JPH0544018B2 - - Google Patents
Info
- Publication number
- JPH0544018B2 JPH0544018B2 JP61018572A JP1857286A JPH0544018B2 JP H0544018 B2 JPH0544018 B2 JP H0544018B2 JP 61018572 A JP61018572 A JP 61018572A JP 1857286 A JP1857286 A JP 1857286A JP H0544018 B2 JPH0544018 B2 JP H0544018B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- photosensitive
- diazo
- group
- diisocyanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1857286A JPS62175729A (ja) | 1986-01-30 | 1986-01-30 | 感光性組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1857286A JPS62175729A (ja) | 1986-01-30 | 1986-01-30 | 感光性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62175729A JPS62175729A (ja) | 1987-08-01 |
JPH0544018B2 true JPH0544018B2 (en, 2012) | 1993-07-05 |
Family
ID=11975335
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1857286A Granted JPS62175729A (ja) | 1986-01-30 | 1986-01-30 | 感光性組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62175729A (en, 2012) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03240060A (ja) * | 1990-02-19 | 1991-10-25 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP2627565B2 (ja) * | 1990-02-19 | 1997-07-09 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
JPH0425845A (ja) * | 1990-05-21 | 1992-01-29 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP2709532B2 (ja) * | 1991-03-01 | 1998-02-04 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
CN110032041B (zh) * | 2019-05-07 | 2020-11-10 | 深圳市华星光电半导体显示技术有限公司 | 光阻组合物、显示面板及其制备方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849940A (ja) * | 1981-06-30 | 1983-03-24 | Konishiroku Photo Ind Co Ltd | 感光性組成物 |
JPS60191244A (ja) * | 1984-03-13 | 1985-09-28 | Dainippon Ink & Chem Inc | 水性アルカリ現像液で現像可能な感光性画像形成材料 |
JPS60165646A (ja) * | 1984-02-09 | 1985-08-28 | Dainippon Ink & Chem Inc | 水性アルカリ現像液で現像可能な感光性画像形成材料 |
-
1986
- 1986-01-30 JP JP1857286A patent/JPS62175729A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62175729A (ja) | 1987-08-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |