JPH0547504B2 - - Google Patents
Info
- Publication number
- JPH0547504B2 JPH0547504B2 JP17664988A JP17664988A JPH0547504B2 JP H0547504 B2 JPH0547504 B2 JP H0547504B2 JP 17664988 A JP17664988 A JP 17664988A JP 17664988 A JP17664988 A JP 17664988A JP H0547504 B2 JPH0547504 B2 JP H0547504B2
- Authority
- JP
- Japan
- Prior art keywords
- silica
- ultrafine
- powder
- sintered body
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 44
- 239000000377 silicon dioxide Substances 0.000 claims description 21
- 239000000843 powder Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- 238000007731 hot pressing Methods 0.000 claims description 3
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 241001128391 Taia Species 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003826 uniaxial pressing Methods 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17664988A JPH0226862A (ja) | 1988-07-15 | 1988-07-15 | シリカ焼結体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17664988A JPH0226862A (ja) | 1988-07-15 | 1988-07-15 | シリカ焼結体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0226862A JPH0226862A (ja) | 1990-01-29 |
| JPH0547504B2 true JPH0547504B2 (enrdf_load_stackoverflow) | 1993-07-16 |
Family
ID=16017273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17664988A Granted JPH0226862A (ja) | 1988-07-15 | 1988-07-15 | シリカ焼結体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0226862A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5728470A (en) * | 1994-05-13 | 1998-03-17 | Nec Corporation | Multi-layer wiring substrate, and process for producing the same |
| CN114349516B (zh) * | 2021-12-16 | 2023-05-12 | 郑州大学 | 一种低温合成高致密SiC陶瓷的方法 |
-
1988
- 1988-07-15 JP JP17664988A patent/JPH0226862A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0226862A (ja) | 1990-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |