JPH0551662B2 - - Google Patents

Info

Publication number
JPH0551662B2
JPH0551662B2 JP61262045A JP26204586A JPH0551662B2 JP H0551662 B2 JPH0551662 B2 JP H0551662B2 JP 61262045 A JP61262045 A JP 61262045A JP 26204586 A JP26204586 A JP 26204586A JP H0551662 B2 JPH0551662 B2 JP H0551662B2
Authority
JP
Japan
Prior art keywords
target
magnetic
sputtering
phase
ferromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61262045A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63118067A (ja
Inventor
Koichi Tamaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP61262045A priority Critical patent/JPS63118067A/ja
Publication of JPS63118067A publication Critical patent/JPS63118067A/ja
Publication of JPH0551662B2 publication Critical patent/JPH0551662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP61262045A 1986-11-05 1986-11-05 スパツタリングタ−ゲツト Granted JPS63118067A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61262045A JPS63118067A (ja) 1986-11-05 1986-11-05 スパツタリングタ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61262045A JPS63118067A (ja) 1986-11-05 1986-11-05 スパツタリングタ−ゲツト

Publications (2)

Publication Number Publication Date
JPS63118067A JPS63118067A (ja) 1988-05-23
JPH0551662B2 true JPH0551662B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-08-03

Family

ID=17370263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61262045A Granted JPS63118067A (ja) 1986-11-05 1986-11-05 スパツタリングタ−ゲツト

Country Status (1)

Country Link
JP (1) JPS63118067A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4941920A (en) * 1987-11-25 1990-07-17 Hitachi Metals, Ltd. Sintered target member and method of producing same
EP0888464B1 (de) * 1996-03-19 2002-10-02 Unaxis Balzers Aktiengesellschaft Target, magnetronquelle mit einem solchen und verfahren zur herstellung eines solchen targets
KR100600973B1 (ko) 2001-12-19 2006-07-13 닛코킨조쿠 가부시키가이샤 자성체 타겟트와 배킹 플레이트와의 접합방법 및 자성체 타겟트와 배킹 플레이트와의 조립체
JP4708121B2 (ja) * 2005-08-22 2011-06-22 昭和電工株式会社 磁性薄膜作成用ターゲット、磁気記録媒体およびその製造方法、磁気記録再生装置
JP2009221608A (ja) * 2009-07-07 2009-10-01 Mitsui Mining & Smelting Co Ltd スパッタリングターゲット
CN112941473B (zh) * 2021-01-28 2022-06-17 宁波江丰电子材料股份有限公司 一种MoTiNi合金靶材及其制备方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094761A (en) * 1977-07-25 1978-06-13 Motorola, Inc. Magnetion sputtering of ferromagnetic material

Also Published As

Publication number Publication date
JPS63118067A (ja) 1988-05-23

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees