JPH0557657B2 - - Google Patents
Info
- Publication number
- JPH0557657B2 JPH0557657B2 JP21477786A JP21477786A JPH0557657B2 JP H0557657 B2 JPH0557657 B2 JP H0557657B2 JP 21477786 A JP21477786 A JP 21477786A JP 21477786 A JP21477786 A JP 21477786A JP H0557657 B2 JPH0557657 B2 JP H0557657B2
- Authority
- JP
- Japan
- Prior art keywords
- resist master
- resist
- master
- temperature
- baking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010438 heat treatment Methods 0.000 claims description 13
- 230000005855 radiation Effects 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Optical Record Carriers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21477786A JPS6370940A (ja) | 1986-09-11 | 1986-09-11 | レジスト原盤の熱処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21477786A JPS6370940A (ja) | 1986-09-11 | 1986-09-11 | レジスト原盤の熱処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6370940A JPS6370940A (ja) | 1988-03-31 |
JPH0557657B2 true JPH0557657B2 (fr) | 1993-08-24 |
Family
ID=16661361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21477786A Granted JPS6370940A (ja) | 1986-09-11 | 1986-09-11 | レジスト原盤の熱処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6370940A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015020004A1 (fr) | 2013-08-07 | 2015-02-12 | 旭硝子株式会社 | Composition élastomère fluorée réticulable et produit réticulé associé |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0749910B2 (ja) * | 1988-09-02 | 1995-05-31 | パイオニア株式会社 | 光ディスク原盤の加熱乾燥装置 |
JPH0749911B2 (ja) * | 1988-09-02 | 1995-05-31 | パイオニア株式会社 | 光ディスク原盤の加熱乾燥装置 |
DE19543354A1 (de) * | 1995-11-21 | 1997-05-22 | Leybold Ag | Vorrichtung zum Trocknen einer Lackschicht |
DE19821237C1 (de) * | 1998-05-12 | 2000-03-02 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Trocknung von Photoresistschichten |
-
1986
- 1986-09-11 JP JP21477786A patent/JPS6370940A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015020004A1 (fr) | 2013-08-07 | 2015-02-12 | 旭硝子株式会社 | Composition élastomère fluorée réticulable et produit réticulé associé |
Also Published As
Publication number | Publication date |
---|---|
JPS6370940A (ja) | 1988-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |