JPH0543289B2 - - Google Patents
Info
- Publication number
- JPH0543289B2 JPH0543289B2 JP30536086A JP30536086A JPH0543289B2 JP H0543289 B2 JPH0543289 B2 JP H0543289B2 JP 30536086 A JP30536086 A JP 30536086A JP 30536086 A JP30536086 A JP 30536086A JP H0543289 B2 JPH0543289 B2 JP H0543289B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- wafer
- semiconductor substrate
- substrate
- hydrofluoric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 31
- 239000010409 thin film Substances 0.000 claims description 31
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 28
- 239000004065 semiconductor Substances 0.000 claims description 27
- 238000000354 decomposition reaction Methods 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 10
- 235000012431 wafers Nutrition 0.000 description 30
- 239000012535 impurity Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Sampling And Sample Adjustment (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30536086A JPS63158840A (ja) | 1986-12-23 | 1986-12-23 | 半導体基板の薄膜分解方法及び装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30536086A JPS63158840A (ja) | 1986-12-23 | 1986-12-23 | 半導体基板の薄膜分解方法及び装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63158840A JPS63158840A (ja) | 1988-07-01 |
| JPH0543289B2 true JPH0543289B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-07-01 |
Family
ID=17944177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30536086A Granted JPS63158840A (ja) | 1986-12-23 | 1986-12-23 | 半導体基板の薄膜分解方法及び装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63158840A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2978192B2 (ja) * | 1990-02-19 | 1999-11-15 | 株式会社ピュアレックス | 半導体ウエハー試料作成法 |
| KR102379619B1 (ko) * | 2014-05-30 | 2022-03-25 | 가부시키가이샤 스미카 분세키 센터 | 분석용 샘플의 회수 방법 및 그 이용 |
-
1986
- 1986-12-23 JP JP30536086A patent/JPS63158840A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63158840A (ja) | 1988-07-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |