JPH056766B2 - - Google Patents
Info
- Publication number
- JPH056766B2 JPH056766B2 JP60292303A JP29230385A JPH056766B2 JP H056766 B2 JPH056766 B2 JP H056766B2 JP 60292303 A JP60292303 A JP 60292303A JP 29230385 A JP29230385 A JP 29230385A JP H056766 B2 JPH056766 B2 JP H056766B2
- Authority
- JP
- Japan
- Prior art keywords
- transparent conductive
- conductive film
- film
- zinc oxide
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Liquid Crystal (AREA)
- Physical Vapour Deposition (AREA)
- Non-Insulated Conductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29230385A JPS62154411A (ja) | 1985-12-26 | 1985-12-26 | 透明導電膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29230385A JPS62154411A (ja) | 1985-12-26 | 1985-12-26 | 透明導電膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62154411A JPS62154411A (ja) | 1987-07-09 |
| JPH056766B2 true JPH056766B2 (enrdf_load_html_response) | 1993-01-27 |
Family
ID=17780012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29230385A Granted JPS62154411A (ja) | 1985-12-26 | 1985-12-26 | 透明導電膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62154411A (enrdf_load_html_response) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008044469A1 (fr) | 2006-10-06 | 2008-04-17 | Sakai Chemical Industry Co., Ltd. | Particule ultrafine d'oxyde de zinc et son procédé de production |
| JP5697449B2 (ja) * | 2008-09-04 | 2015-04-08 | 株式会社カネカ | 透明電極付き基板および透明電極付き基板の製造方法 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2545306B2 (ja) * | 1991-03-11 | 1996-10-16 | 誠 小長井 | ZnO透明導電膜の製造方法 |
| BRPI0608275A2 (pt) | 2005-02-24 | 2009-12-15 | Sekisui Chemical Co Ltd | óxido de zinco contendo gálio |
| CN101326304B (zh) * | 2005-12-08 | 2011-05-04 | Jx日矿日石金属株式会社 | 氧化镓-氧化锌类溅射靶、透明导电膜及其形成方法 |
| WO2007072950A1 (ja) * | 2005-12-22 | 2007-06-28 | Mitsui Mining & Smelting Co., Ltd. | 酸化亜鉛系透明導電膜のパターニング方法 |
| EP1997931B1 (en) | 2006-03-17 | 2014-01-01 | JX Nippon Mining & Metals Corporation | Zinc oxide-based transparent conductor and sputtering target for forming the transparent conductor |
| JP5090358B2 (ja) | 2006-08-24 | 2012-12-05 | Jx日鉱日石金属株式会社 | 酸化亜鉛系透明導電体及び同透明導電体形成用スパッタリングターゲット並びに同ターゲットの製造方法 |
| JP5285331B2 (ja) * | 2008-06-04 | 2013-09-11 | 株式会社カネカ | 薄膜光電変換装置 |
| JP5003600B2 (ja) * | 2008-06-13 | 2012-08-15 | 住友金属鉱山株式会社 | 酸化物焼結体、ターゲット、およびそれを用いて得られる透明導電膜、導電性積層体 |
| JP4295811B1 (ja) | 2008-09-17 | 2009-07-15 | 三井金属鉱業株式会社 | 酸化亜鉛系ターゲット |
| EP2657316A4 (en) * | 2010-12-24 | 2015-10-07 | Oceans King Lighting Science | ELECTRICALLY CONDUCTIVE FILM, MANUFACTURING METHOD AND USE THEREOF |
| JP5339100B2 (ja) * | 2011-09-22 | 2013-11-13 | 住友金属鉱山株式会社 | Zn−Si−O系酸化物焼結体とその製造方法およびスパッタリングターゲットと蒸着用タブレット |
| JP5761253B2 (ja) * | 2013-05-23 | 2015-08-12 | 住友金属鉱山株式会社 | Zn−Si−O系酸化物焼結体とその製造方法およびスパッタリングターゲットと蒸着用タブレット |
| JP2015135879A (ja) * | 2014-01-16 | 2015-07-27 | 住友化学株式会社 | 高キャリア密度n型ZnO薄膜及びその製造方法 |
| JP6356520B2 (ja) * | 2014-07-28 | 2018-07-11 | 株式会社カネカ | 透明電極付き基板及びその製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58220407A (ja) * | 1982-06-16 | 1983-12-22 | 松下電器産業株式会社 | 電圧非直線抵抗器の製造方法 |
-
1985
- 1985-12-26 JP JP29230385A patent/JPS62154411A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008044469A1 (fr) | 2006-10-06 | 2008-04-17 | Sakai Chemical Industry Co., Ltd. | Particule ultrafine d'oxyde de zinc et son procédé de production |
| JP5697449B2 (ja) * | 2008-09-04 | 2015-04-08 | 株式会社カネカ | 透明電極付き基板および透明電極付き基板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62154411A (ja) | 1987-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101233257B (zh) | 半导体薄膜及其制造方法 | |
| JPH056766B2 (enrdf_load_html_response) | ||
| JP3358893B2 (ja) | ガリウム−インジウム酸化物を含む透明導電体 | |
| Enoki et al. | The Electrical and Optical Properties of the ZnO‐SnO2 Thin Films Prepared by RF Magnetron Sputtering | |
| US8747630B2 (en) | Transparent conducting oxides and production thereof | |
| JPS62122011A (ja) | 透明導電膜の製造方法 | |
| US8734621B2 (en) | Transparent conducting oxides and production thereof | |
| JPH05334924A (ja) | 透明導電薄膜の製造法 | |
| JPH0372011B2 (enrdf_load_html_response) | ||
| JPH09259640A (ja) | 透明導電膜 | |
| JP4240928B2 (ja) | 酸化物透明導電膜及びその製法 | |
| JP3163015B2 (ja) | 透明導電膜 | |
| Kim et al. | Effect of trivalent element doping on structural and optical properties of SnO2 thin films grown by pulsed laser deposition technique | |
| JPH0784654B2 (ja) | Ito透明導電膜用スパッタリングターゲットの製造方法 | |
| JPH08264021A (ja) | 透明導電膜 | |
| JPH0641723A (ja) | 透明導電膜 | |
| JP2017193755A (ja) | 透明導電膜の製造方法、及び透明導電膜 | |
| JPH0756131A (ja) | 透明導電膜の製造方法 | |
| JPH054768B2 (enrdf_load_html_response) | ||
| JPS647445B2 (enrdf_load_html_response) | ||
| JPH01283369A (ja) | Ito透明導電膜形成用スパッタリングターゲット | |
| JP3355610B2 (ja) | スズドープ酸化インジウム膜の高抵抗化方法 | |
| JP2764899B2 (ja) | 透明導電性膜の製造方法 | |
| Bhandari et al. | Optical properties of [Ta2O5] 1-x [TiO2] x,(x= 0.08) thin films | |
| JPH0765167B2 (ja) | Ito透明導電膜用スパッタリングターゲット |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |