JPH0569306B2 - - Google Patents

Info

Publication number
JPH0569306B2
JPH0569306B2 JP60080171A JP8017185A JPH0569306B2 JP H0569306 B2 JPH0569306 B2 JP H0569306B2 JP 60080171 A JP60080171 A JP 60080171A JP 8017185 A JP8017185 A JP 8017185A JP H0569306 B2 JPH0569306 B2 JP H0569306B2
Authority
JP
Japan
Prior art keywords
chuck
wafer
thin plate
plate
vertically moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60080171A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61239638A (ja
Inventor
Motoya Taniguchi
Tomohiro Kuni
Ryuichi Funatsu
Yukio Kenbo
Akira Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60080171A priority Critical patent/JPS61239638A/ja
Priority to KR1019860002815A priority patent/KR900001241B1/ko
Priority to US06/852,729 priority patent/US4666291A/en
Publication of JPS61239638A publication Critical patent/JPS61239638A/ja
Publication of JPH0569306B2 publication Critical patent/JPH0569306B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Jigs For Machine Tools (AREA)
JP60080171A 1985-04-17 1985-04-17 薄板平担化チヤツク Granted JPS61239638A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP60080171A JPS61239638A (ja) 1985-04-17 1985-04-17 薄板平担化チヤツク
KR1019860002815A KR900001241B1 (ko) 1985-04-17 1986-04-14 광 노출 장치
US06/852,729 US4666291A (en) 1985-04-17 1986-04-16 Light-exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60080171A JPS61239638A (ja) 1985-04-17 1985-04-17 薄板平担化チヤツク

Publications (2)

Publication Number Publication Date
JPS61239638A JPS61239638A (ja) 1986-10-24
JPH0569306B2 true JPH0569306B2 (enrdf_load_stackoverflow) 1993-09-30

Family

ID=13710883

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60080171A Granted JPS61239638A (ja) 1985-04-17 1985-04-17 薄板平担化チヤツク

Country Status (1)

Country Link
JP (1) JPS61239638A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01220440A (ja) * 1988-02-29 1989-09-04 Sumitomo Heavy Ind Ltd ウエハ平坦度制御方法及びその装置
EP0456426B1 (en) * 1990-05-07 2004-09-15 Canon Kabushiki Kaisha Vacuum type wafer holder
JP2007331041A (ja) * 2006-06-13 2007-12-27 Hitachi High-Technologies Corp 平板状ワークの作業装置
JP2009212345A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
CN116403929A (zh) * 2021-12-28 2023-07-07 拓荆键科(海宁)半导体设备有限公司 调整卡盘形变的系统及装置

Also Published As

Publication number Publication date
JPS61239638A (ja) 1986-10-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term