JPH0580798B2 - - Google Patents

Info

Publication number
JPH0580798B2
JPH0580798B2 JP60195104A JP19510485A JPH0580798B2 JP H0580798 B2 JPH0580798 B2 JP H0580798B2 JP 60195104 A JP60195104 A JP 60195104A JP 19510485 A JP19510485 A JP 19510485A JP H0580798 B2 JPH0580798 B2 JP H0580798B2
Authority
JP
Japan
Prior art keywords
pattern
transparent conductive
conductive film
etching
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60195104A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6255896A (ja
Inventor
Mayumi Yoshida
Yosuke Fujita
Atsushi Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60195104A priority Critical patent/JPS6255896A/ja
Publication of JPS6255896A publication Critical patent/JPS6255896A/ja
Publication of JPH0580798B2 publication Critical patent/JPH0580798B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electroluminescent Light Sources (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP60195104A 1985-09-04 1985-09-04 透明導電膜のパタ−ン形成方法 Granted JPS6255896A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60195104A JPS6255896A (ja) 1985-09-04 1985-09-04 透明導電膜のパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60195104A JPS6255896A (ja) 1985-09-04 1985-09-04 透明導電膜のパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6255896A JPS6255896A (ja) 1987-03-11
JPH0580798B2 true JPH0580798B2 (enrdf_load_stackoverflow) 1993-11-10

Family

ID=16335583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60195104A Granted JPS6255896A (ja) 1985-09-04 1985-09-04 透明導電膜のパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6255896A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2807515B2 (ja) * 1989-12-25 1998-10-08 旭電化工業株式会社 エッチング方法
JPH08136429A (ja) * 1994-11-11 1996-05-31 Nec Corp 衝撃破壊試験方法および装置

Also Published As

Publication number Publication date
JPS6255896A (ja) 1987-03-11

Similar Documents

Publication Publication Date Title
US4684435A (en) Method of manufacturing thin film transistor
JP2002237594A (ja) 薄膜トランジスタ、薄膜トランジスタの製造方法および薄膜トランジスタを含むディスプレイ・デバイス
JPH0580798B2 (enrdf_load_stackoverflow)
JPH0584606B2 (enrdf_load_stackoverflow)
JPH0263216B2 (enrdf_load_stackoverflow)
JPS63213293A (ja) 透明導電膜のパタ−ン形成方法
KR19990030877A (ko) 액정 표시 장치용 박막 트랜지스터 기판 및 제조 방법
JPS6243012A (ja) 透明導電膜のエツチング方法
JPS614233A (ja) 透明導電膜のエツチング方法
JP2934731B2 (ja) 非線形抵抗素子とその製造方法
KR960012270B1 (ko) 투명 도전성기관 제조방법
JPS61243613A (ja) 透明導電層の形成方法
JP2000047237A (ja) 導電膜パターンの形成方法及び液晶表示装置の製造方法
JPH01151237A (ja) 透明導電性膜のエツチング方法
JPH0645936Y2 (ja) 透明電極基板
JPS60169824A (ja) 光制御素子とその製造方法
JPS62280789A (ja) アクテイブマトリツクス型表示装置用表示電極アレイの製造方法
JPH05181124A (ja) カラー液晶表示素子の製造方法
JPH0634438B2 (ja) 配線電極の形成方法
JPH02251932A (ja) 非線形抵抗素子の製造方法
JPH0543096B2 (enrdf_load_stackoverflow)
JP2878516B2 (ja) フォトレジストの現像液、現像方法及び薄膜トランジスタの製造方法
JPH0370330B2 (enrdf_load_stackoverflow)
JPS587680A (ja) 表示装置
JPH02924A (ja) 非線形抵抗素子の製造方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees