JPH0582934B2 - - Google Patents

Info

Publication number
JPH0582934B2
JPH0582934B2 JP62043112A JP4311287A JPH0582934B2 JP H0582934 B2 JPH0582934 B2 JP H0582934B2 JP 62043112 A JP62043112 A JP 62043112A JP 4311287 A JP4311287 A JP 4311287A JP H0582934 B2 JPH0582934 B2 JP H0582934B2
Authority
JP
Japan
Prior art keywords
polymer
solvent
ketone
resist
basic catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62043112A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63210839A (ja
Inventor
Yoshikazu Sakata
Toshio Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP4311287A priority Critical patent/JPS63210839A/ja
Priority to DE8787306572T priority patent/DE3760773D1/de
Priority to EP87306572A priority patent/EP0255303B1/en
Priority to US07/078,268 priority patent/US4826943A/en
Publication of JPS63210839A publication Critical patent/JPS63210839A/ja
Publication of JPH0582934B2 publication Critical patent/JPH0582934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
JP4311287A 1986-07-25 1987-02-27 レジスト材用シリコ−ン樹脂の製造方法 Granted JPS63210839A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4311287A JPS63210839A (ja) 1987-02-27 1987-02-27 レジスト材用シリコ−ン樹脂の製造方法
DE8787306572T DE3760773D1 (en) 1986-07-25 1987-07-24 Negative resist material, method for its manufacture and method for using it
EP87306572A EP0255303B1 (en) 1986-07-25 1987-07-24 Negative resist material, method for its manufacture and method for using it
US07/078,268 US4826943A (en) 1986-07-25 1987-07-27 Negative resist material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4311287A JPS63210839A (ja) 1987-02-27 1987-02-27 レジスト材用シリコ−ン樹脂の製造方法

Publications (2)

Publication Number Publication Date
JPS63210839A JPS63210839A (ja) 1988-09-01
JPH0582934B2 true JPH0582934B2 (enExample) 1993-11-24

Family

ID=12654745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4311287A Granted JPS63210839A (ja) 1986-07-25 1987-02-27 レジスト材用シリコ−ン樹脂の製造方法

Country Status (1)

Country Link
JP (1) JPS63210839A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2733131B2 (ja) * 1990-08-28 1998-03-30 沖電気工業株式会社 感光性樹脂組成物
WO2002088221A1 (en) 2001-04-27 2002-11-07 The University Of Sydney Materials for optical applications
US6965006B2 (en) 2002-04-10 2005-11-15 Rpo Pty Ltd. Metal alkoxide polymers
WO2019209395A1 (en) * 2018-04-24 2019-10-31 Dow Silicones Corporation Positive tone photopatternable silicone

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62235942A (ja) * 1986-04-07 1987-10-16 Oki Electric Ind Co Ltd ネガ型レジスト材料
JPS62284352A (ja) * 1986-06-02 1987-12-10 Oki Electric Ind Co Ltd ネガ型フォトレジスト
JPS62283128A (ja) * 1986-06-02 1987-12-09 Oki Electric Ind Co Ltd ポリ（アリルシルセスキオキサン）及びその製造方法
JPS6332543A (ja) * 1986-07-25 1988-02-12 Oki Electric Ind Co Ltd ネガ型レジスト材料及びレジストパタ−ン形成方法

Also Published As

Publication number Publication date
JPS63210839A (ja) 1988-09-01

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees