JPH0574207B2 - - Google Patents
Info
- Publication number
- JPH0574207B2 JPH0574207B2 JP59065259A JP6525984A JPH0574207B2 JP H0574207 B2 JPH0574207 B2 JP H0574207B2 JP 59065259 A JP59065259 A JP 59065259A JP 6525984 A JP6525984 A JP 6525984A JP H0574207 B2 JPH0574207 B2 JP H0574207B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- alignment
- wafer
- mask
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59065259A JPS60208754A (ja) | 1984-04-03 | 1984-04-03 | 転写方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59065259A JPS60208754A (ja) | 1984-04-03 | 1984-04-03 | 転写方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60208754A JPS60208754A (ja) | 1985-10-21 |
| JPH0574207B2 true JPH0574207B2 (enExample) | 1993-10-18 |
Family
ID=13281734
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59065259A Granted JPS60208754A (ja) | 1984-04-03 | 1984-04-03 | 転写方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60208754A (enExample) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5734652B2 (enExample) * | 1972-07-17 | 1982-07-24 | ||
| JPS58125830A (ja) * | 1982-01-22 | 1983-07-27 | Fujitsu Ltd | プラズマエツチング方法 |
| JPS5919324A (ja) * | 1982-07-24 | 1984-01-31 | Mitsubishi Electric Corp | 露光装置 |
-
1984
- 1984-04-03 JP JP59065259A patent/JPS60208754A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60208754A (ja) | 1985-10-21 |
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