JPS60208754A - 転写方法 - Google Patents

転写方法

Info

Publication number
JPS60208754A
JPS60208754A JP59065259A JP6525984A JPS60208754A JP S60208754 A JPS60208754 A JP S60208754A JP 59065259 A JP59065259 A JP 59065259A JP 6525984 A JP6525984 A JP 6525984A JP S60208754 A JPS60208754 A JP S60208754A
Authority
JP
Japan
Prior art keywords
alignment
exposure
light
mask
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59065259A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0574207B2 (enExample
Inventor
Masahiko Okunuki
昌彦 奥貫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59065259A priority Critical patent/JPS60208754A/ja
Publication of JPS60208754A publication Critical patent/JPS60208754A/ja
Publication of JPH0574207B2 publication Critical patent/JPH0574207B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59065259A 1984-04-03 1984-04-03 転写方法 Granted JPS60208754A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59065259A JPS60208754A (ja) 1984-04-03 1984-04-03 転写方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59065259A JPS60208754A (ja) 1984-04-03 1984-04-03 転写方法

Publications (2)

Publication Number Publication Date
JPS60208754A true JPS60208754A (ja) 1985-10-21
JPH0574207B2 JPH0574207B2 (enExample) 1993-10-18

Family

ID=13281734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59065259A Granted JPS60208754A (ja) 1984-04-03 1984-04-03 転写方法

Country Status (1)

Country Link
JP (1) JPS60208754A (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49100972A (enExample) * 1972-07-17 1974-09-24
JPS58125830A (ja) * 1982-01-22 1983-07-27 Fujitsu Ltd プラズマエツチング方法
JPS5919324A (ja) * 1982-07-24 1984-01-31 Mitsubishi Electric Corp 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49100972A (enExample) * 1972-07-17 1974-09-24
JPS58125830A (ja) * 1982-01-22 1983-07-27 Fujitsu Ltd プラズマエツチング方法
JPS5919324A (ja) * 1982-07-24 1984-01-31 Mitsubishi Electric Corp 露光装置

Also Published As

Publication number Publication date
JPH0574207B2 (enExample) 1993-10-18

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