JPH0542658B2 - - Google Patents

Info

Publication number
JPH0542658B2
JPH0542658B2 JP58168424A JP16842483A JPH0542658B2 JP H0542658 B2 JPH0542658 B2 JP H0542658B2 JP 58168424 A JP58168424 A JP 58168424A JP 16842483 A JP16842483 A JP 16842483A JP H0542658 B2 JPH0542658 B2 JP H0542658B2
Authority
JP
Japan
Prior art keywords
group
polymer
repeating structural
formula
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58168424A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6060641A (ja
Inventor
Yoshuki Harita
Yoichi Kamoshita
Masashige Takatori
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP16842483A priority Critical patent/JPS6060641A/ja
Publication of JPS6060641A publication Critical patent/JPS6060641A/ja
Publication of JPH0542658B2 publication Critical patent/JPH0542658B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP16842483A 1983-09-14 1983-09-14 Ｘ線レジスト Granted JPS6060641A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16842483A JPS6060641A (ja) 1983-09-14 1983-09-14 Ｘ線レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16842483A JPS6060641A (ja) 1983-09-14 1983-09-14 Ｘ線レジスト

Publications (2)

Publication Number Publication Date
JPS6060641A JPS6060641A (ja) 1985-04-08
JPH0542658B2 true JPH0542658B2 (cs) 1993-06-29

Family

ID=15867862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16842483A Granted JPS6060641A (ja) 1983-09-14 1983-09-14 Ｘ線レジスト

Country Status (1)

Country Link
JP (1) JPS6060641A (cs)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
FR2442625A1 (fr) * 1978-08-24 1980-06-27 Micro Mega Sa Melangeur air-eau pour le pulverisateur d'une piece a main dentaire
JPS5788729A (en) * 1980-11-21 1982-06-02 Nippon Telegr & Teleph Corp <Ntt> Forming method for minute pattern
JPS5817105A (ja) * 1981-07-24 1983-02-01 Japan Synthetic Rubber Co Ltd 電離放射線感応性材料

Also Published As

Publication number Publication date
JPS6060641A (ja) 1985-04-08

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