JPH0546695B2 - - Google Patents

Info

Publication number
JPH0546695B2
JPH0546695B2 JP60058534A JP5853485A JPH0546695B2 JP H0546695 B2 JPH0546695 B2 JP H0546695B2 JP 60058534 A JP60058534 A JP 60058534A JP 5853485 A JP5853485 A JP 5853485A JP H0546695 B2 JPH0546695 B2 JP H0546695B2
Authority
JP
Japan
Prior art keywords
information
distance information
valid
measurement
measurement distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60058534A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61219045A (ja
Inventor
Kazuyuki Oda
Takasumi Yui
Yoshiharu Kataoka
Hideo Haneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60058534A priority Critical patent/JPS61219045A/ja
Priority to US06/843,392 priority patent/US4714331A/en
Publication of JPS61219045A publication Critical patent/JPS61219045A/ja
Publication of JPH0546695B2 publication Critical patent/JPH0546695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/32—Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60058534A 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置 Granted JPS61219045A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60058534A JPS61219045A (ja) 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置
US06/843,392 US4714331A (en) 1985-03-25 1986-03-24 Method and apparatus for automatic focusing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60058534A JPS61219045A (ja) 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置

Publications (2)

Publication Number Publication Date
JPS61219045A JPS61219045A (ja) 1986-09-29
JPH0546695B2 true JPH0546695B2 (ko) 1993-07-14

Family

ID=13087099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60058534A Granted JPS61219045A (ja) 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置

Country Status (1)

Country Link
JP (1) JPS61219045A (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6031758A (en) 1996-02-29 2000-02-29 Hitachi, Ltd. Semiconductor memory device having faulty cells
JP6025346B2 (ja) * 2012-03-05 2016-11-16 キヤノン株式会社 検出装置、露光装置及びデバイスを製造する方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5634844A (en) * 1979-08-30 1981-04-07 Matsushita Electric Works Ltd Flume
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5634844A (en) * 1979-08-30 1981-04-07 Matsushita Electric Works Ltd Flume
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Also Published As

Publication number Publication date
JPS61219045A (ja) 1986-09-29

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Legal Events

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EXPY Cancellation because of completion of term