JPH0562615B2 - - Google Patents

Info

Publication number
JPH0562615B2
JPH0562615B2 JP60174273A JP17427385A JPH0562615B2 JP H0562615 B2 JPH0562615 B2 JP H0562615B2 JP 60174273 A JP60174273 A JP 60174273A JP 17427385 A JP17427385 A JP 17427385A JP H0562615 B2 JPH0562615 B2 JP H0562615B2
Authority
JP
Japan
Prior art keywords
polymer
present
added
general formula
benzene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60174273A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6234923A (ja
Inventor
Mitsuo Ishikawa
Kazuo Nate
Takashi Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60174273A priority Critical patent/JPS6234923A/ja
Publication of JPS6234923A publication Critical patent/JPS6234923A/ja
Publication of JPH0562615B2 publication Critical patent/JPH0562615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0754Non-macromolecular compounds containing silicon-to-silicon bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Organic Insulating Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP60174273A 1985-08-09 1985-08-09 新規な重合体 Granted JPS6234923A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60174273A JPS6234923A (ja) 1985-08-09 1985-08-09 新規な重合体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60174273A JPS6234923A (ja) 1985-08-09 1985-08-09 新規な重合体

Publications (2)

Publication Number Publication Date
JPS6234923A JPS6234923A (ja) 1987-02-14
JPH0562615B2 true JPH0562615B2 (enrdf_load_stackoverflow) 1993-09-08

Family

ID=15975771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60174273A Granted JPS6234923A (ja) 1985-08-09 1985-08-09 新規な重合体

Country Status (1)

Country Link
JP (1) JPS6234923A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2646162B1 (fr) * 1989-04-21 1993-01-08 Rhone Poulenc Chimie Procede de preparation de polysilylpolyynes et polymeres obtenus a l'issue de ce procede
JP2776184B2 (ja) * 1993-01-25 1998-07-16 信越化学工業株式会社 ケイ素系高分子化合物
US5512269A (en) * 1993-06-09 1996-04-30 Burroughs Wellcome, Co. Method of treating retained pulmonary secretions
FR2798662B1 (fr) * 1999-09-16 2002-01-18 Commissariat Energie Atomique Poly (ethynylene phenylene ethynylene silylenes) et leurs procedes de preparation
US6271280B1 (en) * 2000-04-19 2001-08-07 General Electric Company Diacetylenic polyorganosiloxanes, intermediates therefor, and cured compositions prepared therefrom
JP4639915B2 (ja) * 2005-04-01 2011-02-23 Jsr株式会社 レジスト下層膜用組成物

Also Published As

Publication number Publication date
JPS6234923A (ja) 1987-02-14

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees