JPH0570925B2 - - Google Patents

Info

Publication number
JPH0570925B2
JPH0570925B2 JP8433984A JP3398484A JPH0570925B2 JP H0570925 B2 JPH0570925 B2 JP H0570925B2 JP 8433984 A JP8433984 A JP 8433984A JP 3398484 A JP3398484 A JP 3398484A JP H0570925 B2 JPH0570925 B2 JP H0570925B2
Authority
JP
Japan
Prior art keywords
mark
wafer
reticle
substrate
wafer alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8433984A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60178629A (ja
Inventor
Kyoichi Suwa
Hidemi Kawai
Masakazu Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP59033984A priority Critical patent/JPS60178629A/ja
Priority to US06/703,941 priority patent/US4679942A/en
Publication of JPS60178629A publication Critical patent/JPS60178629A/ja
Publication of JPH0570925B2 publication Critical patent/JPH0570925B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59033984A 1984-02-24 1984-02-24 アライメント方法 Granted JPS60178629A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59033984A JPS60178629A (ja) 1984-02-24 1984-02-24 アライメント方法
US06/703,941 US4679942A (en) 1984-02-24 1985-02-21 Method of aligning a semiconductor substrate and a photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59033984A JPS60178629A (ja) 1984-02-24 1984-02-24 アライメント方法

Publications (2)

Publication Number Publication Date
JPS60178629A JPS60178629A (ja) 1985-09-12
JPH0570925B2 true JPH0570925B2 (enrdf_load_stackoverflow) 1993-10-06

Family

ID=12401742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59033984A Granted JPS60178629A (ja) 1984-02-24 1984-02-24 アライメント方法

Country Status (1)

Country Link
JP (1) JPS60178629A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2710935B2 (ja) * 1987-08-08 1998-02-10 三菱電機株式会社 半導体装置
TW279244B (enrdf_load_stackoverflow) * 1993-08-18 1996-06-21 At & T Corp
US20050026432A1 (en) 2001-04-17 2005-02-03 Atwater Harry A. Wafer bonded epitaxial templates for silicon heterostructures
CA2482258A1 (en) 2001-04-17 2002-10-24 California Institute Of Technology A method of using a germanium layer transfer to si for photovoltaic applications and heterostructure made thereby

Also Published As

Publication number Publication date
JPS60178629A (ja) 1985-09-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term