JPH0582933B2 - - Google Patents

Info

Publication number
JPH0582933B2
JPH0582933B2 JP10174587A JP10174587A JPH0582933B2 JP H0582933 B2 JPH0582933 B2 JP H0582933B2 JP 10174587 A JP10174587 A JP 10174587A JP 10174587 A JP10174587 A JP 10174587A JP H0582933 B2 JPH0582933 B2 JP H0582933B2
Authority
JP
Japan
Prior art keywords
light
sample
aperture
foreign matter
foreign
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP10174587A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63268245A (ja
Inventor
Minoru Noguchi
Hiroaki Shishido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62101745A priority Critical patent/JPS63268245A/ja
Priority to US07/184,787 priority patent/US4952058A/en
Publication of JPS63268245A publication Critical patent/JPS63268245A/ja
Publication of JPH0582933B2 publication Critical patent/JPH0582933B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62101745A 1987-04-27 1987-04-27 異物検査方法およびその装置 Granted JPS63268245A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62101745A JPS63268245A (ja) 1987-04-27 1987-04-27 異物検査方法およびその装置
US07/184,787 US4952058A (en) 1987-04-27 1988-04-22 Method and apparatus for detecting abnormal patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62101745A JPS63268245A (ja) 1987-04-27 1987-04-27 異物検査方法およびその装置

Publications (2)

Publication Number Publication Date
JPS63268245A JPS63268245A (ja) 1988-11-04
JPH0582933B2 true JPH0582933B2 (enExample) 1993-11-24

Family

ID=14308782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62101745A Granted JPS63268245A (ja) 1987-04-27 1987-04-27 異物検査方法およびその装置

Country Status (1)

Country Link
JP (1) JPS63268245A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0498149A (ja) * 1990-08-15 1992-03-30 Nec Corp 欠陥検査装置

Also Published As

Publication number Publication date
JPS63268245A (ja) 1988-11-04

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