JPH0572941B2 - - Google Patents

Info

Publication number
JPH0572941B2
JPH0572941B2 JP60133958A JP13395885A JPH0572941B2 JP H0572941 B2 JPH0572941 B2 JP H0572941B2 JP 60133958 A JP60133958 A JP 60133958A JP 13395885 A JP13395885 A JP 13395885A JP H0572941 B2 JPH0572941 B2 JP H0572941B2
Authority
JP
Japan
Prior art keywords
acid
polyamide
added
solution
hours
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60133958A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61293204A (ja
Inventor
Yoshio Matsuoka
Akihiko Ikeda
Hideo Ai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP60133958A priority Critical patent/JPS61293204A/ja
Publication of JPS61293204A publication Critical patent/JPS61293204A/ja
Publication of JPH0572941B2 publication Critical patent/JPH0572941B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP60133958A 1985-06-21 1985-06-21 感光性組成物 Granted JPS61293204A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60133958A JPS61293204A (ja) 1985-06-21 1985-06-21 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60133958A JPS61293204A (ja) 1985-06-21 1985-06-21 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61293204A JPS61293204A (ja) 1986-12-24
JPH0572941B2 true JPH0572941B2 (enrdf_load_stackoverflow) 1993-10-13

Family

ID=15117054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60133958A Granted JPS61293204A (ja) 1985-06-21 1985-06-21 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61293204A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2546940B2 (ja) * 1991-11-06 1996-10-23 住友ベークライト株式会社 感光性樹脂組成物
US8071273B2 (en) 2008-03-31 2011-12-06 Dai Nippon Printing Co., Ltd. Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition
JP6204102B2 (ja) * 2013-07-26 2017-09-27 国立大学法人 東京大学 イミノ基を有する可溶性ポリイミド系重合体、及びその製造方法
US11165072B2 (en) 2016-09-06 2021-11-02 Threebond Co., Ltd. Curable resin composition, fuel cell using same, and sealing method using same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3411697A1 (de) * 1984-03-29 1985-10-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-reliefstrukturen

Also Published As

Publication number Publication date
JPS61293204A (ja) 1986-12-24

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