JPH0567049B2 - - Google Patents
Info
- Publication number
- JPH0567049B2 JPH0567049B2 JP62002776A JP277687A JPH0567049B2 JP H0567049 B2 JPH0567049 B2 JP H0567049B2 JP 62002776 A JP62002776 A JP 62002776A JP 277687 A JP277687 A JP 277687A JP H0567049 B2 JPH0567049 B2 JP H0567049B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resist
- forming
- period
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 21
- 238000001020 plasma etching Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62002776A JPS63170917A (ja) | 1987-01-09 | 1987-01-09 | 微細パタ−ンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62002776A JPS63170917A (ja) | 1987-01-09 | 1987-01-09 | 微細パタ−ンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63170917A JPS63170917A (ja) | 1988-07-14 |
| JPH0567049B2 true JPH0567049B2 (fr) | 1993-09-24 |
Family
ID=11538742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62002776A Granted JPS63170917A (ja) | 1987-01-09 | 1987-01-09 | 微細パタ−ンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63170917A (fr) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2291207B (en) * | 1994-07-14 | 1998-03-25 | Hyundai Electronics Ind | Method for forming resist patterns |
| JP4613364B2 (ja) * | 2000-06-14 | 2011-01-19 | 学校法人東京電機大学 | レジストパタン形成方法 |
| JP2002134394A (ja) * | 2000-10-25 | 2002-05-10 | Mitsubishi Materials Corp | 多重露光方法及び多重露光装置 |
| JP5000250B2 (ja) | 2006-09-29 | 2012-08-15 | 東京応化工業株式会社 | パターン形成方法 |
| JP4987411B2 (ja) * | 2006-09-29 | 2012-07-25 | 東京応化工業株式会社 | パターン形成方法 |
| CN101542390A (zh) * | 2006-11-14 | 2009-09-23 | Nxp股份有限公司 | 用以增大特征空间密度的两次形成图案的光刻技术 |
| JP4927678B2 (ja) * | 2007-03-13 | 2012-05-09 | パナソニック株式会社 | パターン形成方法 |
| JP4932671B2 (ja) * | 2007-10-26 | 2012-05-16 | 東京エレクトロン株式会社 | エッチングマスクの形成方法、制御プログラム及びプログラム記憶媒体 |
| JP2009265505A (ja) * | 2008-04-28 | 2009-11-12 | Jsr Corp | パターン形成方法及び微細パターン形成用樹脂組成物 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55138839A (en) * | 1979-04-17 | 1980-10-30 | Nec Kyushu Ltd | Method of fabricating semiconductor device |
-
1987
- 1987-01-09 JP JP62002776A patent/JPS63170917A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55138839A (en) * | 1979-04-17 | 1980-10-30 | Nec Kyushu Ltd | Method of fabricating semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63170917A (ja) | 1988-07-14 |
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