JPH0582729B2 - - Google Patents

Info

Publication number
JPH0582729B2
JPH0582729B2 JP59237532A JP23753284A JPH0582729B2 JP H0582729 B2 JPH0582729 B2 JP H0582729B2 JP 59237532 A JP59237532 A JP 59237532A JP 23753284 A JP23753284 A JP 23753284A JP H0582729 B2 JPH0582729 B2 JP H0582729B2
Authority
JP
Japan
Prior art keywords
gap
diffraction grating
light
mark
positional deviation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59237532A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61116837A (ja
Inventor
Atsunobu Une
Makoto Inoshiro
Nobuyuki Takeuchi
Yasuhiro Torii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59237532A priority Critical patent/JPS61116837A/ja
Publication of JPS61116837A publication Critical patent/JPS61116837A/ja
Publication of JPH0582729B2 publication Critical patent/JPH0582729B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59237532A 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法 Granted JPS61116837A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59237532A JPS61116837A (ja) 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59237532A JPS61116837A (ja) 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法

Publications (2)

Publication Number Publication Date
JPS61116837A JPS61116837A (ja) 1986-06-04
JPH0582729B2 true JPH0582729B2 (cg-RX-API-DMAC10.html) 1993-11-22

Family

ID=17016727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59237532A Granted JPS61116837A (ja) 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法

Country Status (1)

Country Link
JP (1) JPS61116837A (cg-RX-API-DMAC10.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR900004269B1 (ko) * 1986-06-11 1990-06-18 가부시기가이샤 도시바 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
DE3719538A1 (de) * 1986-06-11 1987-12-17 Toshiba Kawasaki Kk Verfahren und vorrichtung zum einstellen eines spalts zwischen zwei objekten auf eine vorbestimmte groesse
JP3197010B2 (ja) * 1990-03-05 2001-08-13 株式会社東芝 間隔設定方法及び間隔設定装置
DE69530757T2 (de) * 1994-01-24 2004-03-18 Asml Holding, N.V. Gitter-gitter interferometrisches ausrichtsystem

Also Published As

Publication number Publication date
JPS61116837A (ja) 1986-06-04

Similar Documents

Publication Publication Date Title
US4200395A (en) Alignment of diffraction gratings
US4311389A (en) Method for the optical alignment of designs in two near planes and alignment apparatus for performing this method
US4340305A (en) Plate aligning
US4656347A (en) Diffraction grating position adjuster using a grating and a reflector
KR900004269B1 (ko) 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
US5369486A (en) Position detector for detecting the position of an object using a diffraction grating positioned at an angle
JPH039403B2 (cg-RX-API-DMAC10.html)
US4988197A (en) Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects
EP0309281A2 (en) Apparatus for controlling relation in position between a photomask and a wafer
JP3244769B2 (ja) 測定方法及び測定装置
JPH1026513A (ja) 試料面位置測定装置及び測定方法
JPH0582729B2 (cg-RX-API-DMAC10.html)
JPS5938521B2 (ja) 微小変位測定および位置合わせ装置
JPH083404B2 (ja) 位置合せ方法
US4808807A (en) Optical focus sensor system
JPH0663739B2 (ja) 回折格子による位置検出方法および位置検出装置
JP2578742B2 (ja) 位置合わせ方法
JPS60173837A (ja) 組合せ回折格子によるギヤツプ・位置合せ制御法
JPS6227730B2 (cg-RX-API-DMAC10.html)
JPH0441485B2 (cg-RX-API-DMAC10.html)
JP2554626B2 (ja) 回折格子による位置合わせ方法および位置合わせ装置
JP2677662B2 (ja) 相対位置合せ方法および装置
JP2885454B2 (ja) 相対位置合せ方法及び装置
JP2694045B2 (ja) 回折格子を用いた位置合せ装置
JPH0460331B2 (cg-RX-API-DMAC10.html)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term