JPH0580159B2 - - Google Patents

Info

Publication number
JPH0580159B2
JPH0580159B2 JP57077091A JP7709182A JPH0580159B2 JP H0580159 B2 JPH0580159 B2 JP H0580159B2 JP 57077091 A JP57077091 A JP 57077091A JP 7709182 A JP7709182 A JP 7709182A JP H0580159 B2 JPH0580159 B2 JP H0580159B2
Authority
JP
Japan
Prior art keywords
silicon layer
manufacturing
field effect
effect transistor
scanning direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57077091A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58192381A (ja
Inventor
Tadashi Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP57077091A priority Critical patent/JPS58192381A/ja
Publication of JPS58192381A publication Critical patent/JPS58192381A/ja
Publication of JPH0580159B2 publication Critical patent/JPH0580159B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]

Landscapes

  • Element Separation (AREA)
JP57077091A 1982-05-06 1982-05-06 Ｍｏｓ電界効果トランジスタの製造方法 Granted JPS58192381A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57077091A JPS58192381A (ja) 1982-05-06 1982-05-06 Ｍｏｓ電界効果トランジスタの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57077091A JPS58192381A (ja) 1982-05-06 1982-05-06 Ｍｏｓ電界効果トランジスタの製造方法

Publications (2)

Publication Number Publication Date
JPS58192381A JPS58192381A (ja) 1983-11-09
JPH0580159B2 true JPH0580159B2 (en, 2012) 1993-11-08

Family

ID=13624104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57077091A Granted JPS58192381A (ja) 1982-05-06 1982-05-06 Ｍｏｓ電界効果トランジスタの製造方法

Country Status (1)

Country Link
JP (1) JPS58192381A (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59132677A (ja) * 1983-01-20 1984-07-30 Seiko Epson Corp 薄膜トランジスタの製造方法
JPS60150618A (ja) * 1984-01-17 1985-08-08 Mitsubishi Electric Corp 半導体装置の製造方法
US6064077A (en) 1991-08-30 2000-05-16 Stmicroelectronics, Inc. Integrated circuit transistor
JP3778456B2 (ja) 1995-02-21 2006-05-24 株式会社半導体エネルギー研究所 絶縁ゲイト型薄膜半導体装置の作製方法
US6770546B2 (en) 2001-07-30 2004-08-03 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
JP4566503B2 (ja) * 2001-07-30 2010-10-20 株式会社半導体エネルギー研究所 レーザー処理装置並びに半導体装置の作製方法
JP3980466B2 (ja) * 2001-11-09 2007-09-26 株式会社半導体エネルギー研究所 レーザー装置及びレーザー照射方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IEEE TRANSACTIONS ON ELECTRON DEVICES=1982 *

Also Published As

Publication number Publication date
JPS58192381A (ja) 1983-11-09

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