H05K3/1225—Screens or stencils; Holders therefor
-
- H10W70/098—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15192—Resurf arrangement of the internal vias
-
- H10W70/63—
-
- H10W90/724—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Printing Plates And Materials Therefor (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/907,268 US4803110A (en) | 1986-09-15 | 1986-09-15 | Coated mask for photolithographic construction of electric circuits |
| US907268 | 1986-09-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6377787A JPS6377787A (ja) | 1988-04-07 |
| JPH0583080B2 true JPH0583080B2 (Direct) | 1993-11-24 |
Family
ID=25423797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62159918A Granted JPS6377787A (ja) | 1986-09-15 | 1987-06-29 | プリント配線板製造用マスク及びその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4803110A (Direct) |
| EP (1) | EP0267359B1 (Direct) |
| JP (1) | JPS6377787A (Direct) |
| DE (1) | DE3785826T2 (Direct) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5063660A (en) * | 1988-05-26 | 1991-11-12 | Siemens Aktiengesellschaft | Method for manufacturing preforms coated with hard solder for repairing interconnect interruptions |
| US4953460A (en) * | 1989-10-02 | 1990-09-04 | At&T Bell Laboratories | Method and apparatus for screen printing |
| JPH0661926B2 (ja) * | 1990-02-14 | 1994-08-17 | 株式会社鈴寅整染工場 | 印刷用スクリーンの製造方法 |
| US5195243A (en) * | 1992-02-28 | 1993-03-23 | General Motors Corporation | Method of making a coated porous metal panel |
| US5527586A (en) * | 1992-03-18 | 1996-06-18 | Printron, Inc. | Apparatus and method for depositing metal particles on a dielectric substrate |
| US5814367A (en) * | 1993-08-13 | 1998-09-29 | General Atomics | Broadband infrared and signature control materials and methods of producing the same |
| US5502400A (en) * | 1994-02-15 | 1996-03-26 | International Business Machines Corporation | Logically configurable impedance matching input terminators for VLSI |
| US6235105B1 (en) | 1994-12-06 | 2001-05-22 | General Atomics | Thin film pigmented optical coating compositions |
| US5819652A (en) * | 1994-12-14 | 1998-10-13 | International Business Machines Corporation | Reduced cavity depth screening stencil |
| TW289901B (Direct) * | 1994-12-28 | 1996-11-01 | Ricoh Microelectronics Kk | |
| US5669972A (en) * | 1995-04-27 | 1997-09-23 | International Business Machines Corporation | Flex tab thick film metal mask |
| GB2307446A (en) * | 1995-11-25 | 1997-05-28 | Ibm | Solder paste deposition |
| JPH11510754A (ja) * | 1996-06-11 | 1999-09-21 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | ステンシル印刷法による平基板上へのトラック形成方法 |
| DE19640285C2 (de) * | 1996-09-30 | 1998-11-12 | Siemens Nixdorf Inf Syst | Vorrichtung zum Auftragen von Lötpaste auf die Kontaktelemente von Ball Grid Array-Bauteilen |
| US5744214A (en) * | 1997-01-30 | 1998-04-28 | International Business Machines Corporation | Corrosion resistant molybdenum mask |
| US6669781B2 (en) | 1997-09-23 | 2003-12-30 | Micron Technology, Inc. | Method and apparatus for improving stencil/screen print quality |
| US6194085B1 (en) | 1997-09-27 | 2001-02-27 | International Business Machines Corporation | Optical color tracer identifier in metal paste that bleed to greensheet |
| US5927193A (en) * | 1997-10-16 | 1999-07-27 | International Business Machines Corporation | Process for via fill |
| US6002951A (en) * | 1997-11-12 | 1999-12-14 | International Business Machines Corporation | Multi-layer ceramic substrate having high TC superconductor circuitry |
| US6045615A (en) * | 1998-01-28 | 2000-04-04 | International Business Machines Corporation | Homogeneous screening nozzle |
| US6089151A (en) * | 1998-02-24 | 2000-07-18 | Micron Technology, Inc. | Method and stencil for extruding material on a substrate |
| US5878661A (en) * | 1998-07-13 | 1999-03-09 | Ford Motor Company | Self-shearing stencil |
| US6095041A (en) * | 1999-07-22 | 2000-08-01 | International Business Corporation | Stencil mask with channels including depressions |
| US6217989B1 (en) | 1999-12-10 | 2001-04-17 | International Business Machines Corporation | Conductive line features for enhanced reliability of multi-layer ceramic substrates |
| DE102005063510B4 (de) * | 2005-09-22 | 2010-06-02 | Siemens Aktiengesellschaft | Verwendung eines Verfahrens zur Beschichtung einer Druckschablone eines SMT-Prozesses |
| JP2011201054A (ja) * | 2010-03-24 | 2011-10-13 | Panasonic Corp | スクリーン印刷装置およびスクリーン印刷方法 |
| CN101906615A (zh) * | 2010-07-20 | 2010-12-08 | 潘宇强 | 氮化钛新型复合材料的smt金属掩模板之制作方法 |
| CN101928926A (zh) * | 2010-07-20 | 2010-12-29 | 潘宇强 | 氮化铬新型复合材料的smt金属掩膜板之制作方法 |
| CN101932200A (zh) * | 2010-07-20 | 2010-12-29 | 潘宇强 | 碳化钛新型复合材料的smt金属掩膜板之制作方法 |
| DE102011003287A1 (de) * | 2011-01-27 | 2012-08-02 | Christian Koenen Gmbh | Druckschablone zum Aufbringen eines Druckmusters auf ein Substrat und Verfahren zum Herstellen einer Druckschablone |
| CN103717403B (zh) * | 2011-08-10 | 2016-08-31 | 太阳诱电化学科技株式会社 | 包含薄底漆膜的结构体和包含薄底漆膜的镂空版印刷版 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1564896A1 (de) * | 1966-08-30 | 1970-01-08 | Telefunken Patent | Halbleiteranordnung |
| GB1260468A (en) * | 1968-03-28 | 1972-01-19 | Nat Res Dev | Improvements in or relating to the formation of connections on microelectronic circuits |
| US3802078A (en) * | 1971-06-07 | 1974-04-09 | P Denes | Cutting device and method for making same |
| AT350285B (de) * | 1974-08-07 | 1979-05-25 | Plansee Metallwerk | Mit einem ueberzug versehene, metallische gebrauchsgegenstaende |
| US4006073A (en) * | 1975-04-03 | 1977-02-01 | The United States Of America As Represented By The United States Energy Research And Development Administration | Thin film deposition by electric and magnetic crossed-field diode sputtering |
| US4169913A (en) * | 1978-03-01 | 1979-10-02 | Sumitomo Electric Industries, Ltd. | Coated tool steel and machining tool formed therefrom |
| CH640885A5 (de) * | 1978-07-21 | 1984-01-31 | Suisse Horlogerie Rech Lab | Mit einem harten ueberzug versehene maschinenelemente. |
| US4260658A (en) * | 1979-06-21 | 1981-04-07 | Kobe, Inc. | Erosion resistant surface |
| JPS581067A (ja) * | 1981-06-26 | 1983-01-06 | Toshiba Corp | 装飾用金属窒化物皮膜の形成法 |
| JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
| IL63802A (en) * | 1981-09-11 | 1984-10-31 | Iscar Ltd | Sintered hard metal products having a multi-layer wear-resistant coating |
| US4411960A (en) * | 1981-12-21 | 1983-10-25 | Gte Products Corporation | Articles coated with wear-resistant titanium compounds |
| EP0089818A3 (en) * | 1982-03-23 | 1985-04-03 | United Kingdom Atomic Energy Authority | Coatings for cutting blades |
| US4406668A (en) * | 1982-05-20 | 1983-09-27 | Gte Laboratories Incorporated | Nitride coated silicon nitride cutting tools |
| US4406670A (en) * | 1982-05-20 | 1983-09-27 | Gte Laboratories Incorporated | Nitride coated composite modified silicon aluminum oxynitride cutting tools |
-
1986
- 1986-09-15 US US06/907,268 patent/US4803110A/en not_active Expired - Fee Related
-
1987
- 1987-05-05 DE DE87106470T patent/DE3785826T2/de not_active Expired - Fee Related
- 1987-05-05 EP EP19870106470 patent/EP0267359B1/en not_active Expired - Lifetime
- 1987-06-29 JP JP62159918A patent/JPS6377787A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE3785826T2 (de) | 1993-10-28 |
| US4803110A (en) | 1989-02-07 |
| DE3785826D1 (de) | 1993-06-17 |
| JPS6377787A (ja) | 1988-04-07 |
| EP0267359A3 (en) | 1989-04-26 |
| EP0267359B1 (en) | 1993-05-12 |
| EP0267359A2 (en) | 1988-05-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0583080B2 (Direct) | ||
| US11177152B2 (en) | Ceramic substrate containing aluminum oxide and electrostatic chuck having electrode containing tungsten with oxides | |
| US6267839B1 (en) | Electrostatic chuck with improved RF power distribution | |
| US4340618A (en) | Process for forming refractory metal layers on ceramic substrate | |
| JPH11500856A (ja) | フラットパネルディスプレイ用スペーサ構造及びその製造方法 | |
| KR102886881B1 (ko) | 세라믹스 기판, 그 제조 방법, 정전 척, 기판 고정 장치 및 반도체 장치 패키지 | |
| US5787578A (en) | Method of selectively depositing a metallic layer on a ceramic substrate | |
| JPH07258828A (ja) | 膜形成方法 | |
| JPS6395644A (ja) | 静電チヤツク | |
| EP0180091B1 (en) | Method of selectively depositing metal layers on a substrate | |
| JPS62286249A (ja) | 静電チヤツク板 | |
| EP0199307B1 (en) | Method of coating a molybdenum surface | |
| JPS62158863A (ja) | 被膜形成装置 | |
| US6077405A (en) | Method and apparatus for making electrical contact to a substrate during electroplating | |
| US4569743A (en) | Method and apparatus for the selective, self-aligned deposition of metal layers | |
| JPS60128625A (ja) | 半導体素子搭載用基板 | |
| EP0564693B1 (en) | Method of manufacturing a film carrier type substrate | |
| US3630871A (en) | Cathodic sputtering method | |
| JP3554195B2 (ja) | 配線基板 | |
| JPH07112104B2 (ja) | 超電導配線ダイヤモンド回路基板の製造方法 | |
| JP2802181B2 (ja) | セラミック回路板における導体膜の形成方法 | |
| JPH05330958A (ja) | メタライズ下地層形成用ガラス組成物 | |
| JPH01272192A (ja) | セラミックス基板 | |
| Darrow et al. | Low-cost patterned metallization technique for high density multilayer interconnect applications | |
| CA1312405C (en) | Diffusion isolation layer for maskless cladding process |