JPH0577286B2 - - Google Patents
Info
- Publication number
- JPH0577286B2 JPH0577286B2 JP61074694A JP7469486A JPH0577286B2 JP H0577286 B2 JPH0577286 B2 JP H0577286B2 JP 61074694 A JP61074694 A JP 61074694A JP 7469486 A JP7469486 A JP 7469486A JP H0577286 B2 JPH0577286 B2 JP H0577286B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- mask
- crystal
- imaging element
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 24
- 238000003384 imaging method Methods 0.000 claims description 12
- 238000005286 illumination Methods 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000001015 X-ray lithography Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 101100537937 Caenorhabditis elegans arc-1 gene Proteins 0.000 description 1
- QGQFOJGMPGJJGG-UHFFFAOYSA-K [B+3].[O-]N=O.[O-]N=O.[O-]N=O Chemical compound [B+3].[O-]N=O.[O-]N=O.[O-]N=O QGQFOJGMPGJJGG-UHFFFAOYSA-K 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61074694A JPS62230021A (ja) | 1986-03-31 | 1986-03-31 | Ｘ線投影露光方式用照明系 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61074694A JPS62230021A (ja) | 1986-03-31 | 1986-03-31 | Ｘ線投影露光方式用照明系 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62230021A JPS62230021A (ja) | 1987-10-08 |
| JPH0577286B2 true JPH0577286B2 (enrdf_load_stackoverflow) | 1993-10-26 |
Family
ID=13554591
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61074694A Granted JPS62230021A (ja) | 1986-03-31 | 1986-03-31 | Ｘ線投影露光方式用照明系 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62230021A (enrdf_load_stackoverflow) |
-
1986
- 1986-03-31 JP JP61074694A patent/JPS62230021A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62230021A (ja) | 1987-10-08 |
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