JPH0547095B2 - - Google Patents

Info

Publication number
JPH0547095B2
JPH0547095B2 JP4402785A JP4402785A JPH0547095B2 JP H0547095 B2 JPH0547095 B2 JP H0547095B2 JP 4402785 A JP4402785 A JP 4402785A JP 4402785 A JP4402785 A JP 4402785A JP H0547095 B2 JPH0547095 B2 JP H0547095B2
Authority
JP
Japan
Prior art keywords
group
examples
compounds
present
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4402785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61203443A (ja
Inventor
Koichi Kawamura
Norimasa Aotani
Akira Umehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4402785A priority Critical patent/JPS61203443A/ja
Priority to US06/836,942 priority patent/US4636459A/en
Publication of JPS61203443A publication Critical patent/JPS61203443A/ja
Publication of JPH0547095B2 publication Critical patent/JPH0547095B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/04Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP4402785A 1985-03-06 1985-03-06 光重合性組成物 Granted JPS61203443A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4402785A JPS61203443A (ja) 1985-03-06 1985-03-06 光重合性組成物
US06/836,942 US4636459A (en) 1985-03-06 1986-03-06 Photopolymerizable compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4402785A JPS61203443A (ja) 1985-03-06 1985-03-06 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS61203443A JPS61203443A (ja) 1986-09-09
JPH0547095B2 true JPH0547095B2 (de) 1993-07-15

Family

ID=12680161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4402785A Granted JPS61203443A (ja) 1985-03-06 1985-03-06 光重合性組成物

Country Status (1)

Country Link
JP (1) JPS61203443A (de)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1614537A1 (de) 2004-07-07 2006-01-11 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer und lithographisches Druckverfahren
EP1630618A2 (de) 2004-08-24 2006-03-01 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung einer Flachdruckplatte, Flachdruckplattenvorläufer und Flachdruckverfahren
EP1669195A1 (de) 2004-12-13 2006-06-14 Fuji Photo Film Co., Ltd. Flachdruckverfahren
EP1685957A2 (de) 2005-01-26 2006-08-02 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer, Flachdruckverfahren und Flachdruckverfahrenstapel
EP1755002A2 (de) 2005-08-18 2007-02-21 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung von Flachdruckplatten und Herstellvorrichtung von Flachdruckplatten
EP2246741A1 (de) 2004-05-19 2010-11-03 Fujifilm Corporation Bildaufzeichnungsverfahren
EP2618215A1 (de) 2004-05-31 2013-07-24 Fujifilm Corporation Verfahren zur Herstellung einer Lithografiedruckplatte
EP3086176A1 (de) 2005-02-28 2016-10-26 Fujifilm Corporation Lithografiedruckverfahren

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2589558B2 (ja) * 1988-11-11 1997-03-12 富士写真フイルム株式会社 感光性組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3531460B2 (ja) 1998-03-19 2004-05-31 松下電器産業株式会社 磁気記録再生装置
JP3565001B2 (ja) * 1998-03-19 2004-09-15 松下電器産業株式会社 磁気記録再生装置
JP3500997B2 (ja) 1998-03-19 2004-02-23 松下電器産業株式会社 磁気記録再生装置
JPH11328777A (ja) 1998-03-19 1999-11-30 Matsushita Electric Ind Co Ltd 磁気記録再生装置
JP3427726B2 (ja) 1998-03-19 2003-07-22 松下電器産業株式会社 磁気記録再生装置
JPH11273195A (ja) 1998-03-19 1999-10-08 Matsushita Electric Ind Co Ltd 磁気記録再生装置
JP3646511B2 (ja) 1998-03-19 2005-05-11 松下電器産業株式会社 磁気記録再生装置
JP5401042B2 (ja) * 2008-02-28 2014-01-29 富士フイルム株式会社 フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
JP5634888B2 (ja) 2011-01-12 2014-12-03 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP5398760B2 (ja) 2011-02-23 2014-01-29 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP2014040529A (ja) 2012-08-22 2014-03-06 Fujifilm Corp インク組成物、画像形成方法、及び印画物

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2246741A1 (de) 2004-05-19 2010-11-03 Fujifilm Corporation Bildaufzeichnungsverfahren
EP2618215A1 (de) 2004-05-31 2013-07-24 Fujifilm Corporation Verfahren zur Herstellung einer Lithografiedruckplatte
EP1614537A1 (de) 2004-07-07 2006-01-11 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer und lithographisches Druckverfahren
EP1630618A2 (de) 2004-08-24 2006-03-01 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung einer Flachdruckplatte, Flachdruckplattenvorläufer und Flachdruckverfahren
EP1669195A1 (de) 2004-12-13 2006-06-14 Fuji Photo Film Co., Ltd. Flachdruckverfahren
EP1685957A2 (de) 2005-01-26 2006-08-02 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer, Flachdruckverfahren und Flachdruckverfahrenstapel
EP3086176A1 (de) 2005-02-28 2016-10-26 Fujifilm Corporation Lithografiedruckverfahren
EP3086177A1 (de) 2005-02-28 2016-10-26 Fujifilm Corporation Verfahren zur herstellung eines lithografiedruckplattenvorläufers
EP1755002A2 (de) 2005-08-18 2007-02-21 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung von Flachdruckplatten und Herstellvorrichtung von Flachdruckplatten
EP2306246A1 (de) 2005-08-18 2011-04-06 Fujifilm Corporation Verfahren zur Herstellung von Flachdruckplatten

Also Published As

Publication number Publication date
JPS61203443A (ja) 1986-09-09

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Legal Events

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R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term