JPH0566725B2 - - Google Patents

Info

Publication number
JPH0566725B2
JPH0566725B2 JP59194666A JP19466684A JPH0566725B2 JP H0566725 B2 JPH0566725 B2 JP H0566725B2 JP 59194666 A JP59194666 A JP 59194666A JP 19466684 A JP19466684 A JP 19466684A JP H0566725 B2 JPH0566725 B2 JP H0566725B2
Authority
JP
Japan
Prior art keywords
liquid
wafer
bubbles
cleaning
deep grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59194666A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6173333A (ja
Inventor
Kensuke Nakada
Koichiro Mizukami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59194666A priority Critical patent/JPS6173333A/ja
Publication of JPS6173333A publication Critical patent/JPS6173333A/ja
Publication of JPH0566725B2 publication Critical patent/JPH0566725B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP59194666A 1984-09-19 1984-09-19 洗浄方法 Granted JPS6173333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59194666A JPS6173333A (ja) 1984-09-19 1984-09-19 洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59194666A JPS6173333A (ja) 1984-09-19 1984-09-19 洗浄方法

Publications (2)

Publication Number Publication Date
JPS6173333A JPS6173333A (ja) 1986-04-15
JPH0566725B2 true JPH0566725B2 (https=) 1993-09-22

Family

ID=16328284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59194666A Granted JPS6173333A (ja) 1984-09-19 1984-09-19 洗浄方法

Country Status (1)

Country Link
JP (1) JPS6173333A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136114A (ja) * 1991-11-08 1993-06-01 Tadahiro Omi 超純水供給装置及び基体洗浄方法並びに超純水製造装置及び超純水製造方法
KR100827618B1 (ko) * 2006-05-11 2008-05-07 한국기계연구원 세정용 초음파 장치 및 이를 이용한 초음파 세정시스템
KR100748480B1 (ko) * 2007-06-27 2007-08-10 한국기계연구원 세정용 초음파 장치를 이용한 초음파 세정시스템
JP2009172162A (ja) * 2008-01-24 2009-08-06 Olympus Medical Systems Corp 内視鏡用洗浄装置
EP2315235B1 (en) * 2009-10-21 2019-04-24 IMEC vzw Method and apparatus for cleaning a semiconductor substrate

Also Published As

Publication number Publication date
JPS6173333A (ja) 1986-04-15

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