JPH0574208B2 - - Google Patents

Info

Publication number
JPH0574208B2
JPH0574208B2 JP59065260A JP6526084A JPH0574208B2 JP H0574208 B2 JPH0574208 B2 JP H0574208B2 JP 59065260 A JP59065260 A JP 59065260A JP 6526084 A JP6526084 A JP 6526084A JP H0574208 B2 JPH0574208 B2 JP H0574208B2
Authority
JP
Japan
Prior art keywords
alignment
wafer
light
exposure
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59065260A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60208756A (ja
Inventor
Masahiko Okunuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59065260A priority Critical patent/JPS60208756A/ja
Publication of JPS60208756A publication Critical patent/JPS60208756A/ja
Publication of JPH0574208B2 publication Critical patent/JPH0574208B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59065260A 1984-04-03 1984-04-03 転写方法 Granted JPS60208756A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59065260A JPS60208756A (ja) 1984-04-03 1984-04-03 転写方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59065260A JPS60208756A (ja) 1984-04-03 1984-04-03 転写方法

Publications (2)

Publication Number Publication Date
JPS60208756A JPS60208756A (ja) 1985-10-21
JPH0574208B2 true JPH0574208B2 (enExample) 1993-10-18

Family

ID=13281764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59065260A Granted JPS60208756A (ja) 1984-04-03 1984-04-03 転写方法

Country Status (1)

Country Link
JP (1) JPS60208756A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4078813B2 (ja) 2001-06-12 2008-04-23 ソニー株式会社 成膜装置および成膜方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2346719C3 (de) * 1973-09-17 1980-01-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Mehrschichtige Bestrahlungsmaske für die Röntgenstrahl-Fotolithografie

Also Published As

Publication number Publication date
JPS60208756A (ja) 1985-10-21

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