JPH0565042B2 - - Google Patents
Info
- Publication number
- JPH0565042B2 JPH0565042B2 JP62206064A JP20606487A JPH0565042B2 JP H0565042 B2 JPH0565042 B2 JP H0565042B2 JP 62206064 A JP62206064 A JP 62206064A JP 20606487 A JP20606487 A JP 20606487A JP H0565042 B2 JPH0565042 B2 JP H0565042B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- alloy
- magnetic
- thickness
- alloy film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005291 magnetic effect Effects 0.000 claims description 140
- 229910052742 iron Inorganic materials 0.000 claims description 55
- 239000000956 alloy Substances 0.000 claims description 39
- 229910045601 alloy Inorganic materials 0.000 claims description 37
- 229910021364 Al-Si alloy Inorganic materials 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 32
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 29
- 239000002131 composite material Substances 0.000 claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 24
- 230000005294 ferromagnetic effect Effects 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229910017082 Fe-Si Inorganic materials 0.000 claims description 5
- 229910017133 Fe—Si Inorganic materials 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 181
- 230000004907 flux Effects 0.000 description 23
- 239000010410 layer Substances 0.000 description 20
- 229910000702 sendust Inorganic materials 0.000 description 20
- 239000010409 thin film Substances 0.000 description 20
- 238000004544 sputter deposition Methods 0.000 description 17
- 230000035699 permeability Effects 0.000 description 15
- 239000011521 glass Substances 0.000 description 12
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 11
- 229910018125 Al-Si Inorganic materials 0.000 description 11
- 229910018520 Al—Si Inorganic materials 0.000 description 11
- 239000013078 crystal Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000011162 core material Substances 0.000 description 7
- 229910000859 α-Fe Inorganic materials 0.000 description 6
- 229910000676 Si alloy Inorganic materials 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000889 permalloy Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000572 ellipsometry Methods 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910001004 magnetic alloy Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910001199 N alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- 238000007499 fusion processing Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20606487A JPS6449209A (en) | 1987-08-19 | 1987-08-19 | Manufacture of soft magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20606487A JPS6449209A (en) | 1987-08-19 | 1987-08-19 | Manufacture of soft magnetic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6449209A JPS6449209A (en) | 1989-02-23 |
| JPH0565042B2 true JPH0565042B2 (de) | 1993-09-16 |
Family
ID=16517247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20606487A Granted JPS6449209A (en) | 1987-08-19 | 1987-08-19 | Manufacture of soft magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6449209A (de) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6129105A (ja) * | 1984-07-19 | 1986-02-10 | Sony Corp | 磁性合金薄膜 |
| JPS62274607A (ja) * | 1986-05-22 | 1987-11-28 | Matsushita Electric Ind Co Ltd | 超格子磁性体 |
-
1987
- 1987-08-19 JP JP20606487A patent/JPS6449209A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6129105A (ja) * | 1984-07-19 | 1986-02-10 | Sony Corp | 磁性合金薄膜 |
| JPS62274607A (ja) * | 1986-05-22 | 1987-11-28 | Matsushita Electric Ind Co Ltd | 超格子磁性体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6449209A (en) | 1989-02-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |