JPH0551898B2 - - Google Patents

Info

Publication number
JPH0551898B2
JPH0551898B2 JP57044596A JP4459682A JPH0551898B2 JP H0551898 B2 JPH0551898 B2 JP H0551898B2 JP 57044596 A JP57044596 A JP 57044596A JP 4459682 A JP4459682 A JP 4459682A JP H0551898 B2 JPH0551898 B2 JP H0551898B2
Authority
JP
Japan
Prior art keywords
control
recording medium
pit
intensity ratio
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57044596A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58162953A (ja
Inventor
Keizo Kato
Sho Ito
Masahiro Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4459682A priority Critical patent/JPS58162953A/ja
Publication of JPS58162953A publication Critical patent/JPS58162953A/ja
Publication of JPH0551898B2 publication Critical patent/JPH0551898B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP4459682A 1982-03-23 1982-03-23 現像処理の制御装置 Granted JPS58162953A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4459682A JPS58162953A (ja) 1982-03-23 1982-03-23 現像処理の制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4459682A JPS58162953A (ja) 1982-03-23 1982-03-23 現像処理の制御装置

Publications (2)

Publication Number Publication Date
JPS58162953A JPS58162953A (ja) 1983-09-27
JPH0551898B2 true JPH0551898B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-08-03

Family

ID=12695835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4459682A Granted JPS58162953A (ja) 1982-03-23 1982-03-23 現像処理の制御装置

Country Status (1)

Country Link
JP (1) JPS58162953A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231926A (ja) * 1984-05-01 1985-11-18 Matsushita Electric Ind Co Ltd 記録原盤の製造方法
JPS60231927A (ja) * 1984-05-01 1985-11-18 Matsushita Electric Ind Co Ltd 記録原盤の製造方法
EP1965383A1 (en) * 2007-03-02 2008-09-03 Singulus Mastering B.V. Diffraction order measurement

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5230429A (en) * 1975-09-03 1977-03-08 Canon Inc Photographic image recording and processing system
JPS56144332A (en) * 1980-07-30 1981-11-10 Yamatake Honeywell Co Ltd Combustion control device

Also Published As

Publication number Publication date
JPS58162953A (ja) 1983-09-27

Similar Documents

Publication Publication Date Title
KR100433238B1 (ko) 광디스크및마스터디스크제조방법및장치
JPH0551898B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB2108707A (en) Method and system for developing a photo-resist material used as a recording medium
US5218400A (en) Developing apparatus of photoresist
KR100588442B1 (ko) 광 디스크 장치의 기록 파워 결정 방법 및 기록 파워 제어방법
JP2524326B2 (ja) 光ディスク原盤の製造方法
JP2822554B2 (ja) 検出装置
JPS6161341B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2000065600A (ja) 回転状態検出装置
JPH08329534A (ja) 光ディスク用原盤の製造方法
JPH0421857B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6367550A (ja) 情報記録原盤の欠陥検査装置
JPH01162254A (ja) 光ディスク原盤の製造方法
JP2713974B2 (ja) ディスク
JP2631745B2 (ja) 光ディスクの欠陥検査方法
JP2001208517A (ja) 光ディスク検査装置
JP2511736Y2 (ja) 光ディスク原盤の現像装置
US20040081048A1 (en) Local track pitch measuring apparatus and method
JP2836900B2 (ja) 光ディスク記録再生装置および記録再生方法
JP2613578B2 (ja) 光ディスクの現像装置
JPH0628719A (ja) 現像処理装置
JP2536056B2 (ja) 現像モニタ装置
JPH0474326A (ja) 光ディスク原盤とその現像装置および方法
JPS5837858A (ja) 記録原盤の製造方法
JPH01220158A (ja) 光ディスク用現像装置