JPH0557020B2 - - Google Patents

Info

Publication number
JPH0557020B2
JPH0557020B2 JP8477682A JP8477682A JPH0557020B2 JP H0557020 B2 JPH0557020 B2 JP H0557020B2 JP 8477682 A JP8477682 A JP 8477682A JP 8477682 A JP8477682 A JP 8477682A JP H0557020 B2 JPH0557020 B2 JP H0557020B2
Authority
JP
Japan
Prior art keywords
ion beam
processing
end point
mask
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8477682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58202038A (ja
Inventor
Akira Shimase
Tooru Ishitani
Hifumi Tamura
Hiroshi Yamaguchi
Takeoki Myauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57084776A priority Critical patent/JPS58202038A/ja
Publication of JPS58202038A publication Critical patent/JPS58202038A/ja
Publication of JPH0557020B2 publication Critical patent/JPH0557020B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP57084776A 1982-05-21 1982-05-21 イオンビ−ム加工装置 Granted JPS58202038A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57084776A JPS58202038A (ja) 1982-05-21 1982-05-21 イオンビ−ム加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57084776A JPS58202038A (ja) 1982-05-21 1982-05-21 イオンビ−ム加工装置

Publications (2)

Publication Number Publication Date
JPS58202038A JPS58202038A (ja) 1983-11-25
JPH0557020B2 true JPH0557020B2 (ko) 1993-08-23

Family

ID=13840077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57084776A Granted JPS58202038A (ja) 1982-05-21 1982-05-21 イオンビ−ム加工装置

Country Status (1)

Country Link
JP (1) JPS58202038A (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0770299B2 (ja) * 1984-04-05 1995-07-31 株式会社日立製作所 イオンビーム加工装置および表面加工方法
JPS6186753A (ja) * 1984-10-03 1986-05-02 Seiko Instr & Electronics Ltd マスク欠陥修正終了検出方法
JP2539359B2 (ja) * 1985-03-27 1996-10-02 株式会社日立製作所 半導体装置へのイオンビ−ム加工方法およびその装置
US6753253B1 (en) * 1986-06-18 2004-06-22 Hitachi, Ltd. Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams
JP2610456B2 (ja) * 1987-11-13 1997-05-14 セイコー電子工業株式会社 パターン膜修正方法
JPH0456054A (ja) * 1990-06-21 1992-02-24 Nec Corp Ｆｉｂ装置
JPH09283496A (ja) * 1996-04-18 1997-10-31 Hitachi Ltd 荷電粒子ビーム照射によるパターン形成方法及びその装置
JP2887155B2 (ja) * 1996-09-02 1999-04-26 セイコーインスツルメンツ株式会社 パターン膜修正方法
KR20010053095A (ko) * 1999-04-21 2001-06-25 핫토리 쥰이치 막 두께 측정방법
KR101010924B1 (ko) 2008-07-01 2011-01-25 연세대학교 산학협력단 형상개구를 이용한 집속 이온빔 가공장치와 이를 이용한가공방법
JP6277627B2 (ja) * 2013-08-09 2018-02-14 凸版印刷株式会社 フォトマスクの欠陥修正方法
JP2022109566A (ja) * 2021-01-15 2022-07-28 株式会社ブイ・テクノロジー フォトマスク修正装置およびフォトマスクの修正方法

Also Published As

Publication number Publication date
JPS58202038A (ja) 1983-11-25

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