JPH0574060B2 - - Google Patents

Info

Publication number
JPH0574060B2
JPH0574060B2 JP61028774A JP2877486A JPH0574060B2 JP H0574060 B2 JPH0574060 B2 JP H0574060B2 JP 61028774 A JP61028774 A JP 61028774A JP 2877486 A JP2877486 A JP 2877486A JP H0574060 B2 JPH0574060 B2 JP H0574060B2
Authority
JP
Japan
Prior art keywords
photoresist
irradiation
irradiation intensity
intensity
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61028774A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62187345A (ja
Inventor
Kazuya Tanaka
Kazuyoshi Ueki
Hiroko Suzuki
Yoshiki Mimura
Shinji Suzuki
Shinji Sugioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12257754&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH0574060(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP61028774A priority Critical patent/JPS62187345A/ja
Priority to EP19860116308 priority patent/EP0233333B1/en
Priority to DE19863687749 priority patent/DE3687749T2/de
Publication of JPS62187345A publication Critical patent/JPS62187345A/ja
Publication of JPH0574060B2 publication Critical patent/JPH0574060B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61028774A 1986-02-14 1986-02-14 レジスト処理方法 Granted JPS62187345A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61028774A JPS62187345A (ja) 1986-02-14 1986-02-14 レジスト処理方法
EP19860116308 EP0233333B1 (en) 1986-02-14 1986-11-25 Method of treating photoresists
DE19863687749 DE3687749T2 (de) 1986-02-14 1986-11-25 Photolack-behandlungsverfahren.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61028774A JPS62187345A (ja) 1986-02-14 1986-02-14 レジスト処理方法

Publications (2)

Publication Number Publication Date
JPS62187345A JPS62187345A (ja) 1987-08-15
JPH0574060B2 true JPH0574060B2 (enExample) 1993-10-15

Family

ID=12257754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61028774A Granted JPS62187345A (ja) 1986-02-14 1986-02-14 レジスト処理方法

Country Status (3)

Country Link
EP (1) EP0233333B1 (enExample)
JP (1) JPS62187345A (enExample)
DE (1) DE3687749T2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63244623A (ja) * 1987-03-30 1988-10-12 Sony Corp ホトレジストの硬化方法
JPH0750676B2 (ja) * 1988-06-30 1995-05-31 ウシオ電機株式会社 ウエハ周辺露光方法
JP2003086495A (ja) * 2001-09-13 2003-03-20 Fuji Electric Co Ltd フォトレジストパターンの形成方法
JP4893518B2 (ja) * 2007-07-27 2012-03-07 住友電気工業株式会社 光デバイスの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JPS6129124A (ja) * 1984-07-20 1986-02-10 Ushio Inc 半導体ウエハ−の処理方法

Also Published As

Publication number Publication date
DE3687749T2 (de) 1993-09-09
JPS62187345A (ja) 1987-08-15
EP0233333A2 (en) 1987-08-26
DE3687749D1 (de) 1993-03-25
EP0233333A3 (en) 1988-02-24
EP0233333B1 (en) 1993-02-10

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees